⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4266772 | 1.00 | — | — | |
| SCHEMBL10456517 | 0.92 | — | — | |
| SCHEMBL4631321 | 0.78 | ALDH1A1 (0.39) | — | |
| SCHEMBL21158806 | 0.76 | — | — | |
| SCHEMBL29117781 | 0.76 | CYP19A1 (0.38) | — | |
| SCHEMBL19666749 | 0.76 | — | — | |
| SCHEMBL631549 | 0.76 | — | — | |
| SCHEMBL22612937 | 0.73 | EPHX1 (0.35) | — | |
| SCHEMBL27997174 | 0.72 | EPHX1 (0.38) | — | |
| SCHEMBL9804280 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 144 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118339509-A | Liquid crystal aligning agent and liquid crystal display element | 日产化学株式会社 | 2024-07-12 | — | — | CN | disclosed |
| CN-118027311-A | Curable resin composition and cured product obtained therefrom | 佳能株式会社 | 2024-05-14 | — | — | CN | disclosed |
| CN-118043732-A | Weak anchoring liquid crystal aligning agent, liquid crystal display element and polymer | 日产化学株式会社 | 2024-05-14 | — | — | CN | disclosed |
| CN-112888719-B | Curable resin composition and cured product obtained therefrom | 佳能株式会社 | 2024-02-23 | — | — | CN | disclosed |
| US-11898057-B2 | Weather-resistant hard coat composition for glass-substitute substrate, cured product, and laminate | DAICEL CORPORATION (JP) | 2024-02-13 | — | — | US | disclosed |
| CN-117460990-A | Weak anchoring liquid crystal aligning agent, liquid crystal display element and copolymer | 日产化学株式会社 | 2024-01-26 | — | — | CN | disclosed |
| US-11866608-B2 | Weather-resistant hard coat composition for metal, cured product, and coated metal substrate | DAICEL CORPORATION (JP) | 2024-01-09 | — | — | US | disclosed |
| US-20230399479-A1 | LAMINATED FILM AND FLEXIBLE DEVICE | DAICEL CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| WO-2023219075-A1 | METHOD FOR MANUFACTURING SUBSTRATE EQUIPPED WITH WEAK ANCHORING ALIGNMENT FILM, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY ELEMENT | 日産化学株式会社 | 2023-11-16 | — | — | WO | disclosed |
| WO-2023190456-A1 | CURED PRODUCT, PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, AND PRINTED WIRING BOARD | 太陽ホールディングス株式会社 | 2023-10-05 | — | — | WO | disclosed |
| CN-102906867-A | Printed circuit board including dam for underfilling and method of manufacturing the same | LG CHEMICAL LTD | 2013-01-30 | — | — | CN | disclosed |
| CN-101410421-B | Photopolymerization initiator, photosensitive composition, photosensitive film, photosensitive laminate, method of forming permanent pattern and printed board | FUJI PHOTO FILM CO LTD | 2011-07-27 | — | — | CN | disclosed |
| CN-101836313-A | Be used for the perforated membrane with reactive polymer layer thereon of battery diaphragm and the purposes of this perforated membrane | NITTO DENKO CORP | 2010-09-15 | — | — | CN | disclosed |
| EP-2135684-A1 | ORGANIC/INORGANIC COMPOSITE COATING FILM, STRUCTURAL COLOR FILM OBTAINED FROM THE SAME, AND PROCESSES FOR PRODUCING THESE | KAWAMURA INSTITUTE OF CHEMICAL RESEARCH (JP) | 2009-12-23 | — | — | EP | disclosed |
| CN-101578555-A | Photocurable resin composition, cured product pattern, and printed wiring board | TAIYO INK MFG CO LTD (JP) | 2009-11-11 | — | — | CN | disclosed |
| CN-100539254-C | Be used for battery porous film and its utilization with the carrying reactive polymer of spacer | NITTO DENKO CORP SUNSTAR ENGIN (JP) | 2009-09-09 | — | — | CN | disclosed |
| CN-101410421-A | Photopolymerization initiator, photosensitive composition, photosensitive film, photosensitive laminate, method of forming permanent pattern and printed board | FUJIFILM CORP (JP) | 2009-04-15 | — | — | CN | disclosed |
| EP-1923741-A2 | Photosensitive composition | TAIYO INK MFG. CO., LTD. (JP) | 2008-05-21 | — | — | EP | disclosed |
| CN-101111952-A | Reactive polymer-supporting porous film for battery separator and use thereof | NITTO DENKO CORP (JP) | 2008-01-23 | — | — | CN | disclosed |
| CN-101107565-A | Pattern forming material, pattern forming apparatus and permanent pattern forming method | FUJI PHOTO FILM CO LTD (JP) | 2008-01-16 | — | — | CN | disclosed |