SCHEMBL4325459

SCHEMBL4325459

CC(C)(C)C(S)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22980744 0.79
SCHEMBL9866977 0.79
SCHEMBL9273466 0.77 ALDH1A1 (0.45)
SCHEMBL16590566 0.75
SCHEMBL11799779 0.75 RNPEP (0.38)
SCHEMBL300184 0.71
SCHEMBL27867633 0.71 RNPEP (0.39)
SCHEMBL20663427 0.69 RNPEP (0.43)
SCHEMBL7654013 0.69 ALDH1A1 (0.50)
SCHEMBL1849072 0.69 RNPEP (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11966161-B2 Radiation-sensitive resin composition, method of forming resist pattern, and compound JSR CORPORATION (JP) 2024-04-23 US disclosed
US-20240115719-A1 COMPOUND OR SALT THEREOF, AND ANTIBODY OBTAINED BY USING THE SAME AJINOMOTO CO., INC. (JP) 2024-04-11 US disclosed
EP-4306535-A1 COMPOUND OR SALT THEREOF, AND ANTIBODY OBTAINED USING SAME AJINOMOTO CO., INC. (JP) 2024-01-17 EP disclosed
US-20230244143-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND JSR CORPORATION (JP) 2023-08-03 US disclosed
WO-2021140761-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND JSR株式会社 2021-07-15 WO disclosed
WO-2021039993-A1 CHLORINATED VINYL CHLORIDE RESIN COMPOSITION AND CHLORINATED VINYL CHLORIDE RESIN MOLDED BODY 積水化学工業株式会社 2021-03-04 WO disclosed
CN-104010505-A Pesticidal compositions and methods related thereto DOW AGROSCIENCES LLC 2014-08-27 CN disclosed
CN-103619171-A Pesticidal compositions and methods related thereto DOW AGROSCIENCES LLC 2014-03-05 CN disclosed
US-20090203716-A1 Pyrimidine low molecular weight ligands for modulating hormone receptors The Government of the United States of America as represented by the Secretary of the 2009-08-13 US disclosed
US-7105602-B1 Processing aid for thermoplastic resin and thermoplastic resin composition containing the same KANEKA CORPORATION (JP) 2006-09-12 US disclosed
EP-1197507-B1 Stabilised Mono- and Polyaspartic acid ester BAYER MATERIALSCIENCE AG (DE) 2005-06-01 EP disclosed
EP-0826000-B1 PEPTIDE COMPOUNDS WHICH INHIBIT METALLOPROTEINASE AND TNF LIBERATION AND THEIR THERAPEUTIC USES DARWIN DISCOVERY LTD (GB) 2002-10-23 EP disclosed
EP-1209203-A1 PROCESSING AID FOR THERMOPLASTIC RESIN AND THERMOPLASTIC RESIN COMPOSITION CONTAINING THE SAME KANEKA CORPORATION (JP) 2002-05-29 EP disclosed
EP-1197507-A2 Stabilised Mono- and Polyaspartic acid ester BAYER AG (DE) 2002-04-17 EP disclosed
US-6110896-A TRIPEPTIDYL DERIVATIVES HAVING A MERCAPTO OR ACYLTHIO GROUP AND WHICH ARE AMIDES; UTILITY AS MATRIX METALLOPROTEASE OR TNF INHIBITORS DARWIN DISCOVERY, LTD. (GB) 2000-08-29 US disclosed
EP-0347811-B1 Alkanoic acid derivatives and herbicidal compositions KUMIAI CHEMICAL INDUSTRY CO (JP) 1994-03-30 EP disclosed
US-5087289-A ALKANOIC ACID DERIVATIVES AND HERBICIDAL COMPOSITIONS KUMIAI CHEMICAL INDUSTRY CO., LTD. (JP) 1992-02-11 US disclosed
US-4968340-A PREEMERGENCE KUMIAI CHEMICAL INDUSTRY CO., LTD. (JP) 1990-11-06 US disclosed
EP-0347811-A1 Alkanoic acid derivatives and herbicidal compositions KUMIAI CHEMICAL INDUSTRY CO., LTD. (JP) 1989-12-27 EP disclosed