Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 4/20 | 0.41 |
| ▸ | CA4 | P22748 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.36 |
| ▸ | CHRNB2 | P17787 | 2/20 | 0.35 |
| ▸ | CHRNB4 | P30926 | 2/20 | 0.35 |
| ▸ | CHRNA3 | P32297 | 2/20 | 0.35 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.35 |
| ▸ | CHRNA4 | P43681 | 2/20 | 0.35 |
| ▸ | CA5A | P35218 | 1/20 | 0.34 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.34 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19816390 | 0.90 | CA4 (0.39) | LTA4HCA4TSHRKCNA3CHRNB2 | |
| SCHEMBL1609512 | 0.90 | CA4 (0.39) | LTA4HCA4TSHRKCNA3CHRNB2 | |
| SCHEMBL11118402 | 0.88 | LTA4H (0.38) | LTA4HCA4TSHRKCNA3CHRNB2 | |
| SCHEMBL19816463 | 0.88 | LTA4H (0.38) | LTA4HCA4TSHRKCNA3CHRNB2 | |
| SCHEMBL428858 | 0.87 | LTA4H (0.47) | LTA4HCA4TSHRKCNA3MAPT | |
| SCHEMBL329176 | 0.85 | LTA4H (0.43) | LTA4HCA4TSHRKCNA3CA5A | |
| SCHEMBL2400834 | 0.85 | LTA4H (0.47) | LTA4HKCNA3MAPT | |
| SCHEMBL31187730 | 0.84 | LTA4H (0.46) | LTA4HTSHR | |
| SCHEMBL958899 | 0.84 | LTA4H (0.46) | LTA4HTSHR | |
| SCHEMBL4810179 | 0.84 | LTA4H (0.46) | LTA4HTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 525 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230046062-A1 | ANTIMICROBIAL COMPOSITIONS AND METHODS OF USING THEREOF | ZEOVATION, INC. | 2023-02-16 | — | — | US | claimed |
| US-11059920-B2 | Process for producing high cis-1,4-polydiene with lanthanide-based catalyst compositions | BRIDGESTONE CORPORATION (JP) | 2021-07-13 | — | — | US | claimed |
| WO-2021113377-A1 | ANTIMICROBIAL COMPOSITIONS AND METHODS OF USING THEREOF | OHIO STATE INNOVATION FOUNDATION (US) | 2021-06-10 | — | — | WO | claimed |
| US-20190169330-A1 | Process For Producing High Cis-1,4-Polydiene With Lanthanide-Based Catalyst Compositions | BRIDGESTONE CORPORATION (JP) | 2019-06-06 | — | — | US | claimed |
| EP-3491030-A1 | PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS | Bridgestone Corporation (JP) | 2019-06-05 | — | — | EP | claimed |
| WO-2018022994-A1 | PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS | BRIDGESTONE CORPORATION (JP) | 2018-02-01 | — | — | WO | claimed |
| US-9546237-B2 | Stabilization of polymers that contain a hydrolyzable functionality | BRIDGESTONE CORPORATION (JP) | 2017-01-17 | — | — | US | claimed |
| US-8378008-B2 | Surface-modified non-halogenated mineral fillers | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2013-02-19 | — | — | US | claimed |
| US-20110009545-A1 | SURFACE-MODIFIED NON-HALOGENATED MINERAL FILLERS | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2011-01-13 | — | — | US | claimed |
| US-7709551-B2 | Coating composition for film with low refractive index and film prepared therefrom | LG CHEM, LTD. (KR) | 2010-05-04 | — | — | US | claimed |
| WO-2006129973-A9 | COATING COMPOSITION FOR FILM WITH LOW REFRACTIVE INDEX AND FILM PREPARED THEREFROM | LG CHEM, LTD. (KR) | 2010-01-21 | — | — | WO | claimed |
| US-20080090926-A1 | Coating Composition for Film with Low Refractive Index and Film Prepared Therefrom | LG CHEM, LTD. (KR) | 2008-04-17 | — | — | US | claimed |
| EP-1784465-A1 | COATING COMPOSITION FOR FILM WITH LOW REFRACTIVE INDEX AND FILM PREPARED THEREFROM | LG Chem, Ltd. (KR) | 2007-05-16 | — | — | EP | claimed |
| WO-2006129973-A1 | COATING COMPOSITION FOR FILM WITH LOW REFRACTIVE INDEX AND FILM PREPARED THEREFROM | LG CHEM, LTD. (KR) | 2006-12-07 | — | — | WO | claimed |
| US-7129311-B2 | Additives to prevent degradation of alkyl-hydrogen siloxanes | ARCH SPECIALTY CHEMICALS, INC. (US) | 2006-10-31 | — | — | US | claimed |
| US-20060159861-A1 | Additives to prevent degradation of alkyl-hydrogen siloxanes | ARCH SPECIALTY CHEMICALS, INC. (US) | 2006-07-20 | — | — | US | claimed |
| EP-1573086-A2 | ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES | Arch Specialty Chemicals, Inc. (US) | 2005-09-14 | — | — | EP | claimed |
| US-20040127070-A1 | Additives to prevent degradation of alkyl-hydrogen siloxanes | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-01 | — | — | US | claimed |
| WO-2004027110-A2 | ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-04-01 | — | — | WO | claimed |
| EP-3864059-B1 | MODIFIED DIENE COPOLYMERS WITH TARGETED AND STABILIZED VISCOSITY | FIRESTONE POLYMERS LLC (US) | 2026-01-14 | — | — | EP | disclosed |
| US-20250179221-A1 | HIGHLY FUNCTIONALIZED STABLE HYDROCARBYLOXYSILYL POLYDIENES AND POLYDIENE COPOLYMERS | BRIDGESTONE AMERICAS TIRE OPERATIONS, LLC | 2025-06-05 | — | — | US | disclosed |
| US-20250092168-A1 | HIGHLY FUNCTIONALIZED STABLE DIHYDROCARBYLOXYSILYL POLYDIENES AND POLYDIENE COPOLYMERS | BRIDGESTONE AMERICAS TIRE OPERATIONS, LLC | 2025-03-20 | — | — | US | disclosed |
| CN-118974885-A | Method for forming cured film, method for manufacturing substrate for imprint mold, method for manufacturing concave-convex structure, method for forming pattern, method for forming hard mask, method for forming insulating film, and method for manufacturing semiconductor device | 大日本印刷株式会社 | 2024-11-15 | — | — | CN | disclosed |
| EP-4460537-A1 | HIGHLY FUNCTIONALIZED STABLE DIHYDROCARBYLOXYSILYL POLYDIENES AND POLYDIENE COPOLYMERS | Bridgestone Americas Tire Operations, LLC (US) | 2024-11-13 | — | — | EP | disclosed |
| CN-118900883-A | Highly functionalized stable hydrocarbyloxysilyl polydienes and polydiene copolymers | 普利司通美国轮胎运营有限责任公司 | 2024-11-05 | — | — | CN | disclosed |
| CN-118818897-A | Radiation-sensitive composition, cured film, method for producing same, semiconductor element, and display element | JSR株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-113614132-B | Photo-curable resin composition for imprinting, method for producing photo-curable resin composition for imprinting, and method for producing pattern-formed body | 大日本印刷株式会社 | 2024-09-20 | — | — | CN | disclosed |
| WO-2024190380-A1 | SILICON-CONTAINING RESIN COMPOSITION PURIFIED PRODUCT MANUFACTURING METHOD, PATTERN FORMATION METHOD, AND SILICON-CONTAINING RESIN COMPOSITION PURIFIED PRODUCT | 東京応化工業株式会社 | 2024-09-19 | — | — | WO | disclosed |
| US-20240262964-A1 | METHOD OF PRODUCING SILICONE POLYMER | TORAY FINE CHEMICALS CO., LTD. (JP) | 2024-08-08 | — | — | US | disclosed |
| EP-4398035-A1 | WAFER EDGE PROTECTIVE-FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MANUFACTURING | Nissan Chemical Corporation (JP) | 2024-07-10 | — | — | EP | disclosed |
| EP-4361201-A1 | METHOD FOR PRODUCING SILICONE POLYMER | Toray Fine Chemicals Co., Ltd. (JP) | 2024-05-01 | — | — | EP | disclosed |
| CN-117836138-A | Substrate with adhesive layer, laminate, and coating composition | 旭化成株式会社 | 2024-04-05 | — | — | CN | disclosed |
| US-11912889-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| CN-117413005-A | Process for producing siloxane polymer | 东丽精细化工株式会社 | 2024-01-16 | — | — | CN | disclosed |
| US-20230381069-A1 | TOPICAL COMPOSITIONS AND METHODS OF USING THEREOF | OHIO STATE INNOVATION FOUNDATION | 2023-11-30 | — | — | US | disclosed |
| CN-116854903-A | Alkoxy silanization PEG cross-linking agent, physical/chemical double-crosslinked hydrogel and application thereof | 复旦大学 | 2023-10-10 | — | — | CN | disclosed |
| WO-2023158819-A1 | HIGHLY FUNCTIONALIZED STABLE HYDROCARBYLOXYSILYL POLYDIENES AND POLYDIENE COPOLYMERS | BRIDGESTONE AMERICAS TIRE OPERATIONS, LLC (US) | 2023-08-24 | — | — | WO | disclosed |
| US-20230257503-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| EP-4212256-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | Mitsubishi Chemical Corporation (JP) | 2023-07-19 | — | — | EP | disclosed |
| WO-2023133557-A1 | HIGHLY FUNCTIONALIZED STABLE DIHYDROCARBYLOXYSILYL POLYDIENES AND POLYDIENE COPOLYMERS | BRIDGESTONE AMERICAS TIRE OPERATIONS, LLC (US) | 2023-07-13 | — | — | WO | disclosed |
| CN-115244109-B | Process for producing siloxane polymer | 东丽精细化工株式会社 | 2023-07-07 | — | — | CN | disclosed |
| CN-116323720-A | Curable resin composition for silicon-containing resist, pattern forming method, method for producing imprint mold, and method for producing semiconductor device | 大日本印刷株式会社 | 2023-06-23 | — | — | CN | disclosed |
| US-20230167244-A1 | METHOD OF PRODUCING SILICONE POLYMER | TORAY FINE CHEMICALS CO., LTD. (JP) | 2023-06-01 | — | — | US | disclosed |
| US-20230046062-A1 | ANTIMICROBIAL COMPOSITIONS AND METHODS OF USING THEREOF | ZEOVATION, INC. | 2023-02-16 | — | — | US | disclosed |
| EP-4119596-A1 | METHOD FOR PRODUCING SILICONE POLYMER | Toray Fine Chemicals Co., Ltd. (JP) | 2023-01-18 | — | — | EP | disclosed |
| US-11542397-B2 | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-03 | — | — | US | disclosed |
| WO-2022270336-A1 | METHOD FOR PRODUCING SILICONE POLYMER | 東レ・ファインケミカル株式会社 | 2022-12-29 | — | — | WO | disclosed |
| US-20220380604-A1 | SURFACE MODIFIED KAOLIN PIGMENT AND METHOD THEREOF | BASF CORPORATION | 2022-12-01 | — | — | US | disclosed |
| CN-112566991-B | Hard coat film, substrate with hard coat film, coating composition, and window material | 旭化成株式会社 | 2022-09-09 | — | — | CN | disclosed |
| US-11413682-B2 | Method for producing surface-modified metal oxide fine particle, method for producing improved metal oxide fine particles, surface-modified metal oxide fine particles, and metal oxide fine particle dispersion liquid | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-08-16 | — | — | US | disclosed |
| CN-110249004-B | Polyimide precursor composition | 东京应化工业株式会社 | 2022-07-19 | — | — | CN | disclosed |
| US-20220220338-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-14 | — | — | US | disclosed |
| US-20220213348-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-07 | — | — | US | disclosed |
| US-11377522-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica-based coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-05 | — | — | US | disclosed |
| EP-3994204-A1 | SURFACE MODIFIED KAOLIN PIGMENT AND METHOD THEREOF | BASF Corporation (US) | 2022-05-11 | — | — | EP | disclosed |
| CN-108389512-B | Laminate, flexible device, and method for producing laminate | 东京应化工业株式会社 | 2022-04-15 | — | — | CN | disclosed |
