SCHEMBL777451

SCHEMBL777451

O=S(=O)(OC1CCCCC1)C(F)(F)F

nearest known ligand 0.52

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.52
CA2 P00918 1/20 0.52
CA12 O43570 1/20 0.30
CA7 P43166 1/20 0.30
CA14 Q9ULX7 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL777039 0.98 CA1 (0.48) CA1CA2
SCHEMBL14640491 0.93 CA1 (0.43) CA1CA2
SCHEMBL4318052 0.88 CA1 (0.36) CA1CA2CA7
SCHEMBL13892237 0.88 CA1 (0.36) CA1CA2CA7
SCHEMBL5274915 0.87 CA1 (0.48) CA1CA2
SCHEMBL4312927 0.84 CA1 (0.35) CA1CA2
SCHEMBL778288 0.80 CA1 (0.31) CA1CA2
SCHEMBL6229386 0.79 CA1 (0.33) CA1CA2
SCHEMBL11887373 0.78 CA1 (0.30) CA1CA2
SCHEMBL3706337 0.78 SYK (0.32) CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119735984-B Antireflective composition, antireflective film, patterning process, patterned substrate, semiconductor device, and method for manufacturing the same 珠海基石科技有限公司 2025-05-23 CN claimed
CN-119735984-A Antireflective composition, antireflective film, patterning process, patterned substrate, semiconductor device, and method for manufacturing the same 珠海基石科技有限公司 2025-04-01 CN claimed
US-20240294771-A1 ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER Tan Kah Kee Innovation Laboratory (CN) 2024-09-05 US claimed
WO-2023070957-A1 ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER 嘉庚创新实验室 2023-05-04 WO claimed
CN-113913075-B Anti-reflective coating composition and crosslinkable polymer 嘉庚创新实验室 2022-09-20 CN claimed
CN-113913075-A Anti-reflective coating composition and crosslinkable polymer 嘉庚创新实验室 2022-01-11 CN claimed
CN-105085264-A Asymmetric synthesis method for tanshinol ester derivative UNIV SHANGHAI JIAOTONG 2015-11-25 CN claimed
US-20260118762-A1 POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION Tan Kah Kee Innovation Laboratory (CN) 2026-04-30 US disclosed
US-20260118761-A1 COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION Tan Kah Kee Innovation Laboratory (CN) 2026-04-30 US disclosed
US-20250231488-A1 ANTI-REFLECTIVE COATING COMPOSITION Tan Kah Kee Innovation Laboratory (CN) 2025-07-17 US disclosed
CN-119735984-B Antireflective composition, antireflective film, patterning process, patterned substrate, semiconductor device, and method for manufacturing the same 珠海基石科技有限公司 2025-05-23 CN disclosed
CN-119978922-A Antireflective composition, antireflective film, patterning method, patterned substrate, semiconductor device, and method for producing the same 珠海基石科技有限公司 2025-05-13 CN disclosed
CN-119735984-A Antireflective composition, antireflective film, patterning process, patterned substrate, semiconductor device, and method for manufacturing the same 珠海基石科技有限公司 2025-04-01 CN disclosed
EP-1003505-A1 HETEROCYCLIC VINYLETHERS AGAINST NEUROLOGICAL DISORDERS F. HOFFMANN-LA ROCHE AG (CH) 2000-05-31 EP disclosed
US-6054588-A Heterocyclic vinyl ethers HOFFMAN-LA ROCHE INC. (US) 2000-04-25 US disclosed
US-5981752-A Tricyclic compounds having fungicidal activity, their preparation and their use SANKYO COMPANY, LIMITED (JP) 1999-11-09 US disclosed
WO-1999008678-A1 HETEROCYCLIC VINYLETHERS AGAINST NEUROLOGICAL DISORDERS F. HOFFMANN-LA ROCHE AG (CH) 1999-02-25 WO disclosed
US-5773618-A PYRROLOQUINOLINONE DERIVATIVES SANKYO COMPANY, LIMITED (JP) 1998-06-30 US disclosed
CN-1172809-A Tricyclic compounds having fungicidal activity, their preparation and their use SANKYO CO (JP) 1998-02-11 CN disclosed
EP-0807631-A1 Tricyclic compounds having fungicidal activity, their preparation and their use SANKYO COMPANY LIMITED (JP) 1997-11-19 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260118761-A1 COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION RAD51, COL2A1, MRPL11 CA1 463/4885CA2 973/4885CA12 184/4885
US-20260118762-A1 POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION SEC23B, SEC23IP, SEC16A CA1 1031/4885CA2 2497/4885CA12 2322/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.