Known targets — ChEMBL curated mechanism
ACVR1ADORA1ADORA2AADORA2BADORA3ESR1ESR2FLT3GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSC1HRH1HTR7IDH1IDH2IRAK1JAK1JAK2JAK3MEN1OPRM1P2RX3PDE5ASCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASIGMAR1SLC6A2SYKTACR1TOP2ATYK2
The experimentally established mechanism targets of Citric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 known ✓ | O00255 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.88 |
| ▸ | HMGCR | P04035 | 1/20 | 0.46 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.46 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.46 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 2/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.43 |
| ▸ | ACLY | P53396 | 4/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.42 |
| ▸ | SLC13A5 | Q86YT5 | 4/20 | 0.41 |
| ▸ | CPT2 | P23786 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Citric Acid SCHEMBL8664261 | 1.00 | ALDH1A1 (0.88) | ALDH1A1HMGCRCHRM1TBXA2RADRA1A | |
| Citric Acid SCHEMBL4354146 | 1.00 | ALDH1A1 (0.88) | ALDH1A1HMGCRCHRM1TBXA2RADRA1A | |
| Citric Acid SCHEMBL29260319 | 1.00 | ALDH1A1 (0.88) | ALDH1A1HMGCRCHRM1TBXA2RADRA1A | |
| Citric Acid SCHEMBL11460124 | 1.00 | ALDH1A1 (0.88) | ALDH1A1HMGCRCHRM1TBXA2RADRA1A | |
| Citric Acid SCHEMBL4470695 | 1.00 | ALDH1A1 (0.88) | ALDH1A1HMGCRCHRM1TBXA2RADRA1A | |
| Citric Acid SCHEMBL4059637 | 1.00 | ALDH1A1 (0.88) | ALDH1A1HMGCRCHRM1TBXA2RADRA1A | |
| Citric Acid SCHEMBL29260318 | 1.00 | ALDH1A1 (0.88) | ALDH1A1HMGCRCHRM1TBXA2RADRA1A | |
| Citric Acid SCHEMBL28629407 | 1.00 | ALDH1A1 (0.88) | ALDH1A1HMGCRCHRM1TBXA2RADRA1A | |
| Citric Acid SCHEMBL28629408 | 1.00 | ALDH1A1 (0.88) | ALDH1A1HMGCRCHRM1TBXA2RADRA1A | |
| Citric Acid SCHEMBL3061288 | 1.00 | ALDH1A1 (0.88) | ALDH1A1HMGCRCHRM1TBXA2RADRA1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10265693-B2 | Particles, particle dispersion, particle-dispersed resin composition, producing method therefor, resin molded article, producing method therefor, catalyst particles, catalyst solution, catalyst composition, catalyst molded article, titanium complex, titanium oxide particles and producing method therefor | NITTO DENKO CORPORATION (JP) | 2019-04-23 | — | — | US | disclosed |
| CN-104341787-B | Particle, particle dispersion, particle dissipating resin composition, its manufacture method, resin molded body, its manufacture method | 日东电工株式会社 | 2018-02-16 | — | — | CN | disclosed |
| US-20170189895-A1 | PARTICLES, PARTICLE DISPERSION, PARTICLE-DISPERSED RESIN COMPOSITION, PRODUCING METHOD THEREFOR, RESIN MOLDED ARTICLE, PRODUCING METHOD THEREFOR, CATALYST PARTICLES, CATALYST SOLUTION, CATALYST COMPOSITION, CATALYST MOLDED ARTICLE, TITANIUM COMPLEX, TITANIUM OXIDE PARTICLES AND PRODUCING METHOD THEREFOR | NITTO DENKO CORPORATION (JP) | 2017-07-06 | — | — | US | disclosed |
| US-20160222194-A1 | PARTICLES, PARTICLE DISPERSION, PARTICLE-DISPERSED RESIN COMPOSITION, PRODUCING METHOD THEREFOR, RESIN MOLDED ARTICLE, PRODUCING METHOD THEREFOR, CATALYST PARTICLES, CATALYST SOLUTION, CATALYST COMPOSITION, CATALYST MOLDED ARTICLE, TITANIUM COMPLEX, TITANIUM OXIDE PARTICLES AND PRODUCING METHOD THEREFOR | NITTO DENKO CORPORATION (JP) | 2016-08-04 | — | — | US | disclosed |
