SCHEMBL4270185

SCHEMBL4270185

CCC[Si](C)(C)OC(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL705523 0.85
SCHEMBL23093225 0.84 LMNA (0.30)
SCHEMBL15382665 0.81
SCHEMBL4278155 0.81
SCHEMBL19294023 0.80
SCHEMBL28423860 0.80 LMNA (0.36)
SCHEMBL28423744 0.80 LMNA (0.36)
SCHEMBL26730988 0.80 LMNA (0.36)
SCHEMBL28421155 0.80 LMNA (0.36)
SCHEMBL704412 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114616652-A Monoalkoxysilanes and dense organosilica films prepared therefrom 弗萨姆材料美国有限责任公司 2022-06-10 CN claimed
CN-119998691-A Antireflection film, liquid composition set, and method for producing antireflection film 日本板硝子株式会社 2025-05-13 CN disclosed
WO-2024080149-A1 ANTI-REFLECTION FILM, LIQUID COMPOSITION, LIQUID COMPOSITION GROUP, AND METHOD FOR MANUFACTURING ANTI-REFLECTION FILM 日本板硝子株式会社 2024-04-18 WO disclosed
US-11945898-B2 Functional polymer SUSOS AG (CH) 2024-04-02 US disclosed
US-20210087309-A1 FUNCTIONAL POLYMER SUSOS AG (CH) 2021-03-25 US disclosed
US-10882931-B2 Functional polymer SUSOS AG (CH) 2021-01-05 US disclosed
EP-3191559-B1 FUNCTIONAL POLYMER SUSOS AG (CH) 2018-10-31 EP disclosed
US-20170291971-A1 FUNCTIONAL POLYMER SUSOS AG (CH) 2017-10-12 US disclosed
EP-3191559-A1 FUNCTIONAL POLYMER SuSoS AG (CH) 2017-07-19 EP disclosed
US-9691603-B2 Chemical for forming protective film CENTRAL GLASS COMPANY, LIMITED (JP) 2017-06-27 US disclosed
WO-2016037630-A1 FUNCTIONAL POLYMER SUSOS AG (CH) 2016-03-17 WO disclosed
US-20130056023-A1 Chemical for Forming Protective Film CENTRAL GLASS COMPANY, LIMITED (JP) 2013-03-07 US disclosed
US-20100261925-A1 METHOD FOR PRODUCING SILICON COMPOUND JSR CORPORATION (JP) 2010-10-14 US disclosed
US-7604866-B2 Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance ASAHI KASEI KABUSHIKI KAISHA (JP) 2009-10-20 US disclosed
US-20070135590-A1 Curable composition and cured product thereof KANEKA CORPORATION (JP) 2007-06-14 US disclosed
US-20060269724-A1 Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance ASAHI KASEI KABUSHIKI KAISHA (JP) 2006-11-30 US disclosed
CN-1809764-A Antireflective film ASAHI CHEMICAL IND (JP) 2006-07-26 CN disclosed
US-20040077757-A1 Coating composition for use in producing an insulating thin film ASAHI KASEI KABUSHIKI KAISHA (JP) 2004-04-22 US disclosed