Biphenyl

Biphenyl

SCHEMBL4335342

O=C(O)c1ccc2cc1C(=O)OC(=O)c1ccc-2c(C(=O)O)c1O.c1ccc(-c2ccccc2)cc1

nearest known ligand 0.47

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 3/20 0.47
ACMSD Q8TDX5 4/20 0.45
HNF4A P41235 3/20 0.45
DHFR P00374 1/20 0.42
MCL1 Q07820 1/20 0.42
TYMS P04818 1/20 0.41
AKR1C2 P52895 4/20 0.39
AKR1C1 Q04828 4/20 0.39
AKR1C3 P42330 2/20 0.39
AKR1C4 P17516 1/20 0.39
CDC25B P30305 1/20 0.39
ATM Q13315 1/20 0.39
PTPN2 P17706 2/20 0.38
PTPN6 P29350 2/20 0.38
DCLRE1A Q6PJP8 1/20 0.38
DCLRE1B Q9H816 1/20 0.38
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA4 P22748 1/20 0.38
CA7 P43166 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL168301 0.79 TYMS (0.51) PTPN1ACMSDHNF4ADHFRMCL1
Biphenyl SCHEMBL509719 0.79 PTPN1 (0.53) PTPN1ACMSDHNF4ADHFRMCL1
SCHEMBL538529 0.77 TYMS (0.50) PTPN1ACMSDHNF4ADHFRMCL1
Biphenyl SCHEMBL2775900 0.76 PTPN1 (0.53) PTPN1ACMSDHNF4ADHFRMCL1
SCHEMBL2188108 0.75 TYMS (0.49) PTPN1ACMSDHNF4ADHFRMCL1
SCHEMBL9328193 0.73 TYMS (0.58) ACMSDHNF4AMCL1TYMSCA12
SCHEMBL1246295 0.72 TYMS (0.49) PTPN1ACMSDHNF4ADHFRMCL1
SCHEMBL11863723 0.72 TYMS (0.45) PTPN1ACMSDHNF4ADHFRMCL1
SCHEMBL14956911 0.72 TYMS (0.47) ACMSDHNF4ADHFRMCL1TYMS
SCHEMBL14321815 0.71 TYMS (0.49) ACMSDHNF4AMCL1TYMSCA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090092801-A1 NONAQUEOUS INKJET INK, INK COMPOSITION FOR INKJET RECORDING, AND SUBSTRATE FOR COLOR FILTER TOYO INK MANUFACTURING CO., LTD. (JP) 2009-04-09 US disclosed
US-7141614-B2 Photosensitive resin composition and photosensitive films and laminates made by using the same KANEKA CORPORATION (JP) 2006-11-28 US disclosed
US-20040265731-A1 Photosensitive resin composition and photosensitive films and laminates made by using the same KANEKA CORPORATION (JP) 2004-12-30 US disclosed