Citric Acid

Citric Acid

SCHEMBL4354146

N.O.O=C(O)CC(O)(CC(=O)O)C(=O)O

nearest known ligand 0.88

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Known targets — ChEMBL curated mechanism

ACVR1ADORA1ADORA2AADORA2BADORA3ESR1ESR2FLT3GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSC1HRH1HTR7IDH1IDH2IRAK1JAK1JAK2JAK3MEN1OPRM1P2RX3PDE5ASCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASIGMAR1SLC6A2SYKTACR1TOP2ATYK2

The experimentally established mechanism targets of Citric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MEN1 known ✓ O00255 1/20 0.40
ALDH1A1 P00352 2/20 0.88
HMGCR P04035 1/20 0.46
CHRM1 P11229 1/20 0.46
TBXA2R P21731 1/20 0.46
ADRA1A P35348 1/20 0.46
TSHR P16473 2/20 0.43
CYP2D6 P10635 2/20 0.43
CYP2C19 P33261 1/20 0.43
HIF1A Q16665 1/20 0.43
ACLY P53396 4/20 0.42
KDM4E B2RXH2 2/20 0.42
LMNA P02545 2/20 0.42
MAPT P10636 1/20 0.42
ALOX15 P16050 1/20 0.42
SLC13A5 Q86YT5 4/20 0.41
CPT2 P23786 1/20 0.41
CYP1A2 P05177 1/20 0.40
KMT2A Q03164 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Citric Acid SCHEMBL4470699 1.00 ALDH1A1 (0.88) ALDH1A1HMGCRCHRM1TBXA2RADRA1A
Citric Acid SCHEMBL8664261 1.00 ALDH1A1 (0.88) ALDH1A1HMGCRCHRM1TBXA2RADRA1A
Citric Acid SCHEMBL29260319 1.00 ALDH1A1 (0.88) ALDH1A1HMGCRCHRM1TBXA2RADRA1A
Citric Acid SCHEMBL11460124 1.00 ALDH1A1 (0.88) ALDH1A1HMGCRCHRM1TBXA2RADRA1A
Citric Acid SCHEMBL4470695 1.00 ALDH1A1 (0.88) ALDH1A1HMGCRCHRM1TBXA2RADRA1A
Citric Acid SCHEMBL4059637 1.00 ALDH1A1 (0.88) ALDH1A1HMGCRCHRM1TBXA2RADRA1A
Citric Acid SCHEMBL29260318 1.00 ALDH1A1 (0.88) ALDH1A1HMGCRCHRM1TBXA2RADRA1A
Citric Acid SCHEMBL28629407 1.00 ALDH1A1 (0.88) ALDH1A1HMGCRCHRM1TBXA2RADRA1A
Citric Acid SCHEMBL28629408 1.00 ALDH1A1 (0.88) ALDH1A1HMGCRCHRM1TBXA2RADRA1A
Citric Acid SCHEMBL3061288 1.00 ALDH1A1 (0.88) ALDH1A1HMGCRCHRM1TBXA2RADRA1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2217497-A None JP disclosed
CN-108004555-B Corrosion inhibiter composition and its application and the method that pickling is carried out to equipment 中国石油化工股份有限公司 2019-11-12 CN disclosed
CN-108004554-B Corrosion inhibiter composition and its application and the method that pickling is carried out to equipment 中国石油化工股份有限公司 2019-09-27 CN disclosed
CN-109686946-A A method of polynary positive pole material is prepared based on carbonate precursor 宁波富理电池材料科技有限公司 2019-04-26 CN disclosed
CN-108004554-A Corrosion inhibiter is with composition and its application and method that pickling is carried out to equipment 中国石油化工股份有限公司 2018-05-08 CN disclosed
CN-108004555-A Corrosion inhibiter is with composition and its application and method that pickling is carried out to equipment 中国石油化工股份有限公司 2018-05-08 CN disclosed
US-20090286104-A1 MULTI-LAYERED NICKEL-PHOSPHOROUS COATINGS AND PROCESSES FOR FORMING THE SAME GENERAL ELECTRIC COMPANY (US) 2009-11-19 US disclosed
CN-100408202-C Electroless plating solution and process MATTSON TECH INC (US) 2008-08-06 CN disclosed
CN-1761534-A Electroless plating solution and method MATTSON TECH INC (US) 2006-04-19 CN disclosed
US-6797312-B2 DOES NOT REQUIRE THE USE OF A CATALYST, COMPRISING A FIRST REDUCING AGENT, A SECOND REDUCING AGENT, A PH ADJUSTING AGENT, A FIRST METAL SOURCE, AND A SECOND METAL SOURCE MATTSON TECHNOLOGY, INC. 2004-09-28 US disclosed
US-20040142114-A1 Electroless plating solution and process MATTSON TECHNOLOGY, INC. 2004-07-22 US disclosed
EP-0674725-B1 ELECTRODEPOSITION OF NICKEL-TUNGSTEN AMORPHOUS AND MICROCRYSTALLINE COATINGS AMORPHOUS TECHNOLOGIES INTERNA (US) 1998-12-02 EP disclosed
EP-0674725-A1 ELECTRODEPOSITION OF NICKEL-TUNGSTEN AMORPHOUS AND MICROCRYSTALLINE COATINGS AMORPHOUS TECHNOLOGIES INTERNATIONAL, INC. (US) 1995-10-04 EP disclosed
US-5389226-A Using bath containing nickel, tungsten, and boron compounds, and hydroxycarboxylic acid AMORPHOUS TECHNOLOGIES INTERNATIONAL, INC. (US) 1995-02-14 US disclosed
WO-1994013863-A1 ELECTRODEPOSITION OF NICKEL-TUNGSTEN AMORPHOUS AND MICROCRYSTALLINE COATINGS AMORPHOUS TECHNOLOGIES INTERNATIONAL, INC. (US) 1994-06-23 WO disclosed
JP-H02217497-A NICKEL-TUNGSTEN-SILICON CARBIDE COMPOSITE PLATING METHOD TAKADA KENKYUSHO:KK 1990-08-30 JP disclosed