SCHEMBL435648

SCHEMBL435648

C=CCOC(C)[Si](OC)(OC)OC

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL436624 0.82 MEN1 (0.33) MEN1KMT2A
SCHEMBL436481 0.78 MEN1 (0.31) MEN1KMT2A
SCHEMBL17476616 0.74 MEN1 (0.34) MEN1KMT2A
SCHEMBL15328993 0.71
SCHEMBL435795 0.70 MEN1 (0.31) MEN1KMT2A
SCHEMBL466023 0.69
SCHEMBL159503 0.69 LMNA (0.40) MEN1KMT2A
SCHEMBL1564026 0.69
SCHEMBL5688482 0.69
SCHEMBL910603 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8101703-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polyimide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD (TW) 2012-01-24 US claimed
US-20100297455-A1 PRECURSOR SOLUTION FOR POLYIMIDE/SILICA COMPOSITE MATERIAL, ITS MANUFACTURE METHOD, AND POLYIMIDE/SILICA COMPOSITE MATERIAL HAVING LOW VOLUME SHRINKAGE ETERNAL CHEMICAL CO., LTD. 2010-11-25 US claimed
US-7790828-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. (CN) 2010-09-07 US claimed
US-20050245715-A1 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. 2005-11-03 US claimed
EP-3176216-B1 HYDROPHILIC MATERIAL COMPRISING SULFONATE COPOLYMER AND AMINO RESIN MITSUI CHEMICALS INC (JP) 2019-04-24 EP disclosed
US-9976050-B2 Hydrophilic materials including sulfonate copolymer and amino resin MITSUI CHEMICALS, INC. (JP) 2018-05-22 US disclosed
US-20170210937-A1 HYDROPHILIC MATERIALS INCLUDING SULFONATE COPOLYMER AND AMINO RESIN MITSUI CHEMICALS, INC. (JP) 2017-07-27 US disclosed
EP-3176216-A1 HYDROPHILIC MATERIAL COMPRISING SULFONATE COPOLYMER AND AMINO RESIN Mitsui Chemicals, Inc. (JP) 2017-06-07 EP disclosed
US-20160046827-A1 FILM COMPRISING COPOLYMER OR COMPOSITION MITSUI CHEMICALS, INC. (JP) 2016-02-18 US disclosed
EP-2985301-A1 COPOLYMER AND HYDROPHILIC MATERIAL COMPRISING SAME Mitsui Chemicals, Inc. (JP) 2016-02-17 EP disclosed
EP-2985324-A1 FILM COMPRISING COPOLYMER OR COMPOSITION Mitsui Chemicals, Inc. (JP) 2016-02-17 EP disclosed
US-20160032036-A1 COPOLYMER AND HYDROPHILIC MATERIAL COMPOSED OF THE SAME MITSUI CHEMICALS, INC. (JP) 2016-02-04 US disclosed
US-8101703-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polyimide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD (TW) 2012-01-24 US disclosed
US-20100297455-A1 PRECURSOR SOLUTION FOR POLYIMIDE/SILICA COMPOSITE MATERIAL, ITS MANUFACTURE METHOD, AND POLYIMIDE/SILICA COMPOSITE MATERIAL HAVING LOW VOLUME SHRINKAGE ETERNAL CHEMICAL CO., LTD. 2010-11-25 US disclosed
US-7790828-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. (CN) 2010-09-07 US disclosed
US-20050245715-A1 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. 2005-11-03 US disclosed