SCHEMBL427287

SCHEMBL427287

CCCCO[Si](OCCCC)(OCCCC)C(C)C

nearest known ligand 0.38

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.38
ADRB1 P08588 1/20 0.38
ADRB3 P13945 1/20 0.38
TSHR P16473 2/20 0.33
CYP3A4 P08684 1/20 0.33
ALDH1A1 P00352 1/20 0.32
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
LMNA P02545 1/20 0.30
ATM Q13315 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31152653 0.88 ADRB2 (0.33) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL15333172 0.84 ADRB2 (0.38) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL105839 0.83 HSD17B10 (0.35)
SCHEMBL11783212 0.80 ADRB2 (0.35) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL1964612 0.80 ADRB2 (0.40) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL15333864 0.80 ADRB2 (0.35) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL8676163 0.80 ADRB2 (0.35) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL429530 0.80 ADRB2 (0.35) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL703753 0.79 ADRB2 (0.38) ADRB2ADRB1ADRB3TSHRCYP3A4
SCHEMBL426692 0.79 ADRB2 (0.38) ADRB2ADRB1ADRB3TSHRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 397 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12576012-B2 Surface-modified zinc oxide particles, dispersion solution, and cosmetic SUMITOMO OSAKA CEMENT CO., LTD. (JP) 2026-03-17 US disclosed
US-20250382394-A1 CATALYST SYSTEM FOR POLYMERIZATION OF AN OLEFIN SABIC GLOBAL TECHNOLOGIES BV (NL) 2025-12-18 US disclosed
EP-4551620-A1 CATALYST SYSTEM FOR POLYMERIZATION OF AN OLEFIN SABIC Global Technologies B.V. (NL) 2025-05-14 EP disclosed
US-20250143985-A1 SURFACE-MODIFIED ZINC OXIDE PARTICLES, DISPERSION LIQUID AND COSMETIC PREPARATION SUMITOMO OSAKA CEMENT CO., LTD. (JP) 2025-05-08 US disclosed
US-20250101152-A1 CATALYST SYSTEM FOR POLYMERIZATION OF AN OLEFIN SABIC GLOBAL TECHNOLOGIES BV (NL) 2025-03-27 US disclosed
CN-115485241-B Surface-modified zinc oxide particles, dispersion liquid, and cosmetic 住友大阪水泥股份有限公司 2025-03-25 CN disclosed
CN-115485242-B Surface-modified zinc oxide particles, dispersion liquid, and cosmetic 住友大阪水泥股份有限公司 2025-03-18 CN disclosed
CN-119487086-A Catalyst system for olefin polymerization SABIC环球技术有限责任公司 2025-02-18 CN disclosed
EP-4501855-A1 SURFACE-MODIFIED ZINC OXIDE PARTICLES, DISPERSION LIQUID AND COSMETIC PREPARATION Sumitomo Osaka Cement Co., Ltd. (JP) 2025-02-05 EP disclosed
CN-115362131-B Surface-treated metal oxide particles, dispersion, cosmetic, and method for producing surface-treated metal oxide particles 住友大阪水泥股份有限公司 2024-10-25 CN disclosed
EP-1122770-A2 Silica-based insulating film and its manufacture JSR Corporation (JP) 2001-08-08 EP disclosed
US-20010009936-A1 Method of manufacturing material for forming insulating film JSR CORPORATION (JP) 2001-07-26 US disclosed
EP-1117102-A2 Method of manufacturing material for forming insulating film JSR Corporation (JP) 2001-07-18 EP disclosed
WO-2001036496-A1 SOLID CATALYST COMPONENT FOR OLEFIN POLYMERIZATION, CATALYST FOR OLEFIN POLYMERIZATION AND PROCESS FOR PRODUCING OLEFIN POLYMER BASELL TECHNOLOGY COMPANY B.V. (NL) 2001-05-25 WO disclosed
US-6235101-B1 SILICON HYDROLYZATE, METAL CHELATE, ORGANIC SOLVENT AND BETA DIKETONE FOR FILMS JSR CORPORATION (JP) 2001-05-22 US disclosed
EP-1090967-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-11 EP disclosed
EP-1088868-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-04 EP disclosed
EP-1058274-A1 Composition for film formation and material for insulating film formation JSR Corporation (JP) 2000-12-06 EP disclosed
EP-1045290-A2 Composition for resist underlayer film and method for producing the same JSR Corporation (JP) 2000-10-18 EP disclosed
EP-0921561-A2 Composition for film formation and film JSR Corporation (JP) 1999-06-09 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12576012-B2 Surface-modified zinc oxide particles, dispersion solution, and cosmetic CUTA, SLC30A7, SLC39A3 ADRB2 1349/4885ADRB1 2188/4885ADRB3 3205/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.