Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HRH3 | Q9Y5N1 | 12/20 | 0.60 |
| ▸ | KCNH2 | Q12809 | 4/20 | 0.60 |
| ▸ | CYP2C9 | P11712 | 4/20 | 0.51 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
| ▸ | RECQL | P46063 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.45 |
| ▸ | NPC1 | O15118 | 1/20 | 0.45 |
| ▸ | POLB | P06746 | 1/20 | 0.45 |
| ▸ | RAB9A | P51151 | 1/20 | 0.45 |
| ▸ | BLM | P54132 | 1/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.45 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.45 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.43 |
| ▸ | ALOX5AP | P20292 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8683784 | 1.00 | HRH3 (0.60) | HRH3KCNH2CYP2C9CYP3A4ALDH1A1 | |
| SCHEMBL8682954 | 1.00 | HRH3 (0.60) | HRH3KCNH2CYP2C9CYP3A4ALDH1A1 | |
| SCHEMBL5550670 | 0.98 | HRH3 (0.58) | HRH3KCNH2CYP2C9CYP3A4ALDH1A1 | |
| SCHEMBL346897 | 0.91 | ALDH1A1 (0.52) | HRH3KCNH2CYP2C9CYP3A4ALDH1A1 | |
| SCHEMBL11329684 | 0.90 | HRH3 (0.55) | HRH3KCNH2CYP2C9CYP3A4ALDH1A1 | |
| SCHEMBL27508210 | 0.90 | HRH3 (0.61) | HRH3KCNH2CYP2C9CYP3A4MEN1 | |
| SCHEMBL12835099 | 0.88 | HRH3 (0.60) | HRH3KCNH2CYP2C9CYP3A4MEN1 | |
| SCHEMBL23082125 | 0.88 | HRH3 (0.53) | HRH3KCNH2CYP2C9CYP3A4ALDH1A1 | |
| SCHEMBL346359 | 0.88 | HRH3 (0.48) | HRH3KCNH2CYP2C9CYP3A4ALDH1A1 | |
| SCHEMBL9808038 | 0.87 | HRH3 (0.71) | HRH3KCNH2CYP2C9CYP3A4NFE2L2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1102676-C | Polyester fiber and methods for making same | DU PONT (US) | 2003-03-05 | — | — | CN | claimed |
| CN-1298460-A | Polyester fiber and method for producing same | DU PONT (US) | 2001-06-06 | — | — | CN | claimed |
| US-5959066-A | COMBINING IN A REACTOR A TEREPHTHALOYL MOIETY, AN AROMATIC DIACID, ETHYLENE GLYCOL MOIETY AND AN ISOSORBIDE MOIETY, AND A CONDENSATION CATALYST; HEATING TO YIELD AN ISOTROPIC POLYESTER SUITABLE FOR FILMS, BEVERAGE BOTTLES, MOLDINGS | HNA HOLDINGS, INC. (US) | 1999-09-28 | — | — | US | claimed |
| US-5958581-A | FORM TEREPHTHALIC ACID, ETHYLENE GLYCOL AND ISOSORBIDE MIXTURES | HNA HOLDINGS, INC. (US) | 1999-09-28 | — | — | US | claimed |
| US-4255152-A | USING A DISPERSE DYE, WATER, AND AN ADDUCT OF ETHYLENE, PROPYLENE, OR STYRENE OXIDE AND A CYCLIC-SUBSTITUTED PHENOL; LEVELLING | CIBA-GEIGY CORPORATION (US) | 1981-03-10 | — | — | US | claimed |
| WO-2021006192-A1 | THERMOPLASTIC RESIN COMPOSITION, MOLDED ARTICLE AND PRODUCT | 三菱電機株式会社 | 2021-01-14 | — | — | WO | disclosed |
| WO-2019151504-A1 | THERMOPLASTIC RESIN COMPOSITION AND MOLDED ARTICLE THEREOF | 帝人株式会社 | 2019-08-08 | — | — | WO | disclosed |
| EP-1243572-B1 | PROCESS FOR THE PREPARATION OF CYCLOHEXANOL | ASAHI CHEMICAL IND (JP) | 2015-03-25 | — | — | EP | disclosed |
| WO-2013047895-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD EACH USING THE COMPOSITION, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND PRODUCTION METHOD OF RESIN | FUJIFILM CORPORATION (JP) | 2013-04-04 | — | — | WO | disclosed |
| WO-2012153869-A1 | POSITIVE RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-11-15 | — | — | WO | disclosed |
| WO-2011093520-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2011-08-04 | — | — | WO | disclosed |
| CN-100558341-C | A kind of bathing agent that utilizes Herba Schizonepetae to suppress staphylococcus aureus | UNIV SUN YAT SEN (CN) | 2009-11-11 | — | — | CN | disclosed |
| US-5780194-A | PHOTOSENSITIVE LAYER OF POLYESTER BINDING RESIN, ELECTRIC CHARGE GENERATING MATERIAL, AND HOLE TRANSFERRING MATERIAL | MITA INDUSTRIAL CO., LTD. (JP) | 1998-07-14 | — | — | US | disclosed |
| US-5723264-A | RADIATION TRANSPARENT POLYESTER MULTILAYER ELEMENT ON SUBSTRATE | EASTMAN KODAK COMPANY (US) | 1998-03-03 | — | — | US | disclosed |
| US-5686553-A | TEREPHTHALIC ACID AND ETHYLENE GLYCOL COMONOMERS; MOLDABILITY | KURARAY CO., LTD. (JP) | 1997-11-11 | — | — | US | disclosed |
| US-5503904-A | Invisible information recorded medium | CANON KABUSHIKI KAISHA (JP) | 1996-04-02 | — | — | US | disclosed |
| EP-0608118-A2 | Invisible information recorded medium, invisible information detecting apparatus and recording agent | CANON KABUSHIKI KAISHA (JP) | 1994-07-27 | — | — | EP | disclosed |
| US-4288516-A | Polyester resin containing magnetic toner material and process for its use in flash fuser | XEROX CORPORATION (US) | 1981-09-08 | — | — | US | disclosed |
| EP-0033248-A1 | Magnetic toner and method for developing using same | XEROX CORPORATION (US) | 1981-08-05 | — | — | EP | disclosed |
| US-4255152-A | USING A DISPERSE DYE, WATER, AND AN ADDUCT OF ETHYLENE, PROPYLENE, OR STYRENE OXIDE AND A CYCLIC-SUBSTITUTED PHENOL; LEVELLING | CIBA-GEIGY CORPORATION (US) | 1981-03-10 | — | — | US | disclosed |