SCHEMBL430004

SCHEMBL430004

CCCCCCCCCCCCCCCCCN1CCCC1=O

nearest known ligand 0.53

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 2/20 0.53
PIK3CD O00329 1/20 0.48
FAAH O00519 1/20 0.47
MGLL Q99685 1/20 0.47
ADRA1B P35368 4/20 0.47
KMT2A Q03164 2/20 0.46
GAA P10253 1/20 0.45
RAB9A P51151 1/20 0.45
ADRA1A P35348 1/20 0.44
MEN1 O00255 1/20 0.44
PKM P14618 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7895656 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL297237 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL707139 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL297935 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL297738 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL6575811 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL37427 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL705126 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL6012088 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL31601999 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108883097-B Transdermal patch containing zonisamide 帝国制药株式会社 2021-07-13 CN claimed
EP-3434269-B1 TRANSDERMAL ABSORPTION-TYPE PATCH PREPARATION COMPRISING ZONISAMIDE TEIKOKU SEIYAKU KK (JP) 2020-12-23 EP claimed
US-20190070122-A1 TRANSDERMAL ABSORPTION-TYPE PATCH PREPARATION COMPRISING ZONISAMIDE TEIKOKU SEIYAKU CO., LTD. (JP) 2019-03-07 US claimed
EP-3434269-A1 TRANSDERMAL ABSORPTION-TYPE PATCH PREPARATION COMPRISING ZONISAMIDE Teikoku Seiyaku Co., Ltd. (JP) 2019-01-30 EP claimed
CN-108883097-A Percutaneous patch containing Zonisamide 帝国制药株式会社 2018-11-23 CN claimed
CN-120065654-A Aqueous developer composition for flexographic printing plate and method for producing flexographic printing plate 旭化成株式会社 2025-05-30 CN disclosed
CN-108883097-B Transdermal patch containing zonisamide 帝国制药株式会社 2021-07-13 CN disclosed
EP-3434269-B1 TRANSDERMAL ABSORPTION-TYPE PATCH PREPARATION COMPRISING ZONISAMIDE TEIKOKU SEIYAKU KK (JP) 2020-12-23 EP disclosed
WO-2019109243-A1 Cosmetic composition for permanently changing the shape of keratinous fibers HENKEL AG & CO.KGAA (DE) 2019-06-13 WO disclosed
US-20190070122-A1 TRANSDERMAL ABSORPTION-TYPE PATCH PREPARATION COMPRISING ZONISAMIDE TEIKOKU SEIYAKU CO., LTD. (JP) 2019-03-07 US disclosed
EP-3434269-A1 TRANSDERMAL ABSORPTION-TYPE PATCH PREPARATION COMPRISING ZONISAMIDE Teikoku Seiyaku Co., Ltd. (JP) 2019-01-30 EP disclosed
CN-108883097-A Percutaneous patch containing Zonisamide 帝国制药株式会社 2018-11-23 CN disclosed
EP-1203141-A1 LINKAGE OF AGENTS TO TISSUE Pericor Science, Inc. (US) 2002-05-08 EP disclosed
WO-2002007707-A2 LINKAGE OF AGENTS USING MICROPARTICLES PERICOR SCIENCE, INC. (US) 2002-01-31 WO disclosed
US-20010021489-A1 Photoresist stripping solution and a method of stripping photoresists using the same TOKYO OHKA KOGYO CO., LTD. (JP) 2001-09-13 US disclosed
WO-2001007009-A1 LYSINE OXIDASE LINKAGE OF AGENTS TO TISSUE PERICOR SCIENCE, INC. (US) 2001-02-01 WO disclosed
WO-2001006829-A2 LINKAGE OF AGENTS TO TISSUE PERICOR SCIENCE, INC. (US) 2001-02-01 WO disclosed
US-6132928-A Coating solution for forming antireflective coating film TOKYO OHKA KOGYO CO., LTD. (JP) 2000-10-17 US disclosed
US-5783362-A Liquid coating composition for use in forming photoresist coating films and a photoresist material using said composition TOKYO OHKA KOGYO CO., LTD. (JP) 1998-07-21 US disclosed
US-5631314-A Liquid coating composition for use in forming photoresist coating films and photoresist material using said composition TOKYO OHKA KOGYO CO., LTD. (JP) 1997-05-20 US disclosed