Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 2/20 | 0.66 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.66 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.56 |
| ▸ | MEN1 | O00255 | 6/20 | 0.56 |
| ▸ | LMNA | P02545 | 4/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.56 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.54 |
| ▸ | MAPT | P10636 | 6/20 | 0.52 |
| ▸ | GAA | P10253 | 4/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.52 |
| ▸ | CASP1 | P29466 | 1/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.52 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.51 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 3/20 | 0.47 |
| ▸ | NPC1 | O15118 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | RAB9A | P51151 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10041813 | 0.86 | GABRA1 (0.63) | GABRA1GABRB2KMT2AMEN1LMNA | |
| SCHEMBL168974 | 0.85 | GABRA1 (0.79) | GABRA1GABRB2KMT2AMEN1LMNA | |
| SCHEMBL29952629 | 0.85 | GABRA1 (0.61) | GABRA1GABRB2KMT2AMEN1LMNA | |
| SCHEMBL617923 | 0.85 | GABRA1 (0.61) | GABRA1GABRB2KMT2AMEN1LMNA | |
| SCHEMBL9014124 | 0.83 | GABRA1 (0.59) | GABRA1GABRB2KMT2AMEN1LMNA | |
| SCHEMBL6823137 | 0.82 | KMT2A (0.62) | GABRA1GABRB2KMT2AMEN1LMNA | |
| SCHEMBL7171833 | 0.82 | KMT2A (0.62) | GABRA1GABRB2KMT2AMEN1LMNA | |
| SCHEMBL9013928 | 0.82 | GABRA1 (0.58) | GABRA1GABRB2KMT2AMEN1LMNA | |
| SCHEMBL14433461 | 0.82 | GABRA1 (0.58) | GABRA1GABRB2KMT2AMEN1LMNA | |
| SCHEMBL10071685 | 0.80 | KMT2A (0.61) | GABRA1GABRB2KMT2AMEN1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023203827-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-10-26 | — | — | WO | disclosed |
| US-9643960-B2 | Procaspase activating compounds | THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (US) | 2017-05-09 | — | — | US | disclosed |
| US-9102661-B2 | Design, synthesis and evaluation of procaspase activating compounds as personalized anti-cancer drugs | THE BOARD OF TRUSTEES OF THE UNIVERSITY ILLINOIS (US) | 2015-08-11 | — | — | US | disclosed |
| US-8859187-B2 | Method of forming resist pattern and negative resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| EP-1895576-B1 | PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO LTD (JP) | 2014-07-23 | — | — | EP | disclosed |
| US-8349543-B2 | Pattern-forming method, metal oxide film-forming material and method for using the metal oxide film-forming material | TOKYO OHKA KOGYO CO. LTD. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-8263322-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-09-11 | — | — | US | disclosed |
| US-8124312-B2 | Method for forming pattern, and material for forming coating film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-02-28 | — | — | US | disclosed |
| US-8101013-B2 | Film-forming material and method of forming pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-24 | — | — | US | disclosed |
| US-8025923-B2 | Method for manufacturing a structure | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-09-27 | — | — | US | disclosed |
| US-20100035177-A1 | METHOD FOR FORMING PATTERN, AND MATERIAL FOR FORMING COATING FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-02-11 | — | — | US | disclosed |
| US-20100003622-A1 | PATTERN-FORMING METHOD, METAL OXIDE FILM-FORMING MATERIAL AND METHOD FOR USING THE METAL OXIDE FILM-FORMING MATERIAL | Tokyo Ohka Kogy Co., Ltd (JP) | 2010-01-07 | — | — | US | disclosed |
| US-20090191478-A1 | METHOD OF FORMING RESIST PATTERN AND NEGATIVE RESIST COMPOSITION | TOKYO OHKA KOGYO CO., LTD (JP) | 2009-07-30 | — | — | US | disclosed |
| US-20090134119-A1 | FILM-FORMING MATERIAL AND METHOD OF FORMING PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-05-28 | — | — | US | disclosed |
| US-20090087625-A1 | METHOD FOR MANUFACTURING STRUCTURE, AND STRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090061170-A1 | ANISOTROPIC FILM AND METHOD OF MANUFACTURING ANISOTROPIC FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20090029284-A1 | PATTERN COATING MATERIAL AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |
| EP-1895576-A1 | PATTERN COATING MATERIAL AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-03-05 | — | — | EP | disclosed |
| US-5529886-A | PHOTOSENSITIVE MIXTURE OF A COMPOUND WHICH ON EXPOSURE TO ACTINIC RADIATION FORMS ACID, AND AN ACID-CLEAVABLE ACRYLATE HOMO OR COPOLYMER | HOECHST AKTIENGESELLSCHAFT (DE) | 1996-06-25 | — | — | US | disclosed |
| US-5442087-A | Preparing offset printing plates and photoresists | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-08-15 | — | — | US | disclosed |