| WO-2022075361-A1 | CURABLE RESIN COMPOSITION FOR SILICON-CONTAINING RESIST, METHOD FOR FORMING PATTERN, METHOD FOR MANUFACTURING IMPRINT MOLD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 大日本印刷株式会社 | 2022-04-14 | — | — | WO | disclosed |
| EP-3971229-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-03-23 | — | — | EP | disclosed |
| WO-2022054912-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | 三菱ケミカル株式会社 | 2022-03-17 | — | — | WO | disclosed |
| EP-3957678-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2022-02-23 | — | — | EP | disclosed |
| CN-114026180-A | Surface modified kaolin pigments and methods therefor | 巴斯夫公司 | 2022-02-08 | — | — | CN | disclosed |
| CN-108250754-B | Silicon-containing resin composition, silicon-containing resin film, silica film, light-emitting display element panel, and light-emitting display device | 东京应化工业株式会社 | 2022-01-25 | — | — | CN | disclosed |
| CN-108387954-B | Laminate, flexible device, and method for producing laminate | 东京应化工业株式会社 | 2022-01-18 | — | — | CN | disclosed |
| US-20210395462-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2021-12-23 | — | — | US | disclosed |
| CN-108699392-B | High-durability antifogging coating film and coating composition | 旭化成株式会社 | 2021-11-23 | — | — | CN | disclosed |
| US-20210340286-A1 | Modified Diene Copolymers With Targeted And Stabilized Viscosity | FIRESTONE POLYMERS, LLC (US) | 2021-11-04 | — | — | US | disclosed |
| CN-109715680-B | Process for preparing high cis-1, 4-polydienes with lanthanide-based catalyst compositions | 株式会社普利司通 | 2021-10-19 | — | — | CN | disclosed |
| US-20210309866-A1 | LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LIGHT-EMITTING DISPLAY ELEMENT PANEL, AND LIGHT-EMITTING DISPLAY DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-10-07 | — | — | US | disclosed |
| CN-107709464-B | Silicon-containing resin composition | 东京应化工业株式会社 | 2021-09-28 | — | — | CN | disclosed |
| EP-3864059-A1 | MODIFIED DIENE COPOLYMERS WITH TARGETED AND STABILIZED VISCOSITY | Firestone Polymers, LLC (US) | 2021-08-18 | — | — | EP | disclosed |
| CN-109641835-B | Method for producing carbamate | 国立研究开发法人产业技术综合研究所 | 2021-07-20 | — | — | CN | disclosed |
| US-11059920-B2 | Process for producing high cis-1,4-polydiene with lanthanide-based catalyst compositions | BRIDGESTONE CORPORATION (JP) | 2021-07-13 | — | — | US | disclosed |
| WO-2021113377-A1 | ANTIMICROBIAL COMPOSITIONS AND METHODS OF USING THEREOF | OHIO STATE INNOVATION FOUNDATION (US) | 2021-06-10 | — | — | WO | disclosed |
| EP-3508473-B1 | METHOD FOR PRODUCING CARBAMIC ACID ESTER | AIST (JP) | 2021-05-26 | — | — | EP | disclosed |
| EP-3812805-A1 | LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LUMINESCENT DISPLAY ELEMENT PANEL, AND LUMINESCENT DISPLAY DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-04-28 | — | — | EP | disclosed |
| CN-112566991-A | Hard coat film, substrate with hard coat film, coating composition, and window material | 旭化成株式会社 | 2021-03-26 | — | — | CN | disclosed |
| EP-3491030-B1 | PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS | BRIDGESTONE CORP (JP) | 2021-03-24 | — | — | EP | disclosed |
| US-10954340-B2 | Polyimide precursor composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-03-23 | — | — | US | disclosed |
| CN-112334795-A | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | 东京应化工业株式会社 | 2021-02-05 | — | — | CN | disclosed |
| WO-2021003182-A1 | SURFACE MODIFIED KAOLIN PIGMENT AND METHOD THEREOF | BASF CORPORATION (US) | 2021-01-07 | — | — | WO | disclosed |
| WO-2020235325-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER | 東京応化工業株式会社 (JP) | 2020-11-26 | — | — | WO | disclosed |
| WO-2020230828-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | 東京応化工業株式会社 | 2020-11-19 | — | — | WO | disclosed |
| US-20200362115-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA-BASED COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-11-19 | — | — | US | disclosed |
| CN-107429059-B | Energy-sensitive resin composition | 东京应化工业株式会社 | 2020-10-23 | — | — | CN | disclosed |
| CN-111684030-A | High-durability antifogging coating film and coating composition | 旭化成株式会社 | 2020-09-18 | — | — | CN | disclosed |
| CN-107922733-B | Polyimide precursor composition | 东京应化工业株式会社 | 2020-09-11 | — | — | CN | disclosed |
| EP-3705534-A1 | SILICON-CONTAINING RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-09-09 | — | — | EP | disclosed |
| US-20200270456-A1 | SILICON-CONTAINING RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2020-08-27 | — | — | US | disclosed |
| US-10752579-B2 | Production method of carbamic acid ester | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2020-08-25 | — | — | US | disclosed |
| US-10696845-B2 | Energy-sensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-30 | — | — | US | disclosed |
| US-10689514-B2 | Silicon-containing resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-23 | — | — | US | disclosed |
| US-20200179243-A1 | TOPICAL COMPOSITIONS AND METHODS OF USING THEREOF | OHIO STATE INNOVATION FOUNDATION (US) | 2020-06-11 | — | — | US | disclosed |
| US-20200139433-A1 | METHOD FOR PRODUCING SURFACE-MODIFIED METAL OXIDE FINE PARTICLE, METHOD FOR PRODUCING IMPROVED METAL OXIDE FINE PARTICLES, SURFACE-MODIFIED METAL OXIDE FINE PARTICLES, AND METAL OXIDE FINE PARTICLE DISPERSION LIQUID | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-05-07 | — | — | US | disclosed |
| EP-3318606-B1 | SILICON-CONTAINING RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2020-03-18 | — | — | EP | disclosed |
| WO-2020045632-A1 | HARD COATING FILM, BASE MATERIAL WITH HARD COATING FILM, COATING COMPOSITION AND WINDOW MATERIAL | 旭化成株式会社 | 2020-03-05 | — | — | WO | disclosed |
| EP-3275940-B1 | ENERGY-SENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2019-12-18 | — | — | EP | disclosed |
| WO-2019163918-A1 | HIGH-DURABILITY ANTIFOGGING COATING FILM AND COATING COMPOSITION | 旭化成株式会社 | 2019-08-29 | — | — | WO | disclosed |
| US-20190225804-A1 | ENERGY-SENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-25 | — | — | US | disclosed |
| EP-3508473-A1 | METHOD FOR PRODUCING CARBAMIC ACID ESTER | National Institute of Advanced Industrial Science and Technology (JP) | 2019-07-10 | — | — | EP | disclosed |
| US-20190185420-A1 | PRODUCTION METHOD OF CARBAMIC ACID ESTER | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2019-06-20 | — | — | US | disclosed |
| US-20190169330-A1 | Process For Producing High Cis-1,4-Polydiene With Lanthanide-Based Catalyst Compositions | BRIDGESTONE CORPORATION (JP) | 2019-06-06 | — | — | US | disclosed |
| EP-3491030-A1 | PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS | Bridgestone Corporation (JP) | 2019-06-05 | — | — | EP | disclosed |
| EP-3490569-A1 | TOPICAL COMPOSITIONS AND METHODS OF USING THEREOF | Ohio State Innovation Foundation (US) | 2019-06-05 | — | — | EP | disclosed |
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| EP-3330320-B1 | POLYIMIDE PRECURSOR COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2019-04-24 | — | — | EP | disclosed |
| EP-1870439-B1 | Conductive tin oxide sol and process for producing same | NISSAN CHEMICAL CORP (JP) | 2018-10-03 | — | — | EP | disclosed |
| US-20180223045-A1 | POLYIMIDE PRECURSOR COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-08-09 | — | — | US | disclosed |
| US-10025188-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20180187010-A1 | SILICON-CONTAINING RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-07-05 | — | — | US | disclosed |
| EP-1641063-B1 | POLYMER ELECTROLYTE, POLYMER ELECTROLYTE MEMBRANE THEREFROM, MEMBRANE ELECTRODE ASSEMBLY AND POLYMER ELECTROLYTE FUEL CELL | TORAY INDUSTRIES (JP) | 2018-06-20 | — | — | EP | disclosed |
| EP-3330320-A1 | POLYIMIDE PRECURSOR COMPOSITION | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2018-06-06 | — | — | EP | disclosed |
| EP-3318606-A1 | SILICON-CONTAINING RESIN COMPOSITION | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2018-05-09 | — | — | EP | disclosed |
| WO-2018023128-A1 | TOPICAL COMPOSITIONS AND METHODS OF USING THEREOF | OHIO STATE INNOVATION FOUNDATION (US) | 2018-02-01 | — | — | WO | disclosed |
| WO-2018022994-A1 | PROCESS FOR PRODUCING HIGH CIS-1,4-POLYDIENE WITH LANTHANIDE-BASED CATALYST COMPOSITIONS | BRIDGESTONE CORPORATION (JP) | 2018-02-01 | — | — | WO | disclosed |
| EP-3275940-A1 | ENERGY-SENSITIVE RESIN COMPOSITION | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2018-01-31 | — | — | EP | disclosed |
| US-9870924-B2 | Diffusion agent composition, method of forming impurity diffusion layer, and solar cell | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-01-16 | — | — | US | disclosed |
| EP-2131423-B1 | NEGATIVE ELECTRODE BASE MEMBER | TOKYO OHKA KOGYO CO LTD (JP) | 2017-11-15 | — | — | EP | disclosed |
| US-20170322492-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| EP-2573800-B1 | DIFFUSION AGENT COMPOSITION AND METHOD OF FORMING AN IMPURITY DIFFUSION LAYER | TOKYO OHKA KOGYO CO LTD (JP) | 2017-11-08 | — | — | EP | disclosed |
| EP-1930298-B1 | ZIRCONIUM OXIDE-TIN OXIDE COMPOSITE SOL, COATING COMPOSITION AND OPTICAL MEMBER | NISSAN CHEMICAL IND LTD (JP) | 2017-10-04 | — | — | EP | disclosed |
| WO-2017144401-A1 | LUMINESCENT PARTICLES | BASF SE (DE) | 2017-08-31 | — | — | WO | disclosed |
| US-9708492-B2 | LED device and coating liquid used for production of same | Konica Minolta, Inc. (JP) | 2017-07-18 | — | — | US | disclosed |
| WO-2017036997-A1 | PROCESS FOR FORMULATING QUANTUM DOTS | BASF SE (DE) | 2017-03-09 | — | — | WO | disclosed |
| US-9546237-B2 | Stabilization of polymers that contain a hydrolyzable functionality | BRIDGESTONE CORPORATION (JP) | 2017-01-17 | — | — | US | disclosed |
| EP-2181147-B1 | POLYMER COMPOSITIONS CONTAINING SURFACE-MODIFIED NON-HALOGENATED MINERAL FILLERS | MOMENTIVE PERFORMANCE MAT INC (US) | 2017-01-11 | — | — | EP | disclosed |
| US-20160320705-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-11-03 | — | — | US | disclosed |
