SCHEMBL4335750

SCHEMBL4335750

CC(C)OO.[NaH]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL126090 0.95
SCHEMBL27509020 0.90
SCHEMBL28063650 0.90
Hydrogen Sulfide SCHEMBL9309670 0.90 ALDH1A1 (0.33)
SCHEMBL11760806 0.90
Methyl Alcohol SCHEMBL28400157 0.90
Ammonia Solution, Strong SCHEMBL9929546 0.90
SCHEMBL29728818 0.82 TSHR (0.37)
Benzene SCHEMBL864531 0.82 TSHR (0.32)
Bicarbonate SCHEMBL95011 0.79 TSHR (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118164879-A Preparation method of deuterated methionine 中国科学院深圳先进技术研究院 2024-06-11 CN disclosed
US-7605191-B2 polyoxyethylene glycol having end group of acrylamide derivatives, can be curing to provide medical device a surface coating which has hydrophilicity and high bioadaptability TOYO GOSEI CO., LTD. (JP) 2009-10-20 US disclosed
EP-1865012-A1 PHOTOSENSITIVE RESIN, PHOTOSENSITIVE COMPOSITION AND PHOTOCROSSLINKED ITEM Toyo Gosei Kogyo Co., Ltd. (JP) 2007-12-12 EP disclosed
US-20060235103-A1 Photosensitive resin, photosensitive composition and photo-crosslinked structure TOYO GOSEI CO., LTD. (JP) 2006-10-19 US disclosed