SCHEMBL43111

SCHEMBL43111

CC(=CCN=C=O)N=C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL321568 0.78
SCHEMBL11744931 0.73
SCHEMBL1071977 0.73
SCHEMBL448514 0.71 CD81 (0.30)
SCHEMBL27806873 0.69
SCHEMBL22710126 0.69
SCHEMBL28757761 0.67 ALDH1A1 (0.32)
SCHEMBL43461 0.67
SCHEMBL7948597 0.66 KMT2A (0.57)
SCHEMBL9293931 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2950 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250346778-A1 FLUORINE-CONTAINING COMPOUND DAIKIN INDUSTRIES, LTD. (JP) 2025-11-13 US claimed
EP-4574872-A1 FLUORINE-CONTAINING COMPOUND DAIKIN INDUSTRIES, LTD. (JP) 2025-06-25 EP claimed
WO-2024185707-A1 FLUORINE-CONTAINING COMPOUND ダイキン工業株式会社 2024-09-12 WO claimed
US-20240141093-A1 Polyol and a Process for the Preparation Thereof BASF SE (DE) 2024-05-02 US claimed
EP-4308629-A1 POLYOL AND A PROCESS FOR THE PREPARATION THEREOF BASF SE (DE) 2024-01-24 EP claimed
CN-117004177-A Toughened resin composition 江西联茂电子科技有限公司 2023-11-07 CN claimed
CN-117004178-A Toughened and modified compound and its preparing process 江西联茂电子科技有限公司 2023-11-07 CN claimed
CN-117002110-A Metal foil laminate, printed circuit board and method for manufacturing the same 联茂(无锡)电子科技有限公司 2023-11-07 CN claimed
CN-117004164-A Toughened and modified compound and its preparing process 江西联茂电子科技有限公司 2023-11-07 CN claimed
CN-117002106-A Metal foil laminate, printed circuit board and method for manufacturing the same 联茂(无锡)电子科技有限公司 2023-11-07 CN claimed
US-8535874-B2 Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same LG CHEM, LTD. (KR) 2013-09-17 US claimed
US-20100201925-A1 FLUORENE-BASED POLYMER CONTAINING URETHANE GROUPS, PREPARATION METHOD THEREOF AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME LG CHEM LTD. (KR) 2010-08-12 US claimed
WO-2009048231-A2 FLUORENE-BASED POLYMER CONTAINING URETHANE GROUPS, PREPARATION METHOD THEREOF AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME LG CHEM. LTD. (KR) 2009-04-16 WO claimed
US-20030162123-A1 Functionalized polymer SHIPLEY COMPANY, L.L.C. 2003-08-28 US claimed
US-20020028874-A1 Stable aqueous polymer dispersions and a process for their preparation MCWHORTER TECHNOLOGIES, INC. 2002-03-07 US claimed
US-5401782-A Storage stable epoxy resin of bisphenol A half blocked with isocyanate and sulfide forming sulfonium NIPPON PAINT CO., LTD. (JP) 1995-03-28 US claimed
US-5338479-A Solvent dispersible polymeric vehicle containing polyester polymer, crosslinking agent of blend of blocked diisocyanate and blocked polyisocyanate compounds CARGILL, INCORPORATED (US) 1994-08-16 US claimed
US-RE34093-E Latex emulsion or dispersion of a vinyl homo or copolymer and an isocyanate which has undergone at least partial reaction wi th an alcohol ASHLAND INC. (A KENTUCKY CORPORATION) 1992-10-06 US claimed
US-4726590-A BLEND OF CROSSLINKED ELASTOMER, FREE RADICAL CATALYST, ZINC SALT OF UNSATURATED ACID AND ISOCYANATE SPALDING & EVENFLO COMPANIES, INC. (US) 1988-02-23 US claimed
US-4396738-A ADDITION POLYMER, PARTIALLY BLOCKED POLYISOCYANATE ASHLAND OIL, INC. (US) 1983-08-02 US claimed