| US-9434609-B2 | Method for forming pattern, and polysiloxane composition | JSR CORPORATION (JP) | 2016-09-06 | — | — | US | disclosed |
| US-9329478-B2 | Polysiloxane composition and pattern-forming method | JSR CORPORATION (JP) | 2016-05-03 | — | — | US | disclosed |
| US-20160097978-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-04-07 | — | — | US | disclosed |
| US-9268229-B2 | Composition for forming resist underlayer film, and pattern-forming method | JSR CORPORATION (JP) | 2016-02-23 | — | — | US | disclosed |
| US-9250526-B2 | Composition for forming resist underlayer film, and pattern-forming method | JSR CORPORATION (JP) | 2016-02-02 | — | — | US | disclosed |
| US-20160027946-A1 | OPTICAL DEVICE | JSR CORPORATION (JP) | 2016-01-28 | — | — | US | disclosed |
| US-9233840-B2 | Method for improving self-assembled polymer features | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-01-12 | — | — | US | disclosed |
| US-20160002526-A1 | PHOSPHOR DISPERSION, LED DEVICE AND METHOD FOR MANUFACTURING SAME | Konica Minolta, Inc. (JP) | 2016-01-07 | — | — | US | disclosed |
| US-20150355546-A1 | COMPOSITION FOR SILICON-CONTAINING FILM FORMATION, PATTERN-FORMING METHOD, AND POLYSILOXANE COMPOUND | JSR CORPORATION (JP) | 2015-12-10 | — | — | US | disclosed |
| US-20150353740-A1 | LED DEVICE AND COATING LIQUID USED FOR PRODUCTION OF SAME | Konica Minolta, Inc. (JP) | 2015-12-10 | — | — | US | disclosed |
| US-20150333233-A1 | LIGHT EMITTING DEVICE | Konica Minolta, Inc. (JP) | 2015-11-19 | — | — | US | disclosed |
| EP-2945197-A1 | LED DEVICE AND COATING LIQUID USED FOR PRODUCTION OF SAME | Konica Minolta, Inc. (JP) | 2015-11-18 | — | — | EP | disclosed |
| US-9190276-B2 | Method of diffusing impurity-diffusing component and method of manufacturing solar cell | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9184352-B2 | Phosphor dispersion liquid, and production method for LED device using same | Konica Minolta, Inc. (JP) | 2015-11-10 | — | — | US | disclosed |
| EP-2940743-A1 | LIGHT EMITTING DEVICE | Konica Minolta, Inc. (JP) | 2015-11-04 | — | — | EP | disclosed |
| EP-2940748-A1 | COATING LIQUID, AND LED DEVICE PROVIDED WITH REFLECTIVE LAYER THAT IS FORMED OF CURED PRODUCT OF SAID COATING LIQUID | Konica Minolta, Inc. (JP) | 2015-11-04 | — | — | EP | disclosed |
| EP-2940744-A1 | PHOSPHOR DISPERSION, LED DEVICE AND METHOD FOR MANUFACTURING SAME | Konica Minolta, Inc. (JP) | 2015-11-04 | — | — | EP | disclosed |
| US-9175215-B2 | Method for producing phosphor dispersion liquid and method for manufacturing LED device | Konica Minolta, Inc. (JP) | 2015-11-03 | — | — | US | disclosed |
| US-20150307717-A1 | COATING LIQUID AND LED DEVICE INCLUDING REFLECTIVE LAYER MADE OF PRODUCT OF CURING THEREOF | Konica Minolta, Inc. (JP) | 2015-10-29 | — | — | US | disclosed |
| US-9170492-B2 | Silicon-containing film-forming composition, silicon-containing film, and pattern forming method | JSR CORPORATION (JP) | 2015-10-27 | — | — | US | disclosed |
| US-9140985-B2 | — | — | 2015-09-22 | — | — | US | disclosed |
| US-9126231-B2 | Insulation pattern-forming method and insulation pattern-forming material | JSR CORPORATION (JP) | 2015-09-08 | — | — | US | disclosed |
| US-9116427-B2 | Composition for forming resist underlayer film and pattern-forming method | JSR CORPORATION (JP) | 2015-08-25 | — | — | US | disclosed |
| US-9105929-B2 | Negative electrode base member | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-08-11 | — | — | US | disclosed |
| US-20150221837-A1 | SEALANT FOR LED DEVICE, LED DEVICE, AND METHOD FOR PRODUCING LED DEVICE | Konica Minolta, Inc. (JP) | 2015-08-06 | — | — | US | disclosed |
| US-20150160556-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-06-11 | — | — | US | disclosed |
| US-20150162511-A1 | LED DEVICE AND METHOD FOR MANUFACTURING SAME | Konica Minolta, Inc. (JP) | 2015-06-11 | — | — | US | disclosed |
| US-9050624-B2 | Film-forming composition for imprinting, method of manufacturing a structure, and structure | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-09 | — | — | US | disclosed |
| EP-2879195-A1 | LED DEVICE AND METHOD FOR MANUFACTURING SAME | Konica Minolta, Inc. (JP) | 2015-06-03 | — | — | EP | disclosed |
| US-9048175-B2 | Diffusion-agent composition for forming an impurity-diffusing agent layer on a semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20150140700-A1 | METHOD FOR PRODUCING PHOSPHOR DISPERSION LIQUID AND METHOD FOR MANUFACTURING LED DEVICE | Konica Minolta, Inc. (JP) | 2015-05-21 | — | — | US | disclosed |
| US-20150118773-A1 | PHOSPHOR DISPERSION LIQUID, AND PRODUCTION METHOD FOR LED DEVICE USING SAME | Konica Minolta, Inc. (JP) | 2015-04-30 | — | — | US | disclosed |
| EP-2853577-A1 | METHOD FOR PRODUCING PHOSPHOR DISPERSION LIQUID AND METHOD FOR MANUFACTURING LED DEVICE | Konica Minolta, Inc. (JP) | 2015-04-01 | — | — | EP | disclosed |
| US-8993223-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-20150050600-A9 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-02-19 | — | — | US | disclosed |
| US-20150048046-A1 | METHOD FOR FORMING PATTERN, AND POLYSILOXANE COMPOSITION | JSR CORPORATION (JP) | 2015-02-19 | — | — | US | disclosed |
| US-8956807-B2 | Method for forming resist pattern, and composition for forming resist underlayer film | JSR CORPORATION (JP) | 2015-02-17 | — | — | US | disclosed |
| US-8934165-B2 | Electrophoretic particle, manufacturing method of electrophoretic particle, electrophoretic dispersed liquid, electrophoretic sheet, electrophoretic apparatus, and electronic equipment | SEIKO EPSON CORPORATION (JP) | 2015-01-13 | — | — | US | disclosed |
| US-8927147-B2 | Negative electrode base member | KANTO GAKUIN SCHOOL CORPORATION (JP) | 2015-01-06 | — | — | US | disclosed |
| US-8927201-B2 | Multilayer resist process pattern-forming method and multilayer resist process inorganic film-forming composition | JSR CORPORATION (JP) | 2015-01-06 | — | — | US | disclosed |
| EP-2800154-A1 | SEALANT FOR LED DEVICE, LED DEVICE, AND METHOD FOR PRODUCING LED DEVICE | Konica Minolta, Inc. (JP) | 2014-11-05 | — | — | EP | disclosed |
| US-8822034-B2 | Film-forming composition, diffusing agent composition, method for manufacturing film-forming composition, and method for manufacturing diffusing agent composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-09-02 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20140227865-A1 | DIFFUSION-AGENT COMPOSITION, METHOD FOR FORMING IMPURITY-DIFFUSION LAYER, AND SOLAR CELL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-14 | — | — | US | disclosed |
| EP-2138501-B1 | Functional silane compound, coating solution, and method for manufacturing plastic lens | HOYA CORP (JP) | 2014-08-13 | — | — | EP | disclosed |
| EP-2752898-A1 | PHOSPHOR DISPERSION LIQUID, AND PRODUCTION METHOD FOR LED DEVICE USING SAME | Konica Minolta, Inc. (JP) | 2014-07-09 | — | — | EP | disclosed |
| US-8748301-B2 | Diffusing agent composition for ink-jet, and method for production of electrode or solar battery using the composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-06-10 | — | — | US | disclosed |
| US-8734906-B2 | Films and method of production thereof | BRISMAT INC. (US) | 2014-05-27 | — | — | US | disclosed |
| US-8734904-B2 | Methods of forming topographical features using segregating polymer mixtures | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-27 | — | — | US | disclosed |
| US-20140134544-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2014-05-15 | — | — | US | disclosed |
| US-8703395-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2014-04-22 | — | — | US | disclosed |
| EP-2472655-B1 | Negative electrode base member | TOKYO OHKA KOGYO CO LTD (JP) | 2014-03-12 | — | — | EP | disclosed |
| US-8669042-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2014-03-11 | — | — | US | disclosed |
| US-20140030839-A1 | METHOD OF DIFFUSING IMPURITY-DIFFUSING COMPONENT AND METHOD OF MANUFACTURING SOLAR CELL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-01-30 | — | — | US | disclosed |
| US-20140030660-A1 | MULTILAYER RESIST PROCESS PATTERN-FORMING METHOD AND MULTILAYER RESIST PROCESS INORGANIC FILM-FORMING COMPOSITION | JSR CORPORATION (JP) | 2014-01-30 | — | — | US | disclosed |
| US-20130331520-A1 | STABILIZATION OF POLYMERS THAT CONTAIN A HYDROLYZABLE FUNCTIONALITY | BRIDGESTONE CORPORATION (JP) | 2013-12-12 | — | — | US | disclosed |
| US-20130281592-A1 | FILM-FORMING COMPOSITION, DIFFUSING AGENT COMPOSITION, METHOD FOR MANUFACTURING FILM-FORMING COMPOSITION, AND METHOD FOR MANUFACTURING DIFFUSING AGENT COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-10-24 | — | — | US | disclosed |
| US-20130265632-A1 | ELECTROPHORETIC PARTICLE, MANUFACTURING METHOD OF ELECTROPHORETIC PARTICLE, ELECTROPHORETIC DISPERSED LIQUID, ELECTROPHORETIC SHEET, ELECTROPHORETIC APPARATUS, AND ELECTRONIC EQUIPMENT | SEIKO EPSON CORPORATION (JP) | 2013-10-10 | — | — | US | disclosed |
| US-8551651-B2 | Secondary cell having negative electrode base member | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-10-08 | — | — | US | disclosed |
| US-20130256264-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-10-03 | — | — | US | disclosed |
| US-20130252098-A1 | NEGATIVE ELECTRODE BASE MEMBER | KANTO GAKUIN UNIVERSITY SURFACE ENGINEERING RESEARCH INSTITUTE (JP) | 2013-09-26 | — | — | US | disclosed |
| US-20130252099-A1 | NEGATIVE ELECTRODE BASE MEMBER | KANTO GAKUIN UNIVERSITY SURFACE ENGINEERING RESEARCH INSTITUTE (JP) | 2013-09-26 | — | — | US | disclosed |
| US-20130233825-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-09-12 | — | — | US | disclosed |
| US-20130233826-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-09-12 | — | — | US | disclosed |
| EP-2615497-A1 | RESIST PATTERN FORMING METHOD | JSR Corporation (JP) | 2013-07-17 | — | — | EP | disclosed |
| US-8475690-B2 | Diffusing agent composition, method of forming impurity diffusion layer, and solar battery | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-07-02 | — | — | US | disclosed |
