Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.50 |
| ▸ | GAA | P10253 | 1/20 | 0.50 |
| ▸ | HTT | P42858 | 2/20 | 0.49 |
| ▸ | PKM | P14618 | 2/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.47 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | MMP13 | P45452 | 4/20 | 0.46 |
| ▸ | MMP1 | P03956 | 3/20 | 0.46 |
| ▸ | MMP8 | P22894 | 1/20 | 0.46 |
| ▸ | MMP3 | P08254 | 2/20 | 0.45 |
| ▸ | MMP7 | P09237 | 2/20 | 0.45 |
| ▸ | NPC1 | O15118 | 1/20 | 0.45 |
| ▸ | PKLR | P30613 | 1/20 | 0.45 |
| ▸ | RAB9A | P51151 | 1/20 | 0.45 |
| ▸ | CNR1 | P21554 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16712204 | 0.91 | NAAA (0.56) | NAAAGAAHTTPKMALDH1A1 | |
| SCHEMBL11107669 | 0.83 | CYP2D6 (0.61) | KDM4EGAAALDH1A1CYP2D6CYP2C19 | |
| SCHEMBL22621292 | 0.83 | CYP2D6 (0.61) | KDM4EGAAALDH1A1CYP2D6CYP2C19 | |
| SCHEMBL361129 | 0.83 | CYP2D6 (0.61) | KDM4EGAAALDH1A1CYP2D6CYP2C19 | |
| SCHEMBL23192021 | 0.83 | CYP2D6 (0.61) | KDM4EGAAALDH1A1CYP2D6CYP2C19 | |
| SCHEMBL24250706 | 0.83 | CYP2D6 (0.61) | KDM4EGAAALDH1A1CYP2D6CYP2C19 | |
| SCHEMBL9060935 | 0.83 | CYP2D6 (0.61) | KDM4EGAAALDH1A1CYP2D6CYP2C19 | |
| SCHEMBL8370244 | 0.83 | CYP2D6 (0.61) | KDM4EGAAALDH1A1CYP2D6CYP2C19 | |
| SCHEMBL8367865 | 0.83 | CYP2D6 (0.61) | KDM4EGAAALDH1A1CYP2D6CYP2C19 | |
| SCHEMBL777214 | 0.81 | CYP2D6 (0.63) | GAAHTTPKMALDH1A1CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101065445-B | Thermosetting resin composition, thermosetting-resin molding material, and cured object obtained therefrom | SUMITOMO BAKELITE CO | 2011-05-11 | — | — | CN | claimed |
| EP-1163550-B1 | HYDROXY-AMINO THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | FUJIFILM ELECTRONIC MATERIALS (US) | 2007-05-30 | — | — | EP | claimed |
| EP-1163550-A4 | HYDROXY-AMINO THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | ARCH SPEC CHEM INC (US) | 2004-05-26 | — | — | EP | claimed |
| US-20020007018-A1 | Hydroxy-amino thermally cured undercoat for 193 nm lithography | ARCH SPECIALTY CHEMICALS, INC. | 2002-01-17 | — | — | US | claimed |
| EP-1163550-A1 | HYDROXY-AMINO THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | Arch Specialty Chemicals, Inc. (US) | 2001-12-19 | — | — | EP | claimed |
| US-6323287-B1 | USEFUL FOR AN UNDERCOAT LAYER IN DEEP ULTRAVILOLET RADIATION LITHOGRAPHY; FOR CHEMICALLY AMPLIFIED BILAYER RESIST SYSTEMS; SEMICONDUCTORS | ARCH SPECIALTY CHEMICALS, INC. | 2001-11-27 | — | — | US | claimed |
| WO-2000054105-A1 | HYDROXY-AMINO THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-09-14 | — | — | WO | claimed |
| CN-108697595-A | Interior silica containing microcapsule resin particle, its production method and application thereof | 积水化成品工业株式会社 | 2018-10-23 | — | — | CN | disclosed |
| CN-101296952-B | Anti-reflective coatings | AZ ELECTRONIC MATERIALS USA | 2014-03-26 | — | — | CN | disclosed |
| EP-1634916-B1 | Hydroxy-amino thermally cured undercoat for 193 NM lithography | FUJIFILM ELECTRONIC MATERIALS (US) | 2009-01-21 | — | — | EP | disclosed |
| CN-101296952-A | Anti-reflective coatings | AZ ELECTRONIC MATERIALS USA (US) | 2008-10-29 | — | — | CN | disclosed |
| EP-1163550-B1 | HYDROXY-AMINO THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | FUJIFILM ELECTRONIC MATERIALS (US) | 2007-05-30 | — | — | EP | disclosed |
| US-7217497-B2 | Hydroxy-amino thermally cured undercoat for 193 nm lithography | ARCH SPECIALTY CHEMICALS, INC. (US) | 2007-05-15 | — | — | US | disclosed |
| US-6610808-B2 | Thermally cured underlayer for lithographic application | ARCH SPECIALTY CHEMICALS, INC. | 2003-08-26 | — | — | US | disclosed |
| US-20020173594-A1 | Thermally cured underlayer for lithographic application | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-11-21 | — | — | US | disclosed |
| WO-2002073307-A2 | THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-09-19 | — | — | WO | disclosed |
| US-20020007018-A1 | Hydroxy-amino thermally cured undercoat for 193 nm lithography | ARCH SPECIALTY CHEMICALS, INC. | 2002-01-17 | — | — | US | disclosed |
| EP-1163550-A1 | HYDROXY-AMINO THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | Arch Specialty Chemicals, Inc. (US) | 2001-12-19 | — | — | EP | disclosed |
| US-6323287-B1 | USEFUL FOR AN UNDERCOAT LAYER IN DEEP ULTRAVILOLET RADIATION LITHOGRAPHY; FOR CHEMICALLY AMPLIFIED BILAYER RESIST SYSTEMS; SEMICONDUCTORS | ARCH SPECIALTY CHEMICALS, INC. | 2001-11-27 | — | — | US | disclosed |
| WO-2000054105-A1 | HYDROXY-AMINO THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-09-14 | — | — | WO | disclosed |