SCHEMBL4282479

SCHEMBL4282479

C1=CC(c2cccc3cc4ccccc4cc23)c2ccccc21

nearest known ligand 0.35

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.35
KDM4E B2RXH2 2/20 0.35
GAA P10253 2/20 0.35
MEN1 O00255 1/20 0.33
MAPT P10636 1/20 0.33
KMT2A Q03164 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
HIF1A Q16665 1/20 0.32
CYP1B1 Q16678 1/20 0.32
HSD17B10 Q99714 1/20 0.32
HTR6 P50406 1/20 0.32
HTR2A P28223 1/20 0.32
ERBB2 P04626 1/20 0.31
CYP1A2 P05177 1/20 0.31
FYN P06241 1/20 0.31
MAOA P21397 1/20 0.31
ACHE P22303 1/20 0.31
AHR P35869 1/20 0.31
SIGMAR1 Q99720 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28231919 0.89 ERBB2 (0.35) ALDH1A1KDM4EGAAMEN1MAPT
SCHEMBL1025256 0.84 KDM1A (0.43) ALDH1A1KDM4EMAPTHSD17B10HTR6
SCHEMBL6330043 0.83 CYP2A6 (0.35) CYP1A2
SCHEMBL2970909 0.81 CYP2A6 (0.39) ALDH1A1MEN1KMT2ASMN1; SMN2HTR2A
SCHEMBL2971061 0.81 CYP2A6 (0.39) MEN1KMT2AHTR2AERBB2CYP1A2
SCHEMBL2959780 0.81 CYP1A2 (0.33) ALDH1A1HSD17B10CYP1A2
SCHEMBL2960983 0.81 TDP1 (0.31) ALDH1A1HSD17B10CYP1A2
SCHEMBL27336031 0.79 TRPM4 (0.37) ALDH1A1KDM4EMEN1MAPTKMT2A
SCHEMBL30677472 0.79 ALDH1A1 (0.33) ALDH1A1KDM4EGAAMEN1MAPT
SCHEMBL2971027 0.76 HTR6 (0.32) KDM4EHTR6HTR2ASIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7514199-B2 Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same CHEIL INDUSTRIES, INC. (KR) 2009-04-07 US disclosed
US-20070148586-A1 Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same CHEIL INDUSTRIES, INC. (KR) 2007-06-28 US disclosed