| US-8466229-B2 | Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film | HITACHI CHEMICAL CO., LTD. (JP) | 2013-06-18 | — | — | US | disclosed |
| EP-1746122-B1 | METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR CORP (JP) | 2013-06-12 | — | — | EP | disclosed |
| US-8455141-B2 | Polymer electrolyte as well as polymer electrolyte membrane, membrane electrode assembly and polymer electrolyte fuel cell using the same | TORAY INDUSTRIES, INC. (JP) | 2013-06-04 | — | — | US | disclosed |
| US-8450045-B2 | Pattern forming method | JSR CORPORATION (JP) | 2013-05-28 | — | — | US | disclosed |
| US-20130130179-A1 | POLYSILOXANE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-05-23 | — | — | US | disclosed |
| US-20130109123-A1 | DIFFUSING AGENT COMPOSITION AND METHOD OF FORMING IMPURITY DIFFUSION LAYER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-02 | — | — | US | disclosed |
| US-20130107235-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| WO-2013061601-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-05-02 | — | — | WO | disclosed |
| US-20130101942-A1 | METHOD FOR FORMING RESIST PATTERN, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2013-04-25 | — | — | US | disclosed |
| EP-2579304-A1 | INSULATION PATTERN FORMING METHOD AND INSULATION PATTERN FORMING MATERIAL FOR DAMASCENE PROCESS | JSR Corporation (JP) | 2013-04-10 | — | — | EP | disclosed |
| US-20130084394-A1 | INSULATION PATTERN-FORMING METHOD AND INSULATION PATTERN-FORMING MATERIAL | JSR CORPORATION (JP) | 2013-04-04 | — | — | US | disclosed |
| EP-2573800-A1 | DIFFUSION AGENT COMPOSITION, METHOD OF FORMING AN IMPURITY DIFFUSION LAYER, AND SOLAR CELL | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2013-03-27 | — | — | EP | disclosed |
| US-8404786-B2 | Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same | JSR CORPORATION (JP) | 2013-03-26 | — | — | US | disclosed |
| EP-1705208-B1 | COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM, AND METHOD FOR FORMING SAME | JSR CORP (JP) | 2013-03-20 | — | — | EP | disclosed |
| US-20130061922-A1 | DIFFUSION AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR CELL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-14 | — | — | US | disclosed |
| US-8378008-B2 | Surface-modified non-halogenated mineral fillers | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2013-02-19 | — | — | US | disclosed |
| US-8362199-B2 | Borazine-based resin, process for its production, borazine-based resin composition, insulating film and method for its formation | HITACHI CHEMICAL CO., LTD. (JP) | 2013-01-29 | — | — | US | disclosed |
| EP-1705207-B1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR CORP (JP) | 2012-10-24 | — | — | EP | disclosed |
| US-8283260-B2 | Process for restoring dielectric properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-09 | — | — | US | disclosed |
| US-8268403-B2 | Curing a coating of a siloxane compound and a carbosilane compound using ultraviolet radiation; a low relative dielectric constant, excellent chemical resistance, plasma resistance, mechanical strength | JSR CORPORATION (JP) | 2012-09-18 | — | — | US | disclosed |
| US-20120231575-A1 | METHOD FOR PRODUCING SOLAR CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-09-13 | — | — | US | disclosed |
| EP-2495771-A1 | SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2012-09-05 | — | — | EP | disclosed |
| EP-2495770-A1 | METHOD FOR PRODUCING SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2012-09-05 | — | — | EP | disclosed |
| US-8253251-B2 | Method for producing low-k film, semiconductor device, and method for manufacturing the same | ELPIDA MEMORY, INC. (JP) | 2012-08-28 | — | — | US | disclosed |
| US-20120211076-A1 | SOLAR CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-08-23 | — | — | US | disclosed |
| US-20120183908-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| EP-2472655-A1 | Negative electrode base member | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2012-07-04 | — | — | EP | disclosed |
| US-20120135146-A1 | METHODS OF FORMING TOPOGRAPHICAL FEATURES USING SEGREGATING POLYMER MIXTURES | JSR CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20120122036-A1 | PATTERN FORMING METHOD | JSR CORPORATION (JP) | 2012-05-17 | — | — | US | disclosed |
| US-8173348-B2 | Method of forming pattern and composition for forming of organic thin-film for use therein | JSR CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20120103935-A1 | METHOD FOR IMPROVING SELF-ASSEMBLED POLYMER FEATURES | JSR CORPORATION (JP) | 2012-05-03 | — | — | US | disclosed |
| US-8158568-B2 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-04-17 | — | — | US | disclosed |
| US-8158981-B2 | Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-04-17 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-8119324-B2 | Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film | JSR CORPORATION (JP) | 2012-02-21 | — | — | US | disclosed |
| US-20120021190-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING SILICA COATING FILM, AND APPARATUS AND MEMBER EACH COMPRISING SILICA COATING FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-01-26 | — | — | US | disclosed |
| US-20110313122-A1 | BORAZINE-BASED RESIN, PROCESS FOR ITS PRODUCTION, BORAZINE-BASED RESIN COMPOSITION, INSULATING FILM AND METHOD FOR ITS FORMATION | MATSUTANI HIROSHI (JP) | 2011-12-22 | — | — | US | disclosed |
| US-20110254191-A1 | FILM-FORMING COMPOSITION FOR IMPRINTING, METHOD OF MANUFACTURING A STRUCTURE, AND STRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-10-20 | — | — | US | disclosed |
| US-8034545-B2 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2011-10-11 | — | — | US | disclosed |
| EP-1160848-B1 | Composition for silica-based film formation | JSR CORP (JP) | 2011-10-05 | — | — | EP | disclosed |
| US-8030221-B2 | Method for producing low-k l film, semiconductor device, and method for manufacturing the same | ELPIDA MEMORY, INC. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-20110223329-A1 | Films and method of production thereof | UNIVERSITY OF QUEENSLAND (AU) | 2011-09-15 | — | — | US | disclosed |
| EP-1981074-B1 | ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR CORP (JP) | 2011-06-22 | — | — | EP | disclosed |
| US-7939590-B2 | Composition for forming silica-based coating film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-05-10 | — | — | US | disclosed |
| US-7932295-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2011-04-26 | — | — | US | disclosed |
| US-20110079262-A1 | DIFFUSING AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR BATTERY | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-07 | — | — | US | disclosed |
| US-7919016-B2 | Conductive tin oxide sol and process for producing same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-20110077364-A1 | COMPOSITION CONTAINING SILICON-CONTAINING POLYMER, CURED PRODUCT OF THE COMPOSITION, SILICON-CONTAINING POLYMER, AND METHOD OF PRODUCING THE SILICON-CONTAINING POLYMER | JSR CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| US-7893538-B2 | Organic silica film and method for forming same, composition for forming insulating film of semiconductor device and method for producing same, wiring structure and semiconductor device | JSR CORPORATION (JP) | 2011-02-22 | — | — | US | disclosed |
| EP-1323742-B1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORP (JP) | 2011-02-16 | — | — | EP | disclosed |
| US-20110017291-A1 | DIFFUSING AGENT COMPOSITION FOR INK-JET, AND METHOD FOR PRODUCTION OF ELECTRODE OR SOLAR BATTERY USING THE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-01-27 | — | — | US | disclosed |
| US-7875317-B2 | formed by hydrolyzing and condensing a siloxy compound in the presence of a polycarbosilane; low relative dielectric constant and excellent mechanical strength, storage stability, and chemical resistance; semiconductors | JSR CORPORATION (JP) | 2011-01-25 | — | — | US | disclosed |
| US-20110009545-A1 | SURFACE-MODIFIED NON-HALOGENATED MINERAL FILLERS | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2011-01-13 | — | — | US | disclosed |
| US-20100289143-A1 | METHOD FOR PRODUCING LOW-k FILM, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE SAME | ELPIDA MEMORY, INC (JP) | 2010-11-18 | — | — | US | disclosed |
| EP-1641908-B1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO LTD (JP) | 2010-11-17 | — | — | EP | disclosed |
| US-20100248477-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating a substrate therewith | YOKOI SHIGERU | 2010-09-30 | — | — | US | disclosed |
| EP-1296365-B1 | Method of film formation | JSR CORP (JP) | 2010-09-22 | — | — | EP | disclosed |
| US-20100233635-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN | JSR CORPORATION (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100233632-A1 | SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, AND PATTERN FORMING METHOD | JSR CORPORATION (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100207076-A1 | Conductive tin oxide sol and process for producing same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-08-19 | — | — | US | disclosed |
| US-20100178620-A1 | INVERTED PATTERN FORMING METHOD AND RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-07-15 | — | — | US | disclosed |
| US-20100168327-A1 | POLYMER AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR FORMING INSULATING FILM, AND INSULATING FILM AND METHOD OF FORMING THE SAME | JSR CORPORATION (JP) | 2010-07-01 | — | — | US | disclosed |
| US-20100167024-A1 | NEGATIVE-TONE RADIATION-SENSITIVE COMPOSITION, CURED PATTERN FORMING METHOD, AND CURED PATTERN | JSR CORPORATION (JP) | 2010-07-01 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-7736748-B2 | Insulating-film-forming composition, method of producing the same, silica-based insulating film, and method of forming the same | JSR CORPORATION (JP) | 2010-06-15 | — | — | US | disclosed |
| US-7736837-B2 | Antireflective coating composition based on silicon polymer | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-06-15 | — | — | US | disclosed |
