SCHEMBL429346

SCHEMBL429346

C1=C(OCOC2=CCCC2)CCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9615755 0.90 KDM1A (0.30)
SCHEMBL546443 0.84 KCNH2 (0.32)
SCHEMBL6826930 0.82 KCNH2 (0.34)
SCHEMBL6826962 0.80 KCNH2 (0.33)
SCHEMBL9152007 0.80
SCHEMBL10859728 0.80
SCHEMBL1053239 0.80
SCHEMBL454510 0.80
SCHEMBL7418036 0.80 RAB9A (0.31)
SCHEMBL15092951 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2260062-B1 ADHESION TO PLASTIC WITH BLOCK COPOLYMERS OBTAINED USING RAFT DSM IP ASSETS BV (NL) 2019-08-07 EP claimed
US-11965050-B2 Waterborne crosslinkable dispersions COVESTRO (NETHERLANDS) B.V. (NL) 2024-04-23 US disclosed
CN-111491984-B Aqueous crosslinkable dispersions 科思创(荷兰)有限公司 2023-09-29 CN disclosed
CN-111491983-B aqueous dispersion 科思创(荷兰)有限公司 2023-08-25 CN disclosed
CN-113234374-B Coating for plastic substrates PPG工业俄亥俄公司 2022-12-20 CN disclosed
EP-3712222-B1 RADICAL-CURABLE ADHESIVE COMPOSITION, AND ADHESIVE SHOWA DENKO KK (JP) 2022-12-07 EP disclosed
US-11459419-B2 Waterborne dispersions COVESTRO (NETHERLANDS) B.V. (NL) 2022-10-04 US disclosed
CN-110139879-B Adhesion promoters for plastic substrates containing random copolymers PPG工业俄亥俄公司 2022-06-07 CN disclosed
EP-3728412-B1 WATERBORNE CROSSLINKABLE DISPERSIONS COVESTRO NETHERLANDS BV (NL) 2022-01-26 EP disclosed
EP-3728413-B1 WATERBORNE DISPERSIONS COVESTRO NETHERLANDS BV (NL) 2022-01-26 EP disclosed
US-7396885-B2 Photo-setting and thermosetting resin composition, process for preparing plugged-through-hole printed wiring board and plugged-through-hole printed wiring board SAN-EI KAGAKU CO., LTD. (JP) 2008-07-08 US disclosed
US-20050019582-A1 BLEND CURABLE AT A LOW AND HIGH TEMPERATURE OF AN EPOXY RESIN-UNSATURATED ALIPHATIC ACID ADDUCT, A (METH)ACRYLATE, A FREE RADICAL INITIATOR, A CRYSTALLIZABLE EPOXY RESIN, AND LATENT CURING AGENT; SMOOTH UNDERCOATINGS FOR CIRCUIT BOARDS SATO KIYOSHI (JP) 2005-01-27 US disclosed
EP-1477977-A1 ULTRAVIOLET-CURABLE RESIN COMPOSITION FOR OPTICAL DISCS Nagase Chemtex Corporation (JP) 2004-11-17 EP disclosed
US-6818681-B2 ADDUCT OF E-CAPROLACTONE-MODIFIED (METH)ACRYLATE TO EPI-BIS TYPE EPOXY RESIN; (METH)ACRYLATE MONOMER; AND 2,2-DIMETHOXY-2-PHENYLACETOPHENONE, BENZOYL ETHYL ETHER AND/OR BENZOYLISOBUTYL ETHER POLYMERIZATION INITIATOR NAGASE CHEMTEX CORPORATION (JP) 2004-11-16 US disclosed
US-6812299-B2 BLEND CURABLE AT A LOW AND HIGH TEMPERATURE OF AN EPOXY RESIN-UNSATURATED ALIPHATIC ACID ADDUCT, A (METH)ACRYLATE, A FREE RADICAL INITIATOR, A CRYSTALLIZABLE EPOXY RESIN, AND LATENT CURING AGENT; SMOOTH UNDERCOATINGS FOR CIRCUIT BOARDS SAN-EI KAGAKU CO., LTD. (JP) 2004-11-02 US disclosed
US-20040167302-A1 Ultraviolet-curable resin composition for optical discs NAGASE CHEMTEX CORPORATION (JP) 2004-08-26 US disclosed
US-20030215567-A1 Photo-setting and thermosetting resin composition, process for preparing plugged-through-hole printed wiring board and plugged-through-hole printed wiring board SAN-EI KAGAKU CO., LTD. 2003-11-20 US disclosed
US-20030162898-A1 Blend curable at a low and high temperature of an epoxy resin-unsaturated aliphatic acid adduct, a (meth)acrylate, a free radical initiator, a crystallizable epoxy resin, and latent curing agent; smooth undercoatings for circuit boards SAN-EI KAGAKU CO., LTD. (JP) 2003-08-28 US disclosed
US-5698285-A PHOTOCURABLE THREE BOND CO., LTD. (JP) 1997-12-16 US disclosed
US-5300536-A Vinyl compound capable of free radical polymerization TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) 1994-04-05 US disclosed