SCHEMBL4631321

SCHEMBL4631321

C=C(C)C(=O)OC1(C)COC1

nearest known ligand 0.39

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.39
TSHR P16473 1/20 0.32
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12902856 0.85 ALDH1A1 (0.39) ALDH1A1
SCHEMBL10064071 0.81 ALDH1A1 (0.34) ALDH1A1
SCHEMBL13900356 0.80 ALDH1A1 (0.44) ALDH1A1TSHRTHRB
SCHEMBL27945670 0.80 ALDH1A1 (0.44) ALDH1A1TSHRTHRB
SCHEMBL912335 0.80 ALDH1A1 (0.41) ALDH1A1TSHR
SCHEMBL4266774 0.79 EPHX1 (0.30)
SCHEMBL4150787 0.78 ALDH1A1 (0.42) ALDH1A1TSHRTHRB
SCHEMBL21158806 0.78
SCHEMBL4266772 0.78
SCHEMBL4266776 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 132 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115135496-B Structure body 太阳控股株式会社 2025-04-15 CN disclosed
CN-118339509-A Liquid crystal aligning agent and liquid crystal display element 日产化学株式会社 2024-07-12 CN disclosed
CN-118043732-A Weak anchoring liquid crystal aligning agent, liquid crystal display element and polymer 日产化学株式会社 2024-05-14 CN disclosed
CN-113646698-B Photoresist composition and cured product thereof 太阳控股株式会社 2024-05-10 CN disclosed
CN-117850164-A Curable resin composition, dry film, cured product, and printed wiring board 太阳控股株式会社 2024-04-09 CN disclosed
CN-117460990-A Weak anchoring liquid crystal aligning agent, liquid crystal display element and copolymer 日产化学株式会社 2024-01-26 CN disclosed
CN-117120551-A Thermosetting resin composition, dry film, cured product, printed wiring board, and electric/electronic component 太阳控股株式会社 2023-11-24 CN disclosed
CN-117083316-A Curable resin composition, dry film, and cured product 太阳控股株式会社 2023-11-17 CN disclosed
WO-2023219075-A1 METHOD FOR MANUFACTURING SUBSTRATE EQUIPPED WITH WEAK ANCHORING ALIGNMENT FILM, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2023-11-16 WO disclosed
WO-2023171690-A1 WEAK-ANCHORING LIQUID CRYSTAL ALIGNING AGENT AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2023-09-14 WO disclosed
CN-101464632-A Light solidifying/heat solidifying resin composition and dry film and printed circuit board using the same TAIYO INK MFG CO LTD (JP) 2009-06-24 CN disclosed
CN-101441413-A Green colored composition for color filter and color filter TOYO INK MFG CO (JP) 2009-05-27 CN disclosed
CN-101438210-A Photosensitive composition, photosensitive film, photosensitive laminate, method of forming permanent pattern and printed board FUJIFILM CORP (JP) 2009-05-20 CN disclosed
CN-101320212-A Photo-cured heat-cured resin composition and printed circuit board produced with the same TAIYO INK MFG CO LTD (JP) 2008-12-10 CN disclosed
CN-101303528-A Photocurable resin composition, cured product thereof, dry film, and printed wiring board TAIYO INK MFG CO LTD (JP) 2008-11-12 CN disclosed
EP-1923741-A2 Photosensitive composition TAIYO INK MFG. CO., LTD. (JP) 2008-05-21 EP disclosed
CN-101107565-A Pattern forming material, pattern forming apparatus and permanent pattern forming method FUJI PHOTO FILM CO LTD (JP) 2008-01-16 CN disclosed
CN-1977221-A Pattern forming method, color filter manufacturing method, color filter, and liquid crystal display FUJI PHOTO FILM CO LTD (JP) 2007-06-06 CN disclosed
CN-1267399-C Unsaturated monocarboxylic ester compound, method for producing same, and active energy ray-curable composition UNIV KANAGAWA (JP) 2006-08-02 CN disclosed
CN-1396902-A Unsaturated monocarboxylic ester compound, method for producing same, and active energy ray-curable composition UNIV KANAGAWA (JP) 2003-02-12 CN disclosed