| US-7718708-B2 | Anhydrous zinc antimonate sol and process for producing same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-05-18 | — | — | US | disclosed |
| US-20100119939-A1 | NEGATIVE ELECTRODE BASE MEMBER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-13 | — | — | US | disclosed |
| US-20100119736-A1 | AMBIENT PRESSURE SYNTHESIS OF ZEOLITE FILMS AND THEIR APPLICATION AS CORROSION RESISTANT COATINGS | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2010-05-13 | — | — | US | disclosed |
| EP-2181147-A2 | POLYMER COMPOSITIONS CONTAINING SURFACE-MODIFIED NON-HALOGENATED MINERAL FILLERS | Momentive Performance Materials Inc. (US) | 2010-05-05 | — | — | EP | disclosed |
| US-7709551-B2 | Coating composition for film with low refractive index and film prepared therefrom | LG CHEM, LTD. (KR) | 2010-05-04 | — | — | US | disclosed |
| US-20100102321-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COATING FILM, SILICA-BASED COATING FILM, APPARATUS AND MEMBER HAVING SILICA-BASED COATING FILM AND PHOTOSENSITIZING AGENT FOR INSULATING FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-04-29 | — | — | US | disclosed |
| US-20100093969-A1 | Process for making siloxane polymers | ZHANG RUZHI | 2010-04-15 | — | — | US | disclosed |
| US-7687590-B2 | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-03-30 | — | — | US | disclosed |
| US-7682701-B2 | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL CO., LTD. (JP) | 2010-03-23 | — | — | US | disclosed |
| US-20100051582-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | YOKOI SHIGERU | 2010-03-04 | — | — | US | disclosed |
| US-20100041234-A1 | Process For Restoring Dielectric Properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-02-18 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| WO-2006129973-A9 | COATING COMPOSITION FOR FILM WITH LOW REFRACTIVE INDEX AND FILM PREPARED THEREFROM | LG CHEM, LTD. (KR) | 2010-01-21 | — | — | WO | disclosed |
| US-20100007025-A1 | ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2138501-A2 | Functional silane compound, coating solution, and method for manufacturing plastic lens | Hoya Corporation (JP) | 2009-12-30 | — | — | EP | disclosed |
| US-20090317541-A1 | FUNCTIONAL SILANE COMPOUND, COATING SOLUTION, AND METHOD FOR MANUFACTURING PLASTIC LENS | HOYA CORPORATION (JP) | 2009-12-24 | — | — | US | disclosed |
| US-20090311622-A1 | METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM, AND COMPOSITION FOR FORMING UNDER-LAYER FILM | JSR CORPORATION (JP) | 2009-12-17 | — | — | US | disclosed |
| EP-2132253-A1 | PROCESS FOR MAKING SILOXANE POLYMERS | AZ Electronic Materials USA Corp. (US) | 2009-12-16 | — | — | EP | disclosed |
| EP-2131423-A1 | NEGATIVE ELECTRODE BASE MEMBER | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2009-12-09 | — | — | EP | disclosed |
| EP-2129733-A2 | ANTIREFLECTIVE COATING COMPOSITION BASED ON A SILICON POLYMER | AZ Electronic Materials USA Corp. (US) | 2009-12-09 | — | — | EP | disclosed |
| US-20090298671-A1 | Compositions for Preparing Low Dielectric Materials Containing Solvents | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-12-03 | — | — | US | disclosed |
| US-7625642-B2 | Borazine-based resin, and method for production thereof, borazine based resin composition, insulating coating and method for formation thereof, and electronic parts having the insulating coating | HITACHI CHEMICAL CO., LTD (JP) | 2009-12-01 | — | — | US | disclosed |
| EP-1090967-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORP (JP) | 2009-11-11 | — | — | EP | disclosed |
| US-20090251652-A1 | Silica based positive type photosensitive organic compound | HITACHI CHEMICAL CO., LTD. | 2009-10-08 | — | — | US | disclosed |
| US-20090240017-A1 | Borazine-based resin, process for its production, borazine-based resin composition, insulating film and method for its formation | HITACHI CHEMICAL CO., LTD. (JP) | 2009-09-24 | — | — | US | disclosed |
| US-20090220897-A1 | RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE | HITACHI CHEMICAL CO., LTD. (JP) | 2009-09-03 | — | — | US | disclosed |
| US-20090214796-A1 | Method for Forming Antireflection Film | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2009-08-27 | — | — | US | disclosed |
| US-20090186203-A1 | FILM-FORMING COMPOSITION FOR IMPRINTING, METHOD OF MANUFACTURING STRUCTURE, AND STRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| US-7556860-B2 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| US-7556682-B2 | Zirconium oxide-tin oxide composite sol, coating composition and optical member | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-07-07 | — | — | US | disclosed |
| US-20090156005-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | YOKOI SHIGERU | 2009-06-18 | — | — | US | disclosed |
| US-7531590-B2 | Additives to prevent degradation of alkyl-hydrogen siloxanes | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2009-05-12 | — | — | US | disclosed |
| US-7528207-B2 | Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film | JSR CORPORATION (JP) | 2009-05-05 | — | — | US | disclosed |
| US-20090110838-A1 | Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film | HITACHI CHEMICAL CO., LTD (JP) | 2009-04-30 | — | — | US | disclosed |
| EP-1127929-B1 | Composition for film formation, method of film formation, and silica-based film | JSR CORP (JP) | 2009-04-15 | — | — | EP | disclosed |
| EP-2048541-A1 | METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM, AND COMPOSITION FOR FORMING LOWER-LAYER FILM | JSR Corporation (JP) | 2009-04-15 | — | — | EP | disclosed |
| US-7514151-B2 | Insulating film and method for forming the same, and film-forming composition | JSR CORPORATION (JP) | 2009-04-07 | — | — | US | disclosed |
| EP-2035518-A2 | ANTIREFLECTIVE COATING COMPOSITIONS COMPRISING SILOXANE POLYMER | AZ Electronic Materials USA Corp. (US) | 2009-03-18 | — | — | EP | disclosed |
| EP-2034364-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN | JSR Corporation (JP) | 2009-03-11 | — | — | EP | disclosed |
| US-7500397-B2 | Activated chemical process for enhancing material properties of dielectric films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-03-10 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| US-7482676-B2 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-01-27 | — | — | US | disclosed |
| US-20090018247-A1 | COMPOSITION FOR FORMING SILICA-BASED COATING FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-01-15 | — | — | US | disclosed |
| EP-1999167-A2 | ZIEGLER-NATTA CATALYST WITH IN SITU-GENERATED DONOR | Novolen Technology Holdings, C.V. (NL) | 2008-12-10 | — | — | EP | disclosed |
| US-7462678-B2 | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film | JSR CORPORATION (JP) | 2008-12-09 | — | — | US | disclosed |
| US-20080276835-A1 | Zirconium Oxide-Tin Oxide Composite Sol, Coating Composition and Optical Member | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-11-13 | — | — | US | disclosed |
| EP-1832351-B1 | Low dielectric materials and methods for making same | AIR PROD & CHEM (US) | 2008-11-12 | — | — | EP | disclosed |
| US-20080268264-A1 | Method for Forming Organic Silica Film, Organic Silica Film, Wiring Structure, Semiconductor Device, and Composition for Film Formation | JSR CORPORATION (JP) | 2008-10-30 | — | — | US | disclosed |
| US-20080264672-A1 | Photoimprintable Low Dielectric Constant Material and Method for Making and Using Same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-10-30 | — | — | US | disclosed |
| US-7442675-B2 | Cleaning composition and method of cleaning semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-10-28 | — | — | US | disclosed |
| US-20080260956-A1 | Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part | HITACHI CHEMICAL CO., LTD. (JP) | 2008-10-23 | — | — | US | disclosed |
| EP-1981074-A1 | ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR Corporation (JP) | 2008-10-15 | — | — | EP | disclosed |
| US-20080246153-A1 | ORGANIC SILICA-BASED FILM, METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING INSULATING FILM FOR SEMICONDUCTOR DEVICE, INTERCONNECT STRUCTURE, AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| WO-2008104874-A1 | PROCESS FOR MAKING SILOXANE POLYMERS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-09-04 | — | — | WO | disclosed |
| WO-2008102259-A2 | ANTIREFLECTIVE COATING COMPOSITION BASED ON A SILICON POLYMER | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-08-28 | — | — | WO | disclosed |
| US-20080199977-A1 | Activated Chemical Process for Enhancing Material Properties of Dielectric Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-08-21 | — | — | US | disclosed |
| US-20080199789-A1 | Antireflective Coating Composition Based on Silicon Polymer | MERCK PATENT GMBH (DE) | 2008-08-21 | — | — | US | disclosed |
| EP-1959485-A2 | Activated chemical process for enhancing material properties of dielectric films | Air Products and Chemicals, Inc. (US) | 2008-08-20 | — | — | EP | disclosed |
| EP-1246239-B1 | Method of forming dual damascene structure | JSR CORP (JP) | 2008-07-23 | — | — | EP | disclosed |
| US-7399715-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2008-07-15 | — | — | US | disclosed |
| US-20080166478-A1 | Composite Material, Coating Liquid and Manufacturing Method of Composite Material | TOTO LTD. (JP) | 2008-07-10 | — | — | US | disclosed |
| EP-1930298-A1 | ZIRCONIUM OXIDE-TIN OXIDE COMPOSITE SOL, COATING COMPOSITION AND OPTICAL MEMBER | Nissan Chemical Industries, Ltd. (JP) | 2008-06-11 | — | — | EP | disclosed |
| US-20080090926-A1 | Coating Composition for Film with Low Refractive Index and Film Prepared Therefrom | LG CHEM, LTD. (KR) | 2008-04-17 | — | — | US | disclosed |
| US-7358300-B2 | Comprising polysiloxane obtained by hydrolytic condensation; alcoholic solvent alcohol capable of dissolving siloxane resin, ammonium salt, and thermal decomposing/volatile compound; curing; bonding and high strength; mechanical properties | HITACHI CHEMICAL CO., LTD. (JP) | 2008-04-15 | — | — | US | disclosed |
