Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10833378 | 0.95 | TDP1 (0.37) | TDP1 | |
| SCHEMBL9699428 | 0.95 | TDP1 (0.33) | TDP1 | |
| SCHEMBL7938632 | 0.90 | TDP1 (0.41) | TDP1KDM4EMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL4314761 | 0.86 | PAOX (0.33) | TDP1KDM4E | |
| SCHEMBL8597886 | 0.85 | TDP1 (0.31) | TDP1 | |
| SCHEMBL10942175 | 0.84 | PAOX (0.37) | KDM4EKMT2A | |
| SCHEMBL8716909 | 0.83 | TDP1 (0.36) | TDP1MEN1KMT2A | |
| SCHEMBL7648763 | 0.82 | PAOX (0.35) | KDM4EKMT2A | |
| SCHEMBL10352910 | 0.82 | PAOX (0.35) | KDM4EKMT2A | |
| SCHEMBL18465506 | 0.82 | TDP1 (0.36) | TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107641174-A | A kind of copper (II) ion surface imprinted polymer of zwitterion double crossing over and preparation method thereof | 淮海工学院 | 2018-01-30 | — | — | CN | claimed |
| CN-107602784-A | Ion surface imprinted material of a kind of silicon substrate copper (II) and preparation method thereof | 淮海工学院 | 2018-01-19 | — | — | CN | claimed |
| US-20050197420-A1 | Class of amine coinitiators in photoinitiated polymerizations | ALBEMARLE CORPORATION | 2005-09-08 | — | — | US | claimed |
| JP-6011476-A | — | — | None | — | — | JP | disclosed |
| US-10581119-B2 | Polymeric ion traps for suppressing or minimizing transition metal ions and dendrite formation or growth in lithium-ion batteries | GM Global Technology Operations LLC (US) | 2020-03-03 | — | — | US | disclosed |
| US-20190013551-A1 | POLYMERIC ION TRAPS FOR SUPPRESSING OR MINIMIZING TRANSITION METAL IONS AND DENDRITE FORMATION OR GROWTH IN LITHIUM-ION BATTERIES | GM Global Technology Operations LLC | 2019-01-10 | — | — | US | disclosed |
| CN-107641174-A | A kind of copper (II) ion surface imprinted polymer of zwitterion double crossing over and preparation method thereof | 淮海工学院 | 2018-01-30 | — | — | CN | disclosed |
| CN-107602784-A | Ion surface imprinted material of a kind of silicon substrate copper (II) and preparation method thereof | 淮海工学院 | 2018-01-19 | — | — | CN | disclosed |
| EP-1789494-B1 | PURIFIED POLYMERIC MATERIALS AND METHODS OF PURIFYING POLYMERIC MATERIALS | SABIC INNOVATIVE PLASTICS IP (NL) | 2013-05-29 | — | — | EP | disclosed |
| US-7585935-B2 | Purified polymeric materials and methods of purifying polymeric materials | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2009-09-08 | — | — | US | disclosed |
| EP-1167421-B1 | Production process of polyphenylene ether | MITSUBISHI GAS CHEMICAL CO (JP) | 2008-12-31 | — | — | EP | disclosed |
| US-20050046070-A1 | Methods of purifying polymeric material | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2005-03-03 | — | — | US | disclosed |
| US-20050049362-A1 | comprises polyphenylene ethers and polystyrene with reduced impurities; for use in data storage media | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2005-03-03 | — | — | US | disclosed |
| US-6586567-B2 | Contacting, with an aqueous solution of a chelating agent, a polyphenylene ether solution and adding a water-soluble poor solvent for polyphenylene ether to precipitate polyphenylene ether; recovering precipitated polyphenylene ether | MITSUBISHI GAS CHEMICAL COMPANY INC. (JP) | 2003-07-01 | — | — | US | disclosed |
| US-20020040126-A1 | Production process of polyphenylene ether | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2002-04-04 | — | — | US | disclosed |
| EP-1167421-A2 | Production process of polyphenylene ether | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-01-02 | — | — | EP | disclosed |
| JP-H0611476-A | ION SENSITIVE SUBSTANCE AND ION SENSOR | TOSHIBA CORP | 1994-01-21 | — | — | JP | disclosed |
| US-4536567-A | Removal of the catalyst from polyphenylene ethers | BASF AKTIENGESELLSCHAFT (DE) | 1985-08-20 | — | — | US | disclosed |
| EP-0043121-A1 | Modified highmolecular poly(vinylcarbonic acid amides), a process for their preparation and their use | Benckiser-Knapsack GmbH (DE) | 1982-01-06 | — | — | EP | disclosed |
| US-4217308-A | Process for preparing N-alkylethylenediamines | AMERICAN CYANAMID COMPANY (US) | 1980-08-12 | — | — | US | disclosed |