SCHEMBL4304168

SCHEMBL4304168

CCCCCCCCCc1ccccc1C1OO1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYSLTR2 Q9NS75 4/20 0.52
CYSLTR1 Q9Y271 4/20 0.52
LIPG Q9Y5X9 1/20 0.51
NR1H2 P55055 1/20 0.43
NR1H3 Q13133 1/20 0.43
BID P55957 3/20 0.41
MCL1 Q07820 3/20 0.41
BCL2L1 Q07817 2/20 0.41
BAK1 Q16611 2/20 0.41
KAT8 Q9H7Z6 2/20 0.41
PPARG P37231 1/20 0.41
PPARA Q07869 1/20 0.41
EP300 Q09472 1/20 0.41
KAT2A Q92830 1/20 0.41
KAT2B Q92831 1/20 0.41
KAT5 Q92993 1/20 0.41
SAE1 Q9UBE0 1/20 0.41
THRA P10827 1/20 0.40
THRB P10828 1/20 0.40
GPR3 P46089 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7141369 0.81 CYSLTR2 (0.51) CYSLTR2CYSLTR1LIPGNR1H2NR1H3
SCHEMBL9013116 0.81 CYSLTR2 (0.51) CYSLTR2CYSLTR1LIPGNR1H2NR1H3
SCHEMBL2307568 0.79 CYSLTR2 (0.50) CYSLTR2CYSLTR1LIPGNR1H2NR1H3
SCHEMBL27260116 0.79 CYSLTR2 (0.50) CYSLTR2CYSLTR1LIPGNR1H2NR1H3
SCHEMBL379442 0.79 CYSLTR2 (0.50) CYSLTR2CYSLTR1LIPGNR1H2NR1H3
SCHEMBL27997497 0.79 CYSLTR2 (0.50) CYSLTR2CYSLTR1LIPGNR1H2NR1H3
SCHEMBL9699968 0.78 LIPG (0.69) CYSLTR2CYSLTR1LIPGNR1H2NR1H3
SCHEMBL15809821 0.78 LIPG (0.69) CYSLTR2CYSLTR1LIPGNR1H2NR1H3
SCHEMBL6679764 0.78 LIPG (0.69) CYSLTR2CYSLTR1LIPGNR1H2NR1H3
SCHEMBL18496530 0.78 LIPG (0.69) CYSLTR2CYSLTR1LIPGNR1H2NR1H3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090286020-A1 PHOTOSENSITIVE DRY FILM FOR PRODUCTION OF THREE-DIMENSIONAL MICRO-MOLDED PRODUCT, AND PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2009-11-19 US disclosed