| CN-102822098-B | Particle, particle dispersion liquid, particle-dispersed resin composition, method for producing same, resin molded article, method for producing same, catalyst particle, catalyst liquid, catalyst composition, catalyst molded article, titanium complex, titanium oxide particle, and method for producing same | NITTO DENKO CORP. (JP) | 2015-11-25 | — | — | CN | disclosed |
| US-20150065340-A1 | PARTICLES, PARTICLE DISPERSION, PARTICLE-DISPERSED RESIN COMPOSITION, PRODUCING METHOD THEREFOR, RESIN MOLDED ARTICLE, PRODUCING METHOD THEREFOR, CATALYST PARTICLES, CATALYST SOLUTION, CATALYST COMPOSITION, CATALYST MOLDED ARTICLE, TITANIUM COMPLEX, TITANIUM OXIDE PARTICLES AND PRODUCING METHOD THEREFOR | NITTO DENKO CORPORATION (JP) | 2015-03-05 | — | — | US | disclosed |
| CN-104341787-A | PARTICLES, PARTICLE DISPERSION SOLUTION, PARTICLE DISPERSION RESIN COMPOSITION, PRODUCTION METHOD THEREFOR, RESIN MOLDED BODY, PRODUCTION METHOD THEREFOR, | NITTO DENKO CORP | 2015-02-11 | — | — | CN | disclosed |
| US-20130109770-A1 | PARTICLES, PARTICLE DISPERSION, PARTICLE-DISPERSED RESIN COMPOSITION, PRODUCING METHOD THEREFOR, RESIN MOLDED ARTICLE, PRODUCING METHOD THEREFOR, CATALYST PARTICLES, CATALYST SOLUTION, CATALYST COMPOSITION, CATALYST MOLDED ARTICLE, TITANIUM COMPLEX, TITANIUM OXIDE PARTICLES AND PRODUCING METHOD THEREFOR | NITTO DENKO CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| CN-101667493-B | Oxide semiconductor electrode, dye-sensitized solar cell, and, method of producing the same | DAINIPPON PRINTING CO LTD | 2012-09-26 | — | — | CN | disclosed |
| CN-1841786-B | Oxide semiconductor electrode, dye-sensitized solar cell, and method for producing same | DAINIPPON PRINTING CO LTD | 2012-07-18 | — | — | CN | disclosed |
| CN-101061062-B | Method for producing metal oxide film | DAINIPPON PRINTING CO LTD | 2011-03-02 | — | — | CN | disclosed |
| CN-101056716-B | Method for producing metal oxide film | DAINIPPON PRINTING CO LTD | 2010-05-05 | — | — | CN | disclosed |
| CN-101667493-A | Oxide semiconductor electrode, dye-sensitized solar cell, and, method of producing the same | DAINIPPON PRINTING CO LTD | 2010-03-10 | — | — | CN | disclosed |
| US-7632539-B2 | Method for manufacturing photoconductive layers that constitute radiation imaging panels | FUJIFILM CORPORATION (JP) | 2009-12-15 | — | — | US | disclosed |
| CN-101061062-A | Method for producing metal oxide film | DAINIPPON PRINTING CO LTD (JP) | 2007-10-24 | — | — | CN | disclosed |
| CN-101056716-A | Method for producing metal oxide film | DAINIPPON PRINTING CO LTD (JP) | 2007-10-17 | — | — | CN | disclosed |
| US-20060219294-A1 | Oxide semiconductor electrode, dye-sensitized solar cell, and, method of producing the same | DAI NIPPON PRINTING CO., LTD. | 2006-10-05 | — | — | US | disclosed |
| CN-1841786-A | Oxide semiconductor electrode, dye-sensitized solar cell, and method for producing same | DAINIPPON PRINTING CO LTD (JP) | 2006-10-04 | — | — | CN | disclosed |
| US-20050214451-A1 | Method for manufacturing photoconductive layers that constitute radiation imaging panels | FUJI PHOTO FILM CO., LTD. | 2005-09-29 | — | — | US | disclosed |
| US-20050183769-A1 | Method of producing substrate for dye-sensitized solar cell and dye-sensitized solar cell | DAI NIPPON PRINTING CO., LTD. (JP) | 2005-08-25 | — | — | US | disclosed |