SCHEMBL428858

SCHEMBL428858

CCCC[Si](Oc1ccccc1)(Oc1ccccc1)Oc1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 3/20 0.47
MLNR O43193 1/20 0.39
NR1I2 O75469 1/20 0.39
ESR1 P03372 1/20 0.39
NR3C1 P04150 1/20 0.39
PGR P06401 1/20 0.39
ADRB2 P07550 1/20 0.39
CHRM2 P08172 1/20 0.39
ADRB1 P08588 1/20 0.39
HTR1A P08908 1/20 0.39
ADRA2A P08913 1/20 0.39
ADORA3 P0DMS8 1/20 0.39
CHRM1 P11229 1/20 0.39
DRD2 P14416 1/20 0.39
ADRA2B P18089 1/20 0.39
ADRA2C P18825 1/20 0.39
CHRM3 P20309 1/20 0.39
MAOA P21397 1/20 0.39
CNR1 P21554 1/20 0.39
SLC6A2 P23975 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2400834 0.94 LTA4H (0.47) LTA4HMLNRNR1I2ESR1NR3C1
SCHEMBL31187730 0.92 LTA4H (0.46) LTA4HMLNRNR1I2ESR1NR3C1
SCHEMBL4810179 0.92 LTA4H (0.46) LTA4HMLNRNR1I2ESR1NR3C1
SCHEMBL958899 0.92 LTA4H (0.46) LTA4HMLNRNR1I2ESR1NR3C1
SCHEMBL1608986 0.90 LTA4H (0.43) LTA4HMLNRNR1I2ESR1NR3C1
SCHEMBL19816665 0.90 LTA4H (0.43) LTA4HMLNRNR1I2ESR1NR3C1
SCHEMBL19817014 0.89 LTA4H (0.42) LTA4HMLNRNR1I2ESR1NR3C1
SCHEMBL5142958 0.88 LTA4H (0.39) LTA4HMLNRNR1I2ESR1NR3C1
SCHEMBL423709 0.87 LTA4H (0.41) LTA4HKCNA3MAPTTSHRRECQL
SCHEMBL706489 0.87 KCNA3 (0.44) LTA4HDRD2DRD3KCNH2KCNA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 540 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11059920-B2 Process for producing high cis-1,4-polydiene with lanthanide-based catalyst compositions BRIDGESTONE CORPORATION (JP) 2021-07-13 US claimed
US-20190169330-A1 Process For Producing High Cis-1,4-Polydiene With Lanthanide-Based Catalyst Compositions BRIDGESTONE CORPORATION (JP) 2019-06-06 US claimed
EP-3491030-A1 PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS Bridgestone Corporation (JP) 2019-06-05 EP claimed
WO-2018022994-A1 PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS BRIDGESTONE CORPORATION (JP) 2018-02-01 WO claimed
US-7582712-B1 Alpha-olefins polymerization catalyst FORMOSA PLASTICS CORPORATION, U.S.A. (US) 2009-09-01 US claimed
US-7307036-B2 Highly active alpha-olefin polymerization catalyst FORMOSA PLASTICS CORPORATION U.S.A. (US) 2007-12-11 US claimed
US-20060019821-A1 Highly active alpha-olefin polymerization catalyst FORMOSA PLASTICS CORPORATION, U.S.A. 2006-01-26 US claimed
US-20250282915-A1 METHOD FOR FORMING CURED FILM, METHOD FOR MANUFACTURING IMPRINT MOLD SUBSTRATE, METHOD FOR MANUFACTURING IMPRINT MOLD, METHOD FOR MANUFACTURING RELIEF STRUCTURE, METHOD FOR FORMING PATTERN, METHOD FOR FORMING HARD MASK, METHOD FOR FORMING INSULATING FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE DAI NIPPON PRINTING CO., LTD. (JP) 2025-09-11 US disclosed
US-12344694-B2 Photocurable resin composition for imprinting, method for producing photocurable resin composition for imprinting, and method for producing pattern formed body DAI NIPPON PRINTING CO., LTD. (JP) 2025-07-01 US disclosed
US-20250197552-A1 PHOTOCURABLE RESIN COMPOSITION FOR IMPRINTING, METHOD FOR PRODUCING PHOTOCURABLE RESIN COMPOSITION FOR IMPRINTING, AND METHOD FOR PRODUCING PATTERN FORMED BODY DAI NIPPON PRINTING CO., LTD. (JP) 2025-06-19 US disclosed
CN-118974885-A Method for forming cured film, method for manufacturing substrate for imprint mold, method for manufacturing concave-convex structure, method for forming pattern, method for forming hard mask, method for forming insulating film, and method for manufacturing semiconductor device 大日本印刷株式会社 2024-11-15 CN disclosed
CN-118818897-A Radiation-sensitive composition, cured film, method for producing same, semiconductor element, and display element JSR株式会社 2024-10-22 CN disclosed
WO-2024190380-A1 SILICON-CONTAINING RESIN COMPOSITION PURIFIED PRODUCT MANUFACTURING METHOD, PATTERN FORMATION METHOD, AND SILICON-CONTAINING RESIN COMPOSITION PURIFIED PRODUCT 東京応化工業株式会社 2024-09-19 WO disclosed
EP-0171155-A1 Catalyst component for polymerization of olefins Tonen Corporation (JP) 1986-02-12 EP disclosed
US-4565798-A COORDINATION CATALYSTS, TITANIUM, MAGNESIUM, SILICON COMPOUND TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1986-01-21 US disclosed
EP-0157472-A1 Process for polymerization of olefins TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1985-10-09 EP disclosed
EP-0156512-A1 Process for preparing catalyst component for polymerization of olefins TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1985-10-02 EP disclosed
EP-0147053-A1 A catalyst and a process for polymerization of olefins Tonen Corporation (JP) 1985-07-03 EP disclosed
EP-0145368-A2 Process for producing propylene block copolymers TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1985-06-19 EP disclosed
US-4218354-A HYDROLYZED ORGANOTRIALKOXYSILANE STAUFFER CHEMICAL COMPANY (US) 1980-08-19 US disclosed