SCHEMBL707139

SCHEMBL707139

CCCCCCCCCCCCCN1CCCC1=O

nearest known ligand 0.53

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 2/20 0.53
PIK3CD O00329 1/20 0.48
FAAH O00519 1/20 0.47
MGLL Q99685 1/20 0.47
ADRA1B P35368 4/20 0.47
KMT2A Q03164 2/20 0.46
GAA P10253 1/20 0.45
RAB9A P51151 1/20 0.45
ADRA1A P35348 1/20 0.44
MEN1 O00255 1/20 0.44
PKM P14618 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7895656 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL297237 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL297935 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL430004 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL297738 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL6575811 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL37427 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL705126 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL6012088 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B
SCHEMBL31601999 1.00 ALOX5 (0.53) ALOX5PIK3CDFAAHMGLLADRA1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 113 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3434269-B1 TRANSDERMAL ABSORPTION-TYPE PATCH PREPARATION COMPRISING ZONISAMIDE TEIKOKU SEIYAKU KK (JP) 2020-12-23 EP claimed
US-20190070122-A1 TRANSDERMAL ABSORPTION-TYPE PATCH PREPARATION COMPRISING ZONISAMIDE TEIKOKU SEIYAKU CO., LTD. (JP) 2019-03-07 US claimed
EP-3434269-A1 TRANSDERMAL ABSORPTION-TYPE PATCH PREPARATION COMPRISING ZONISAMIDE Teikoku Seiyaku Co., Ltd. (JP) 2019-01-30 EP claimed
CN-108883097-A Percutaneous patch containing Zonisamide 帝国制药株式会社 2018-11-23 CN claimed
CN-120065654-A Aqueous developer composition for flexographic printing plate and method for producing flexographic printing plate 旭化成株式会社 2025-05-30 CN disclosed
US-20230157284-A1 HIGH-LOAD SOLUTION CONCENTRATES OF DICAMBA BASF CORPORATION 2023-05-25 US disclosed
US-20230148590-A1 Aqueous Formulations of Dicamba BASF CORPORATION 2023-05-18 US disclosed
EP-4132274-A1 HIGH-LOAD SOLUTION CONCENTRATES OF DICAMBA BASF Corporation (US) 2023-02-15 EP disclosed
EP-4125365-A1 AQUEOUS FORMULATIONS OF DICAMBA BASF Corporation (US) 2023-02-08 EP disclosed
CN-115361868-A High-load solution concentrates of dicamba 巴斯夫公司 2022-11-18 CN disclosed
WO-2021198458-A1 AQUEOUS FORMULATIONS OF DICAMBA BASF CORPORATION (US) 2021-10-07 WO disclosed
CN-108883097-B Transdermal patch containing zonisamide 帝国制药株式会社 2021-07-13 CN disclosed
US-20030219682-A1 Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist pattern TOKYO OHKA KOGYO CO. LTD. (JP) 2003-11-27 US disclosed
US-20030134234-A1 Photoresist stripping solution and a method of stripping photoresists using the same WAKIYA KAZUMASA (JP) 2003-07-17 US disclosed
US-20030129534-A1 Method for forming photoresist pattern and photoresist laminate TOKYO OHKA KOGYO, CO., LTD. (JP) 2003-07-10 US disclosed
CN-1424626-A Forming method for photoresist design and its laminating products TOKYO OKA GOGYO K K (JP) 2003-06-18 CN disclosed
US-20010021489-A1 Photoresist stripping solution and a method of stripping photoresists using the same TOKYO OHKA KOGYO CO., LTD. (JP) 2001-09-13 US disclosed
US-6132928-A Coating solution for forming antireflective coating film TOKYO OHKA KOGYO CO., LTD. (JP) 2000-10-17 US disclosed
US-5783362-A Liquid coating composition for use in forming photoresist coating films and a photoresist material using said composition TOKYO OHKA KOGYO CO., LTD. (JP) 1998-07-21 US disclosed
US-5631314-A Liquid coating composition for use in forming photoresist coating films and photoresist material using said composition TOKYO OHKA KOGYO CO., LTD. (JP) 1997-05-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230148590-A1 Aqueous Formulations of Dicamba BOLA2; BOLA2B, CIP2A, AQP1 ALOX5 1433/4885PIK3CD 1042/4885FAAH 3379/4885
US-20230157284-A1 HIGH-LOAD SOLUTION CONCENTRATES OF DICAMBA PDHB, PDHA1, LDHB ALOX5 739/4885PIK3CD 316/4885FAAH 4037/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.