⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL329235 | 0.75 | — | — | |
| SCHEMBL16284825 | 0.72 | — | — | |
| SCHEMBL28199234 | 0.71 | — | — | |
| SCHEMBL1669393 | 0.69 | CA1 (0.32) | — | |
| SCHEMBL31722469 | 0.69 | — | — | |
| SCHEMBL2269072 | 0.69 | — | — | |
| SCHEMBL17717598 | 0.69 | — | — | |
| SCHEMBL17711106 | 0.69 | — | — | |
| SCHEMBL2102050 | 0.69 | — | — | |
| SCHEMBL2104278 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 742 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260101682-A1 | SELECTIVE DEPOSITION METHOD OF THIN FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | HONGIK UNIVERSITY INDUSTRY-ACADEMIA COOPERATION FOUNDATION (KR) | 2026-04-09 | — | — | US | claimed |
| US-12518966-B2 | Selective plasma enhanced atomic layer deposition | VERSUM MATERIALS US, LLC (US) | 2026-01-06 | — | — | US | claimed |
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | claimed |
| US-20250270698-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | VERSUM MATERIALS US, LLC | 2025-08-28 | — | — | US | claimed |
| US-20250218782-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO, LTD. (KR) | 2025-07-03 | — | — | US | claimed |
| WO-2025038583-A9 | STABILIZED ORGANOSILANE COMPOSITIONS AND METHODS OF USING SAME TO FORM DENSE LOW-K FILMS | VERSUM MATERIALS US, LLC (US) | 2025-04-17 | — | — | WO | claimed |
| WO-2025038583-A1 | STABILIZED ORGANOSILANE COMPOSITIONS AND METHODS OF USING SAME TO FORM DENSE LOW-K FILMS | VERSUM MATERIALS US, LLC (US) | 2025-02-20 | — | — | WO | claimed |
| EP-4493734-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | Versum Materials US, LLC (US) | 2025-01-22 | — | — | EP | claimed |
| CN-119213168-A | Boron-containing precursors for ALD deposition of boron nitride films | 弗萨姆材料美国有限责任公司 | 2024-12-27 | — | — | CN | claimed |
| US-20240047196-A1 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | VERSUM MAT US LLC (US) | 2024-02-08 | — | — | US | claimed |
| US-6136661-A | Method to fabricate capacitor structures with very narrow features using silyated photoresist | VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION (TW) | 2000-10-24 | — | — | US | claimed |
| US-5707783-A | Mixtures of mono- and DI- or polyfunctional silanes as silylating agents for top surface imaging | COMPLEX FLUID SYSTEMS, INC. (US) | 1998-01-13 | — | — | US | claimed |
| US-5663271-A | Polysilanes and method for producing the same | RESEARCH DEVELOPMENT CORPORATION OF JAPAN (JP) | 1997-09-02 | — | — | US | claimed |
| EP-0594175-B1 | Process for producing aromatic polycarbonate | MITSUBISHI CHEM CORP (JP) | 1997-06-18 | — | — | EP | claimed |
| US-5391691-A | Melt condensing am aromatic diol compound and a carbonic acid diester in the presence of an interesterification catalyst and co-presence of an organosilicon compound | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1995-02-21 | — | — | US | claimed |
| CN-1092554-A | Form the method for Micropicture | SAMSUNG ELECTRONICS CO LTD (KR) | 1994-09-21 | — | — | CN | claimed |
| EP-0600747-A2 | Method for forming a fine pattern | SAMSUNG ELECTRONICS CO., LTD. (KR) | 1994-06-08 | — | — | EP | claimed |
| EP-0594175-A1 | Process for producing aromatic polycarbonate | MITSUBISHI CHEMICAL CORPORATION (JP) | 1994-04-27 | — | — | EP | claimed |
| EP-0586860-A2 | Photoresist composition and process for forming a pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 1994-03-16 | — | — | EP | claimed |
| CN-1083938-A | Photoresist composition and application said composition produce the method for figure | SAMSUNG ELECTRONICS CO LTD (KR) | 1994-03-16 | — | — | CN | claimed |