⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30892606 | 0.85 | — | — | |
| SCHEMBL977274 | 0.83 | — | — | |
| SCHEMBL30892635 | 0.83 | — | — | |
| SCHEMBL702262 | 0.81 | ADRB2 (0.41) | — | |
| SCHEMBL105329 | 0.80 | — | — | |
| SCHEMBL426716 | 0.80 | — | — | |
| SCHEMBL28368175 | 0.79 | LPAR3 (0.39) | — | |
| Ammonia Solution, Strong SCHEMBL28547617 | 0.78 | — | — | |
| SCHEMBL107663 | 0.78 | — | — | |
| Water SCHEMBL27808036 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 180 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024222666-A1 | POROUS MOLECULAR SIEVE MATERIAL, PREPARATION METHOD, AND APPLICATION THEREOF | 中国石油化工股份有限公司 | 2024-10-31 | — | — | WO | claimed |
| CN-118833831-A | Porous molecular sieve material, preparation method and application thereof | 中国石油化工股份有限公司 | 2024-10-25 | — | — | CN | claimed |
| CN-118598151-A | Molecular sieve material, preparation method and application thereof | 中国石油化工股份有限公司 | 2024-09-06 | — | — | CN | claimed |
| US-9096778-B2 | Cyanoacrylate adhesive with improved water resistance | Henkel IP & Holding GmbH (DE) | 2015-08-04 | — | — | US | claimed |
| EP-2511355-B1 | Cyanoacrylate adhesive with improved water resistance | HENKEL IRELAND LTD (DE) | 2013-10-23 | — | — | EP | claimed |
| US-20130174981-A1 | CYANOACRYLATE ADHESIVE WITH IMPROVED WATER RESISTANCE | HENKEL IRELAND LIMITED (DE) | 2013-07-11 | — | — | US | claimed |
| EP-2511355-A1 | Cyanoacrylate adhesive with improved water resistance | Henkel Ireland Ltd. (IE) | 2012-10-17 | — | — | EP | claimed |
| WO-2024222666-A1 | POROUS MOLECULAR SIEVE MATERIAL, PREPARATION METHOD, AND APPLICATION THEREOF | 中国石油化工股份有限公司 | 2024-10-31 | — | — | WO | disclosed |
| CN-118833831-A | Porous molecular sieve material, preparation method and application thereof | 中国石油化工股份有限公司 | 2024-10-25 | — | — | CN | disclosed |
| CN-118598151-A | Molecular sieve material, preparation method and application thereof | 中国石油化工股份有限公司 | 2024-09-06 | — | — | CN | disclosed |
| CN-106010382-B | Optical laminate and liquid crystal display device | 住友化学株式会社 | 2020-03-27 | — | — | CN | disclosed |
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| US-10025188-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20010051446-A1 | Method of manufacturing insulating film-forming material, the insulating film-forming material, and insulating film | JSR CORPORATION (JP) | 2001-12-13 | — | — | US | disclosed |
| EP-1160848-A2 | Composition for silica-based film formation | JSR Corporation (JP) | 2001-12-05 | — | — | EP | disclosed |
| EP-1148105-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-24 | — | — | EP | disclosed |
| EP-1146092-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-17 | — | — | EP | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |