Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15333172 | 0.83 | ADRB2 (0.38) | — | |
| SCHEMBL105839 | 0.82 | HSD17B10 (0.35) | HSD17B10 | |
| SCHEMBL3786079 | 0.80 | HSD17B10 (0.33) | HSD17B10 | |
| SCHEMBL107732 | 0.78 | HSD17B10 (0.32) | HSD17B10 | |
| SCHEMBL29201675 | 0.78 | HSD17B10 (0.32) | HSD17B10 | |
| SCHEMBL31142041 | 0.78 | HSD17B10 (0.32) | HSD17B10 | |
| SCHEMBL7636389 | 0.78 | HSD17B10 (0.32) | HSD17B10 | |
| SCHEMBL11455676 | 0.78 | HSD17B10 (0.37) | HSD17B10 | |
| SCHEMBL1964610 | 0.78 | HSD17B10 (0.32) | HSD17B10 | |
| SCHEMBL2399516 | 0.76 | HSD17B10 (0.31) | HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118598151-A | Molecular sieve material, preparation method and application thereof | 中国石油化工股份有限公司 | 2024-09-06 | — | — | CN | claimed |
| WO-2012139965-A1 | CYANOACRYLATE ADHESIVE WITH IMPROVED WATER RESISTANCE | HENKEL IRELAND LTD. (IE) | 2012-10-18 | — | — | WO | claimed |
| CN-118598151-A | Molecular sieve material, preparation method and application thereof | 中国石油化工股份有限公司 | 2024-09-06 | — | — | CN | disclosed |
| US-9181356-B2 | Hydrogenation catalyst composition and hydrogenation method thereof | TSRC CORPORATION (TW) | 2015-11-10 | — | — | US | disclosed |
| EP-1970421-B1 | COATING LIQUID FOR FORMING LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM AND LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM OBTAINED FROM SUCH COATING LIQUID | JGC CATALYSTS & CHEMICALS LTD (JP) | 2015-04-29 | — | — | EP | disclosed |
| EP-2316862-B1 | Hydrogenation catalyst composition and hydrogenation method thereof | TSRC CORP (TW) | 2013-12-25 | — | — | EP | disclosed |
| WO-2012139965-A1 | CYANOACRYLATE ADHESIVE WITH IMPROVED WATER RESISTANCE | HENKEL IRELAND LTD. (IE) | 2012-10-18 | — | — | WO | disclosed |
| US-20120231575-A1 | METHOD FOR PRODUCING SOLAR CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-09-13 | — | — | US | disclosed |
| EP-2495771-A1 | SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2012-09-05 | — | — | EP | disclosed |
| EP-2495770-A1 | METHOD FOR PRODUCING SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2012-09-05 | — | — | EP | disclosed |
| CN-101829600-B | Hydrogenation catalyst composition and hydrogenation method thereof | TSRC CORP | 2012-08-29 | — | — | CN | disclosed |
| US-20080260956-A1 | Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part | HITACHI CHEMICAL CO., LTD. (JP) | 2008-10-23 | — | — | US | disclosed |
| EP-1970421-A1 | COATING LIQUID FOR FORMING LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM AND LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM OBTAINED FROM SUCH COATING LIQUID | CATALYSTS & CHEMICALS INDUSTRIES CO., LTD. (JP) | 2008-09-17 | — | — | EP | disclosed |
| EP-1890172-A1 | METHOD FOR FORMING ANTIREFLECTION FILM | Hitachi Chemical Co., Ltd. (JP) | 2008-02-20 | — | — | EP | disclosed |
| US-7297464-B2 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2007-11-20 | — | — | US | disclosed |
| EP-1829945-A1 | FILM, SILICA FILM AND METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING SILICA FILM, AND ELECTRONIC PART | Hitachi Chemical Co., Ltd. (JP) | 2007-09-05 | — | — | EP | disclosed |
| EP-1672427-A1 | RADIATION-CURING COMPOSITION, METHOD FOR STORING SAME, METHOD FOR FORMING CURED FILM, METHOD FOR FORMING PATTERN, METHOD FOR USING PATTERN, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE | Hitachi Chemical Co., Ltd. (JP) | 2006-06-21 | — | — | EP | disclosed |
| EP-1672426-A1 | RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2006-06-21 | — | — | EP | disclosed |
| US-20050266344-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-12-01 | — | — | US | disclosed |
| US-20050239953-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-10-27 | — | — | US | disclosed |