Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.36 |
| ▸ | CA2 | P00918 | 2/20 | 0.36 |
| ▸ | CA7 | P43166 | 1/20 | 0.30 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13892237 | 1.00 | CA1 (0.36) | CA1CA2CA7CA13 | |
| SCHEMBL778288 | 0.91 | CA1 (0.31) | CA1CA2 | |
| SCHEMBL14640491 | 0.90 | CA1 (0.43) | CA1CA2 | |
| SCHEMBL777039 | 0.90 | CA1 (0.48) | CA1CA2 | |
| SCHEMBL11887373 | 0.89 | CA1 (0.30) | CA1CA2 | |
| SCHEMBL777451 | 0.88 | CA1 (0.52) | CA1CA2CA7 | |
| SCHEMBL3706337 | 0.84 | SYK (0.32) | CA1CA2 | |
| Pyridine SCHEMBL6278482 | 0.84 | GRIN1 (0.34) | — | |
| SCHEMBL20602676 | 0.84 | RORC (0.32) | — | |
| SCHEMBL4312927 | 0.81 | CA1 (0.35) | CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120092035-A | Cationically curable composition | 日产化学株式会社 | 2025-06-03 | — | — | CN | disclosed |
| WO-2024090531-A1 | CATION-CURABLE COMPOSITION | 日産化学株式会社 | 2024-05-02 | — | — | WO | disclosed |
| US-7595144-B2 | Sulfonate-containing anti-reflective coating forming composition for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-09-29 | — | — | US | disclosed |
| US-20080003524-A1 | Sulfonate-Containing Anti-Reflective Coating Forming Composition for Lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| EP-1813987-A1 | SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2007-08-01 | — | — | EP | disclosed |