SCHEMBL4354550

SCHEMBL4354550

O=C(c1ccc(CS)cc1)C(F)(F)F

nearest known ligand 0.54

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CES1 P23141 1/20 0.54
MLYCD O95822 16/20 0.50
IDO1 P14902 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7051793 0.81 CES1 (0.56) CES1MLYCD
SCHEMBL7051795 0.81 CES1 (0.56) CES1MLYCD
SCHEMBL16880390 0.79 CES1 (0.54) CES1MLYCD
SCHEMBL5865895 0.79 MLYCD (0.59) CES1MLYCD
SCHEMBL7052967 0.79 CES1 (0.54) CES1MLYCD
SCHEMBL7052964 0.79 CES1 (0.54) CES1MLYCD
SCHEMBL7495525 0.78 IDO1 (0.41) CES1IDO1
SCHEMBL9970795 0.78 IDO1 (0.41) MLYCDIDO1
SCHEMBL9560910 0.76 MLYCD (0.57) CES1MLYCD
SCHEMBL22227458 0.76 CES1 (0.67) CES1MLYCD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2081084-B1 Positive resist compositions and patterning process SHINETSU CHEMICAL CO (JP) 2014-12-24 EP disclosed
EP-2081084-A1 Positive resist compositions and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2009-07-22 EP disclosed