Methacrylic Acid

Methacrylic Acid

SCHEMBL4284469

C=C(C)C(=O)O.C=COCC(OC=C)Oc1ccccc1

nearest known ligand 0.38

Full drug profile on Sugi Atlas →

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 4/20 0.38
MTNR1B P49286 4/20 0.38
PPARG P37231 3/20 0.34
PPARA Q07869 3/20 0.34
KDM4E B2RXH2 2/20 0.33
KMT2A Q03164 2/20 0.33
MEN1 O00255 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
CYP1A2 P05177 1/20 0.33
THRB P10828 1/20 0.33
ALDH1A1 P00352 3/20 0.33
TSHR P16473 1/20 0.33
ELANE P08246 1/20 0.33
LMNA P02545 1/20 0.32
HPGD P15428 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
MAPT P10636 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2468778 0.75 MEN1 (0.36) MTNR1AMTNR1BPPARGPPARAKDM4E
Methacrylic Acid SCHEMBL4292280 0.75 TSHR (0.30) TSHR
SCHEMBL9619094 0.74 MTNR1A (0.30) MTNR1AMTNR1B
SCHEMBL5832624 0.72 ALDH1A1 (0.41) PPARGPPARAKDM4EKMT2AMEN1
Methacrylic Acid SCHEMBL17351290 0.72 MTNR1A (0.45) MTNR1AMTNR1BPPARGPPARAKDM4E
SCHEMBL1404301 0.71 MTNR1A (0.42) MTNR1AMTNR1BPPARGPPARACYP1A2
Methacrylic Acid SCHEMBL8425240 0.71 MTNR1A (0.47) MTNR1AMTNR1BKMT2AMEN1SMN1; SMN2
SCHEMBL357180 0.71 MTNR1A (0.44) MTNR1AMTNR1BKDM4ELMNA
Methacrylic Acid SCHEMBL3013438 0.70 MTNR1A (0.39) MTNR1AMTNR1BPPARGPPARACYP1A2
Methacrylic Acid SCHEMBL2146480 0.70 MTNR1A (0.37) MTNR1AMTNR1BPPARGPPARAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2009061159-A2 COLORED DISPERSION, PHOTORESIST COMPOSITION AND BLACK MATRIX LG CHEM. LTD. (KR) 2009-05-14 WO disclosed