| EP-1890172-A1 | METHOD FOR FORMING ANTIREFLECTION FILM | Hitachi Chemical Co., Ltd. (JP) | 2008-02-20 | — | — | EP | disclosed |
| US-7332446-B2 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-02-19 | — | — | US | disclosed |
| US-20080038527-A1 | Method for Forming Organic Silica Film, Organic Silica Film, Wiring Structure, Semiconductor Device, and Composition for Film Formation | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| US-7320854-B2 | Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent | JSR CORPORATION (JP) | 2008-01-22 | — | — | US | disclosed |
| US-20080012074-A1 | Low Temperature Sol-Gel Silicates As Dielectrics or Planarization Layers For Thin Film Transistors | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-01-17 | — | — | US | disclosed |
| EP-1535976-B1 | Composition for film formation, method for preparing the composition, and method for forming insulating film | JSR CORP (JP) | 2008-01-16 | — | — | EP | disclosed |
| EP-1879234-A2 | Low temperature sol-gel silicates as dielectrics or planarization layers for thin film transistors | Air Products and Chemicals, Inc. (US) | 2008-01-16 | — | — | EP | disclosed |
| US-20070299176-A1 | Photodefinable low dielectric constant material and method for making and using same | AIR PRODUCTS AND CHEMICALS, INC. | 2007-12-27 | — | — | US | disclosed |
| US-20070298349-A1 | Antireflective Coating Compositions Comprising Siloxane Polymer | AZ ELECTRONIC MATERIALS USA CORP. | 2007-12-27 | — | — | US | disclosed |
| WO-2007148223-A2 | ANTIREFLECTIVE COATING COMPOSITIONS COMPRISING SILOXANE POLYMER | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-12-27 | — | — | WO | disclosed |
| US-20070297966-A1 | Conductive tin oxide sol and process for producing same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-12-27 | — | — | US | disclosed |
| EP-1870439-A2 | Conductive tin oxide sol and process for producing same | Nissan Chemical Industries, Ltd. (JP) | 2007-12-26 | — | — | EP | disclosed |
| WO-2007146289-A2 | POLYMER COMPOSITIONS CONTAINING SURFACE-MODIFIED NON-HALOGENATED MINERAL FILLERS | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2007-12-21 | — | — | WO | disclosed |
| WO-2007146290-A2 | SURFACE-MODIFIED NON-HALOGENATED MINERAL FILLERS | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2007-12-21 | — | — | WO | disclosed |
| US-20070287791-A1 | Polymer compositions containing surface-modified non-halogenated mineral fillers | MOMENTIVE PERFORMANCE MATERIALS INC. | 2007-12-13 | — | — | US | disclosed |
| US-20070287773-A1 | Surface-modified non-halogenated mineral fillers | MOMENTIVE PERFORMANCE MATERIALS INC. | 2007-12-13 | — | — | US | disclosed |
| US-7297464-B2 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2007-11-20 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |
| US-7294585-B2 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-11-13 | — | — | US | disclosed |
| EP-1852903-A2 | Compositions for preparing materials with a low dielectric constant | Air Products and Chemicals, Inc. (US) | 2007-11-07 | — | — | EP | disclosed |
| US-7291567-B2 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| EP-1837173-A1 | COMPOSITE MATERIAL, COATING FLUID AND METHOD FOR PRODUCING COMPOSITE MATERIAL | TOTO LTD. (JP) | 2007-09-26 | — | — | EP | disclosed |
| EP-1491503-B1 | Metal oxide particle comprising the metals tin, zinc and antimony and process for producing same | NISSAN CHEMICAL IND LTD (JP) | 2007-09-26 | — | — | EP | disclosed |
| EP-1837086-A2 | Low dielectric materials and methods for making same | Air Products and Chemicals, Inc. (US) | 2007-09-26 | — | — | EP | disclosed |
| WO-2007106348-A2 | ZIEGLER-NATTA CATALYST WITH IN SITU-GENERATED DONOR | NOVOLEN TECHNOLOGY HOLDINGS C.V. (NL) | 2007-09-20 | — | — | WO | disclosed |
| US-20070213204-A1 | Ziegler-Natta catalyst with in situ-generated donor | NOVOLEN TECHNOLOGY HOLDINGS C.V. | 2007-09-13 | — | — | US | disclosed |
| EP-1832351-A2 | Low dielectric materials and methods for making same | Air Products and Chemicals, Inc. (US) | 2007-09-12 | — | — | EP | disclosed |
| EP-1829945-A1 | FILM, SILICA FILM AND METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING SILICA FILM, AND ELECTRONIC PART | Hitachi Chemical Co., Ltd. (JP) | 2007-09-05 | — | — | EP | disclosed |
| EP-1826613-A2 | Top coat for lithography processes | Air Products and Chemicals, Inc. (US) | 2007-08-29 | — | — | EP | disclosed |
| US-20070196773-A1 | Top coat for lithography processes | VERSUM MATERIALS US, LLC | 2007-08-23 | — | — | US | disclosed |
| US-20070185263-A1 | COMPOSITION FOR FORMING SILICA-BASED COATING WITH A LOW REFRACTIVE INDEX | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-08-09 | — | — | US | disclosed |
| US-20070185262-A1 | COMPOSITION FOR FORMING COLORED SILICA-BASED COATING | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-08-09 | — | — | US | disclosed |
| US-7238462-B2 | Undercoating material for wiring, embedded material, and wiring formation method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-07-03 | — | — | US | disclosed |
| EP-1376671-B1 | Compositions for preparing materials with a low dielectric constant | AIR PROD & CHEM (US) | 2007-06-20 | — | — | EP | disclosed |
| US-20070134530-A1 | Polymer electrolyte as well as polymer electrolyte membrane, membrane electrode assembly and polymer electrolyte fuel cell using the same | TORAY INDUSTRIES, INC. (JP) | 2007-06-14 | — | — | US | disclosed |
| EP-1784465-A1 | COATING COMPOSITION FOR FILM WITH LOW REFRACTIVE INDEX AND FILM PREPARED THEREFROM | LG Chem, Ltd. (KR) | 2007-05-16 | — | — | EP | disclosed |
| US-7205030-B2 | Method for forming porous film | SANYO ELECTRIC CO., LTD. (JP) | 2007-04-17 | — | — | US | disclosed |
| US-20070031687-A1 | Insulating-film-forming composition, method of producing the same, silica-based insulating film, and method of forming the same | JSR CORPORATION (JP) | 2007-02-08 | — | — | US | disclosed |
| US-20070027287-A1 | Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same | JSR CORPORATION (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20070020467-A1 | Composition for forming insulating film, method for producing same, silica-based insulating film, and method for forming same | JSR CORPORATION (JP) | 2007-01-25 | — | — | US | disclosed |
| US-20070021580-A1 | Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film | JSR CORPORATION (JP) | 2007-01-25 | — | — | US | disclosed |
| EP-1088868-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORP (JP) | 2007-01-24 | — | — | EP | disclosed |
| EP-1746139-A1 | COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM AND METHOD FOR FORMING SAME | JSR Corporation (JP) | 2007-01-24 | — | — | EP | disclosed |
| EP-1746122-A1 | METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FILM FORMATION | JSR Corporation (JP) | 2007-01-24 | — | — | EP | disclosed |
| EP-1746123-A1 | METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FILM FORMATION | JSR Corporation (JP) | 2007-01-24 | — | — | EP | disclosed |
| US-20070015892-A1 | Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film | JSR CORPORATION (JP) | 2007-01-18 | — | — | US | disclosed |
| EP-1589078-B1 | Anhydrous zinc antimonate sol and process for producing same | NISSAN CHEMICAL IND LTD (JP) | 2007-01-10 | — | — | EP | disclosed |
| EP-1298176-B1 | Stacked film insulating film and substrate for semiconductor | JSR CORP (JP) | 2007-01-03 | — | — | EP | disclosed |
| US-7157024-B2 | Metal oxide particle and process for producing same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| EP-1295924-B1 | Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor | JSR CORP (JP) | 2006-12-13 | — | — | EP | disclosed |
| US-20060275614-A1 | Insulating film and method for forming the same, and film-forming composition | JSR CORPORATION (JP) | 2006-12-07 | — | — | US | disclosed |
| WO-2006129973-A1 | COATING COMPOSITION FOR FILM WITH LOW REFRACTIVE INDEX AND FILM PREPARED THEREFROM | LG CHEM, LTD. (KR) | 2006-12-07 | — | — | WO | disclosed |
| US-20060270787-A1 | Additives to prevent degradation of alkyl-hydrogen siloxanes | VERSUM MATERIALS US, LLC | 2006-11-30 | — | — | US | disclosed |
| US-20060249818-A1 | Compositions for preparing low dielectric materials | VERSUM MATERIALS US, LLC | 2006-11-09 | — | — | US | disclosed |
| US-20060249713-A1 | Compositions for preparing low dielectric materials | VERSUM MATERIALS US, LLC | 2006-11-09 | — | — | US | disclosed |
| EP-1719793-A1 | POLYMER AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR FORMING INSULATING FILM, AND INSULATING FILM AND METHOD OF FORMING THE SAME | JSR Corporation (JP) | 2006-11-08 | — | — | EP | disclosed |
| US-7129311-B2 | Additives to prevent degradation of alkyl-hydrogen siloxanes | ARCH SPECIALTY CHEMICALS, INC. (US) | 2006-10-31 | — | — | US | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| US-20060241012-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | YOKOI SHIGERU | 2006-10-26 | — | — | US | disclosed |
| US-7122880-B2 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2006-10-17 | — | — | US | disclosed |
| EP-1253175-B1 | Composition for film formation, method of film formation, and silica-based film | JSR CORP (JP) | 2006-10-11 | — | — | EP | disclosed |
| US-20060216531-A1 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2006-09-28 | — | — | US | disclosed |
| EP-1705208-A1 | COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM AND METHOD FOR FORMING SAME | JSR Corporation (JP) | 2006-09-27 | — | — | EP | disclosed |
| EP-1705206-A1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR Corporation (JP) | 2006-09-27 | — | — | EP | disclosed |
| EP-1705207-A1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR Corporation (JP) | 2006-09-27 | — | — | EP | disclosed |
| US-20060210812-A1 | Insulating film and method of forming the same | JSR CORPORATION (JP) | 2006-09-21 | — | — | US | disclosed |
| US-7108954-B2 | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORPORATION (JP) | 2006-09-19 | — | — | US | disclosed |
