SCHEMBL4356078

SCHEMBL4356078

NCC(N)CP(=O)(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7263539 0.85 GABBR2 (0.50)
SCHEMBL3420157 0.78
SCHEMBL745688 0.76
SCHEMBL17035512 0.74 ENPEP (0.64)
SCHEMBL5355272 0.73
SCHEMBL3420169 0.72
SCHEMBL6889994 0.72 GABBR2 (0.56)
SCHEMBL31406285 0.72
SCHEMBL28773434 0.72
SCHEMBL28773437 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9018278-B2 Surface treated calcium carbonate filler for resin and resin composition containing the filler MARUO CALCIUM CO., LTD. (JP) 2015-04-28 US claimed
US-20090107851-A1 Electrolytic polishing method of substrate EBARA CORPORATION (JP) 2009-04-30 US claimed
EP-0258616-A1 NMR Imaging with paramagnetic polyvalent metal salts of poly-(acid-alkylene-amino)-alkanes SALUTAR, INC. (US) 1988-03-09 EP claimed
CN-118252144-A Liquid disinfectant composition 狮王株式会社 2024-06-28 CN disclosed
US-9018278-B2 Surface treated calcium carbonate filler for resin and resin composition containing the filler MARUO CALCIUM CO., LTD. (JP) 2015-04-28 US disclosed
US-8536362-B2 β-hydroxy-γ-aminophosphonates and methods for the preparation and use thereof NUCITEC S.A. DE C.V. (MX) 2013-09-17 US disclosed
US-20130079308-A1 Beta-Hydroxy-Gamma-Aminophosphonates and Methods for the Preparation and Use Thereof NUCITEC S.A. DE C.V. (MX) 2013-03-28 US disclosed
US-20120283368-A1 SURFACE TREATED CALCIUM CARBONATE FILLER FOR RESIN AND RESIN COMPOSITION CONTAINING THE FILLER MARUO CALCIUM CO., LTD. (JP) 2012-11-08 US disclosed
US-20090107851-A1 Electrolytic polishing method of substrate EBARA CORPORATION (JP) 2009-04-30 US disclosed
US-20080200033-A1 POLISHING COMPOUND, METHOD FOR POLISHING SURFACE TO BE POLISHED, AND PROCESS FOR PRODUCING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE ASAHI GLASS COMPANY LIMITED (JP) 2008-08-21 US disclosed
EP-1930938-A1 POLISHING AGENT, METHOD FOR POLISHING SURFACE TO BE POLISHED, AND METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE Asahi Glass Company, Limited (JP) 2008-06-11 EP disclosed