| EP-1696478-A1 | INSULATING FILM, METHOD FOR FORMING SAME AND COMPOSITION FOR FORMING FILM | JSR Corporation (JP) | 2006-08-30 | — | — | EP | disclosed |
| US-20060183055-A1 | Method for defining a feature on a substrate | VERSUM MATERIALS US, LLC | 2006-08-17 | — | — | US | disclosed |
| EP-1691410-A2 | Method for defining a feature on a substrate | Air Products and Chemicals, Inc. (US) | 2006-08-16 | — | — | EP | disclosed |
| EP-1122770-B1 | Silica-based insulating film and its manufacture | JSR CORP (JP) | 2006-08-09 | — | — | EP | disclosed |
| US-20060159861-A1 | Additives to prevent degradation of alkyl-hydrogen siloxanes | ARCH SPECIALTY CHEMICALS, INC. (US) | 2006-07-20 | — | — | US | disclosed |
| EP-1679184-A1 | LAMINATE AND METHOD FOR FORMATION THEREOF, INSULATING FILM, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FORMING FILM | JSR Corporation (JP) | 2006-07-12 | — | — | EP | disclosed |
| US-20060141693-A1 | Semiconductor multilayer interconnection forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1672427-A1 | RADIATION-CURING COMPOSITION, METHOD FOR STORING SAME, METHOD FOR FORMING CURED FILM, METHOD FOR FORMING PATTERN, METHOD FOR USING PATTERN, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE | Hitachi Chemical Co., Ltd. (JP) | 2006-06-21 | — | — | EP | disclosed |
| EP-1672426-A1 | RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2006-06-21 | — | — | EP | disclosed |
| US-20060110610-A1 | Borazine-based resin, and method for production thereof, borazine based resin composition, insulating coating and method for formation thereof, and electronic parts having the insulating coating | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2006-05-25 | — | — | US | disclosed |
| US-7026053-B2 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2006-04-11 | — | — | US | disclosed |
| EP-1641908-A1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-04-05 | — | — | EP | disclosed |
| EP-1641063-A1 | POLYMER ELECTROLYTE, POLYMER ELECTROLYTE MEMBRANE THEREFROM, MEMBRANE ELECTRODE ASSEMBLY AND POLYMER ELECTROLYTE FUEL CELL | TORAY INDUSTRIES, INC. (JP) | 2006-03-29 | — | — | EP | disclosed |
| EP-1045290-B1 | Composition for resist underlayer film and method for producing the same | JSR CORP (JP) | 2006-03-15 | — | — | EP | disclosed |
| US-7011868-B2 | Fluorine-free plasma curing process for porous low-k materials | AXCELIS TECHNOLOGIES, INC. (US) | 2006-03-14 | — | — | US | disclosed |
| US-20060052566-A1 | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL CO., LTD. (JP) | 2006-03-09 | — | — | US | disclosed |
| EP-1146092-B1 | Composition for film formation, method of film formation, and silica-based film | JSR CORP (JP) | 2006-03-08 | — | — | EP | disclosed |
| US-20060047034-A1 | Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film | HITACHI CHEMICAL CO., LTD. (JP) | 2006-03-02 | — | — | US | disclosed |
| US-20060024980-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2006-02-02 | — | — | US | disclosed |
| EP-1619226-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR Corporation (JP) | 2006-01-25 | — | — | EP | disclosed |
| US-20060006541-A1 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2006-01-12 | — | — | US | disclosed |
| EP-1615260-A2 | Organic silicon-oxide-based film, composition and method for forming the same, and semiconductor device | JSR Corporation (JP) | 2006-01-11 | — | — | EP | disclosed |
| US-20050266344-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-12-01 | — | — | US | disclosed |
| US-20050260420-A1 | Low dielectric materials and methods for making same | VERSUM MATERIALS US, LLC | 2005-11-24 | — | — | US | disclosed |
| US-20050255326-A1 | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL CO., LTD. (JP) | 2005-11-17 | — | — | US | disclosed |
| EP-1593149-A1 | FLUORINE-FREE PLASMA CURING PROCESS FOR POROUS LOW-K-MATERIALS | Axcelis Technologies, Inc. (US) | 2005-11-09 | — | — | EP | disclosed |
| US-20050239953-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-10-27 | — | — | US | disclosed |
| US-20050239907-A1 | Anhydrous zinc antimonate sol and process for producing same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-10-27 | — | — | US | disclosed |
| EP-1589078-A1 | Anhydrous zinc antimonate sol and process for producing same | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 2005-10-26 | — | — | EP | disclosed |
| EP-1583141-A2 | Solvents and methods using same for removing silicon-containing residues from a substrate | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-10-05 | — | — | EP | disclosed |
| EP-1577935-A2 | Compositions for preparing low dielectric materials containing solvents | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-09-21 | — | — | EP | disclosed |
| EP-1573086-A2 | ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES | Arch Specialty Chemicals, Inc. (US) | 2005-09-14 | — | — | EP | disclosed |
| US-20050196974-A1 | Compositions for preparing low dielectric materials containing solvents | VERSUM MATERIALS US, LLC | 2005-09-08 | — | — | US | disclosed |
| US-20050196535-A1 | Solvents and methods using same for removing silicon-containing residues from a substrate | AIR PRODUCTS AND CHEMICALS, INC. | 2005-09-08 | — | — | US | disclosed |
| EP-1566836-A1 | SEMICONDUCTOR MULTILAYER INTERCONNECTION FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-08-24 | — | — | EP | disclosed |
| EP-1117102-B1 | Method of manufacturing material for forming insulating film | JSR CORP (JP) | 2005-08-10 | — | — | EP | disclosed |
| CN-1651159-A | Cleaning CVD chambers following deposition of porogen-containing materials | AIR PROD & CHEM (US) | 2005-08-10 | — | — | CN | disclosed |
| EP-1058274-B1 | Composition for film formation and material for insulating film formation | JSR CORP (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-6902771-B2 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2005-06-07 | — | — | US | disclosed |
| US-20050119394-A1 | Comprising polysiloxane obtained by hydrolytic condensation; alcoholic solvent alcohol capable of dissolving siloxane resin, ammonium salt, and thermal decomposing/volatile compound; curing; bonding and high strength; mechanical properties | HITACHI CHEMICAL CO., LTD. (JP) | 2005-06-02 | — | — | US | disclosed |
| EP-1535976-A1 | Composition for film formation, method for preparing the composition, and method for forming insulating film | JSR Corporation (JP) | 2005-06-01 | — | — | EP | disclosed |
| US-20050112383-A1 | Undercoating layer material for lithography and wiring forming method using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-05-26 | — | — | US | disclosed |
| US-20050112386-A1 | Composition for film formation, method for preparing the composition, and method for forming insulating film | JSR CORPORATION (JP) | 2005-05-26 | — | — | US | disclosed |
| US-6890605-B2 | Method of film formation, insulating film, and substrate for semiconductor | JSR CORPORATION (JP) | 2005-05-10 | — | — | US | disclosed |
| US-20050096415-A1 | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film | JSR CORPORATION (JP) | 2005-05-05 | — | — | US | disclosed |
| US-20050074695-A1 | Undercoating material for wiring, embedded material, and wiring formation method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-04-07 | — | — | US | disclosed |
| EP-1520891-A1 | Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film | JSR Corporation (JP) | 2005-04-06 | — | — | EP | disclosed |
| US-20050042464-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2005-02-24 | — | — | US | disclosed |
| US-20050012078-A1 | Metal oxide particle and process for producing same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-01-20 | — | — | US | disclosed |
| EP-1494072-A2 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR Corporation (JP) | 2005-01-05 | — | — | EP | disclosed |
| US-20040265737-A1 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| WO-2004113486-A1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-12-29 | — | — | WO | disclosed |
| US-20040259761-A1 | Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. INTEL CORPORATION | 2004-12-23 | — | — | US | disclosed |
| US-6828078-B2 | Photoresist for use in optoelectronic and display fields; porosity; optical fibers | JSR CORPORATION (JP) | 2004-12-07 | — | — | US | disclosed |
| US-6824833-B2 | STACKED DIELECTRIC | JSR CORPORATION (JP) | 2004-11-30 | — | — | US | disclosed |
| CN-1542071-A | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device | ��Խ��ѧ��ҵ��ʽ���� | 2004-11-03 | — | — | CN | disclosed |
| US-20040213911-A1 | Method for forming porous film | SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) | 2004-10-28 | — | — | US | disclosed |
| EP-1464410-A1 | Low dielectric materials and methods for making same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-10-06 | — | — | EP | disclosed |
| US-6800330-B2 | PRODUCT OBTAINED BY HYDROLYZING AND CONDENSING AT LEAST ONE SILANE COMPOUND, A COMPOUND COMPATIBLE WITH OR DISPERSIBLE IN THAT COMPOUND AND HAVING A BOILING POINT OR DECOMPOSITION TEMPERATURE OF 250-450 DEGREES C, SOLVENT | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-20040188809-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. | 2004-09-30 | — | — | US | disclosed |
| US-6787289-B2 | OPTICS | JSR CORPORATION (JP) | 2004-09-07 | — | — | US | disclosed |
| US-6787193-B2 | DECOMPOSITION OF AN ORGANOSILICON COMPOUND | JSR CORPORATION (JP) | 2004-09-07 | — | — | US | disclosed |
| WO-2004066374-A1 | FLUORINE-FREE PLASMA CURING PROCESS FOR POROUS LOW-K-MATERIALS | AXCELIS TECHNOLOGIES, INC. (US) | 2004-08-05 | — | — | WO | disclosed |
| US-6770326-B2 | COMPRISES POLYSILOXANE GEL AND FILLERS (ALUMINUM OXIDE, ZINC OXIDE, AND BORON NITRIDE) FOR ENCAPSULATING ELECTRONIC CIRCUITRY | LORD CORPORATION | 2004-08-03 | — | — | US | disclosed |
| US-20040127070-A1 | Additives to prevent degradation of alkyl-hydrogen siloxanes | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-01 | — | — | US | disclosed |
| US-20040121937-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-06-24 | — | — | US | disclosed |
| US-6749944-B2 | VAPOR DEPOSITION, OSCILLATION, HEATING USING ORGANOSILICON COMPOUND; FORMING DIELECTRIC | JSR CORPORATION (JP) | 2004-06-15 | — | — | US | disclosed |
| WO-2004027110-A2 | ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-04-01 | — | — | WO | disclosed |
| US-20040048960-A1 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. | 2004-03-11 | — | — | US | disclosed |
| US-20040028916-A1 | Fluorine-free plasma curing process for porous low-k materials | AXCELIS TECHNOLOGIES, INC. | 2004-02-12 | — | — | US | disclosed |
| US-20040013972-A1 | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORPORATION (JP) | 2004-01-22 | — | — | US | disclosed |
| EP-1376671-A1 | Compositions for preparing materials with a low dielectric constant | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-01-02 | — | — | EP | disclosed |
| US-6645881-B2 | Method of forming coating film, method of manufacturing semiconductor device and coating solution | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-11-11 | — | — | US | disclosed |
| US-6642352-B2 | Providing a silicon inorganic polymer compound or polyarylenes or polyphenylene ether organic polymer compound, treating the polymeric compound with a zeta-potential producing filter material, and producing curable polymer compound | JSR CORPORATION (JP) | 2003-11-04 | — | — | US | disclosed |
| EP-1350814-A1 | RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX | JSR Corporation (JP) | 2003-10-08 | — | — | EP | disclosed |
| US-20030157340-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2003-08-21 | — | — | US | disclosed |
| US-20030139486-A1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORPORATION (JP) | 2003-07-24 | — | — | US | disclosed |
| US-20030139063-A1 | Method of forming coating film, method of manufacturing semiconductor device and coating solution | TOSHIBA MEMORY CORPORATION (JP) | 2003-07-24 | — | — | US | disclosed |
| EP-1323742-A2 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR Corporation (JP) | 2003-07-02 | — | — | EP | disclosed |
| US-6576393-B1 | Hydrolysate and/or a condensate of a siloxane compound; compound generating an acid by ultraviolet irradiation and/or heating; adhesion, resistance to a developing solution, decrease in film loss in oxygen ashing of the resist | JSR CORPORATION (JP) | 2003-06-10 | — | — | US | disclosed |
| US-20030104225-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2003-06-05 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| US-20030077461-A1 | Stacked film, insulating film and substrate for semiconductor | JSR CORPORATION (JP) | 2003-04-24 | — | — | US | disclosed |
| US-20030064303-A1 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | JSR CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
| EP-1298176-A2 | Stacked film insulating film and substrate for semiconductor | JSR Corporation (JP) | 2003-04-02 | — | — | EP | disclosed |
| US-20030059550-A1 | Method of film formation, insulating film, and substrate for semiconductor | JSR CORPORATION (JP) | 2003-03-27 | — | — | US | disclosed |
| US-20030059628-A1 | Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor | JSR CORPORATION (JP) | 2003-03-27 | — | — | US | disclosed |
| EP-1296365-A2 | Method of film formation, insulating film, and substrate for semiconductor | JSR Corporation (JP) | 2003-03-26 | — | — | EP | disclosed |
| EP-1295924-A2 | Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor | JSR Corporation (JP) | 2003-03-26 | — | — | EP | disclosed |
| US-20030050419-A1 | High thermal conductivity spin castable potting compound | LORD CORPORATION | 2003-03-13 | — | — | US | disclosed |
| US-6515073-B2 | Comprising di-, tri- and/or tetra-(alkoxy/phenoxy)silanes and a thermosetting resin which can be condensed therewith which has an absorption capacity with respect to exposing light; can be etched at high rate for fine resist patterns | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-04 | — | — | US | disclosed |
| WO-2003004567-A1 | HIGH THERMAL CONDUCTIVITY SPIN CASTABLE POTTING COMPOUND | LORD CORPORATION (US) | 2003-01-16 | — | — | WO | disclosed |
| US-20030008155-A1 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2003-01-09 | — | — | US | disclosed |
| US-6503633-B2 | Semiconductors | JSR CORPORATION (JP) | 2003-01-07 | — | — | US | disclosed |
| US-20020189495-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2002-12-19 | — | — | US | disclosed |
| EP-1267395-A2 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR Corporation (JP) | 2002-12-18 | — | — | EP | disclosed |
| US-6495264-B2 | HYDROLYSIS AND CONDENSATION OF SILANE COMPOUND IN PRESENCE OF WATER AND TETRAALKYLAMMONIUM HYDROXIDES, ALICYCLIC AMINES, AND METAL HYDROXIDES IN SOLVENT FOR FORMING DIELECTRIC LAYER FOR SEMICONDUCTORS | JSR CORPORATION (JP) | 2002-12-17 | — | — | US | disclosed |
| EP-1253175-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |
| US-6472079-B2 | PRODUCT OF HYDROLYSIS AND CONDENSATION OF AN ORGANOSILICON COMPOUND; 1A OR 2A COMPOUND, ESPECIALLY CARBOXYLIC SALT; SOLVENT; EXCELLENT CRACKING RESISTANCE AFTER A PCT (PRESSURE COOKER TEST). | JSR CORPORATION (JP) | 2002-10-29 | — | — | US | disclosed |
| US-6465368-B2 | DISSOLVING POLYMER IN SOLVENT; FORMING DIELECTRIC FILMS | JSR CORPORATION (JP) | 2002-10-15 | — | — | US | disclosed |
| US-20020142586-A1 | Method of forming dual damascene structure | JSR CORPORATION (JP) | 2002-10-03 | — | — | US | disclosed |
| EP-1246239-A1 | Method of forming dual damascene structure | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |
| EP-0960921-B1 | Oligomeric organopolysiloxan cocondensate, his preparation and use for coating surfaces | DEGUSSA (DE) | 2002-08-14 | — | — | EP | disclosed |
| US-20020086167-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |
| US-6413647-B1 | USEFUL AS INTERLAYER DIELECTRIC FILM IN SEMICONDUCTOR DEVICES; MECHANICAL STRENGTH | JSR CORPORATION (JP) | 2002-07-02 | — | — | US | disclosed |
| US-6410151-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6410150-B1 | Composition for film formation, method of film formation, and insulating film | JSR CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6406794-B1 | POLYETHERSILOXANE COPOLYMER | JSR CORPORATION (JP) | 2002-06-18 | — | — | US | disclosed |
| US-6376634-B1 | ORGANOSILICON POLYMERS | JSR CORPORATION (JP) | 2002-04-23 | — | — | US | disclosed |
| US-20020045693-A1 | Composition for film formation, method of film formation and silica-based film | JSR CORPORATION (JP) | 2002-04-18 | — | — | US | disclosed |
| US-20020020327-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2002-02-21 | — | — | US | disclosed |
| US-20010055892-A1 | Composition for film formation, process for producing composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2001-12-27 | — | — | US | disclosed |
| US-20010051446-A1 | Method of manufacturing insulating film-forming material, the insulating film-forming material, and insulating film | JSR CORPORATION (JP) | 2001-12-13 | — | — | US | disclosed |
| EP-1160848-A2 | Composition for silica-based film formation | JSR Corporation (JP) | 2001-12-05 | — | — | EP | disclosed |
| US-20010036998-A1 | Anti-reflective coating-forming composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |
| EP-1148105-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-24 | — | — | EP | disclosed |
| EP-1146092-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-17 | — | — | EP | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |
| US-6251989-B1 | CONTAINING WATER SOLUBLE AMINO-FUNCTIONAL ORGANOSILANE AND FLUORO-FUNCTIONAL ORGANOSILANE | DEGUSSA-HUELS AKTIENGESELLSCHAFT (DE) | 2001-06-26 | — | — | US | disclosed |
| US-6235101-B1 | SILICON HYDROLYZATE, METAL CHELATE, ORGANIC SOLVENT AND BETA DIKETONE FOR FILMS | JSR CORPORATION (JP) | 2001-05-22 | — | — | US | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| EP-0960921-A2 | Oligomeric organopolysiloxan cocondensate, his preparation and use for coating surfaces | Degussa-Hüls Aktiengesellschaft (DE) | 1999-12-01 | — | — | EP | disclosed |
| EP-0921561-A2 | Composition for film formation and film | JSR Corporation (JP) | 1999-06-09 | — | — | EP | disclosed |
| US-5645901-A | RESIN SUBSTRATE, CURED COATING LAMINATED TO SUBSTRATE, SILOXANE CURED COATING CONTAINING FINE SILICA PARTICLES, AND INDIUM TIN OXIDE FILM | SHARP KABUSHIKI KAISHA (JP) | 1997-07-08 | — | — | US | disclosed |
| US-4454056-A | Process for the production of zeolites modified on the surface with organosilanes | DEGUSSA AKTIENGESELLSCHAFT (DE) | 1984-06-12 | — | — | US | disclosed |
| US-4454056-A | Process for the production of zeolites modified on the surface with organosilanes | DEGUSSA AKTIENGESELLSCHAFT (DE) | 1984-06-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180187010-A1 | SILICON-CONTAINING RESIN COMPOSITION | CROCC, SRI, SEM1 | LTA4H 1103/4885CA4 2737/4885TSHR 4701/4885 |
| US-20110313122-A1 | BORAZINE-BASED RESIN, PROCESS FOR ITS PRODUCTION, BORAZINE-BASED RESIN COMPOSITION, INSULATING FILM AND METHOD FOR ITS FORMATION | GRIK5, GJA1, SLC9A5 | LTA4H 977/4885CA4 967/4885TSHR 3288/4885 |
| US-10689514-B2 | Silicon-containing resin composition | CROCC, SRI, SEM1 | LTA4H 1103/4885CA4 2737/4885TSHR 4701/4885 |
| US-20200270456-A1 | SILICON-CONTAINING RESIN COMPOSITION | CROCC, COPE, SEM1 | LTA4H 654/4885CA4 2519/4885TSHR 4750/4885 |
| US-20190185420-A1 | PRODUCTION METHOD OF CARBAMIC ACID ESTER | CA2, CA7, CA4 | LTA4H 3317/4885CA4 3/4885TSHR 1277/4885 |
| US-20090317541-A1 | FUNCTIONAL SILANE COMPOUND, COATING SOLUTION, AND METHOD FOR MANUFACTURING PLASTIC LENS | SUMO1, CAD, UFM1 | LTA4H 2835/4885CA4 2564/4885TSHR 4052/4885 |
| US-10752579-B2 | Production method of carbamic acid ester | CA2, CA7, CA4 | LTA4H 3317/4885CA4 3/4885TSHR 1277/4885 |
| US-20230046062-A1 | ANTIMICROBIAL COMPOSITIONS AND METHODS OF USING THEREOF | PRF1, LCT, DSTN | LTA4H 837/4885CA4 803/4885TSHR 4215/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.