Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR4A1 | P22736 | 1/20 | 0.61 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.54 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.54 |
| ▸ | MMP2 | P08253 | 1/20 | 0.50 |
| ▸ | MMP14 | P50281 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 4/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.48 |
| ▸ | GAA | P10253 | 3/20 | 0.48 |
| ▸ | MAPT | P10636 | 3/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.48 |
| ▸ | POLB | P06746 | 1/20 | 0.48 |
| ▸ | RAB9A | P51151 | 1/20 | 0.48 |
| ▸ | ESR1 | P03372 | 1/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.43 |
| ▸ | THRB | P10828 | 1/20 | 0.43 |
| ▸ | RECQL | P46063 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30040301 | 1.00 | NR4A1 (0.61) | NR4A1CYP3A4ALOX15HSD17B10MMP2 | |
| Hydrochloric Acid SCHEMBL10770715 | 0.98 | NR4A1 (0.58) | NR4A1CYP3A4ALOX15HSD17B10MMP2 | |
| SCHEMBL19809245 | 0.98 | NR4A1 (0.58) | NR4A1CYP3A4ALOX15HSD17B10MMP2 | |
| SCHEMBL716944 | 0.98 | NR4A1 (0.58) | NR4A1CYP3A4ALOX15HSD17B10MMP2 | |
| SCHEMBL27510157 | 0.95 | NR4A1 (0.56) | NR4A1CYP3A4ALOX15HSD17B10MMP2 | |
| SCHEMBL563890 | 0.93 | MEN1 (0.61) | NR4A1CYP3A4ALOX15HSD17B10MMP2 | |
| SCHEMBL4840838 | 0.93 | NR4A1 (0.54) | NR4A1CYP3A4ALOX15HSD17B10MMP2 | |
| SCHEMBL1553835 | 0.91 | MEN1 (0.57) | NR4A1CYP3A4ALOX15HSD17B10MMP2 | |
| SCHEMBL1348470 | 0.91 | CYP3A4 (0.58) | NR4A1CYP3A4ALOX15HSD17B10MMP2 | |
| SCHEMBL29718932 | 0.91 | MEN1 (0.57) | NR4A1CYP3A4ALOX15HSD17B10MMP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 659 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160009862-A1 | TRANSPARENT POLYMER FILM AND ELECTRONIC DEVICE INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-01-14 | — | — | US | claimed |
| EP-1609024-B1 | PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS (US) | 2015-09-30 | — | — | EP | claimed |
| EP-2011842-B1 | PHOTOSENSITIVE INK COMPOSITION FOR SCREEN PRINTING AND METHOD OF FORMING POSITIVE RELIEF PATTERN WITH USE THEREOF | PI R & D CO LTD (JP) | 2014-02-26 | — | — | EP | claimed |
| US-8349537-B2 | Photosensitive ink composition for screen printing and method of forming positive relief pattern with use thereof | PI R&D CO., LTD. (JP) | 2013-01-08 | — | — | US | claimed |
| EP-2063002-B1 | Method for depositing and patterning carbon nanotubes using chemical self-assembly process | SAMSUNG ELECTRONICS CO LTD (KR) | 2011-11-23 | — | — | EP | claimed |
| US-20110111351-A1 | Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof | WIN MAW SOE | 2011-05-12 | — | — | US | claimed |
| EP-1455007-B1 | Method for depositing and patterning carbon nanotubes using chemical self-assembly process | SAMSUNG ELECTRONICS CO LTD (KR) | 2010-06-02 | — | — | EP | claimed |
| US-20090186295-A1 | Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof | PI R&D CO., LTD. (JP) | 2009-07-23 | — | — | US | claimed |
| EP-2063002-A2 | Method for depositing and patterning carbon nanotubes using chemical self-assembly process | Samsung Electronics Co., Ltd. (KR) | 2009-05-27 | — | — | EP | claimed |
| EP-2011842-A1 | PHOTOSENSITIVE INK COMPOSITION FOR SCREEN PRINTING AND METHOD OF FORMING POSITIVE RELIEF PATTERN WITH USE THEREOF | PI R & D Co., Ltd. (JP) | 2009-01-07 | — | — | EP | claimed |
| US-4703103-A | POLYPHOSPHORIC ACID CATALYST | COMMTECH INTERNATIONAL (US) | 1987-10-27 | — | — | US | claimed |
| WO-1985004178-A1 | LIQUID CRYSTALLINE POLYMER COMPOSITIONS, PROCESS, AND PRODUCTS | SRI INTERNATIONAL (US) | 1985-09-26 | — | — | WO | claimed |
| US-4533693-A | ANISOTROPIC; FIBERS, FILMS | SRI INTERNATIONAL (US) | 1985-08-06 | — | — | US | claimed |
| EP-0119271-A4 | LIQUID CRYSTALLINE POLYMER COMPOSITIONS, PROCESS, AND PRODUCTS. | STANFORD RES INST INT (US) | 1985-07-01 | — | — | EP | claimed |
| EP-0119271-A1 | LIQUID CRYSTALLINE POLYMER COMPOSITIONS, PROCESS, AND PRODUCTS. | STANFORD RES INST INT (US) | 1984-09-26 | — | — | EP | claimed |
| EP-0119192-A1 | LIQUID CRYSTALLINE POLYMER COMPOSITIONS, PROCESS, AND PRODUCTS | SRI INTERNATIONAL (US) | 1984-09-26 | — | — | EP | claimed |
| WO-1984001160-A1 | LIQUID CRYSTALLINE POLYMER COMPOSITIONS, PROCESS, AND PRODUCTS | STANFORD RES INST INT (US) | 1984-03-29 | — | — | WO | claimed |
| WO-1984001162-A1 | LIQUID CRYSTALLINE POLYMER COMPOSITIONS, PROCESS, AND PRODUCTS | STANFORD RES INST INT (US) | 1984-03-29 | — | — | WO | claimed |
| EP-0023662-B1 | HEAT-RESISTENT POSITIVE PHOTORESISTS AND PROCESS FOR THE PREPARATION OF HEAT-RESISTENT RELIEF STRUCTURES | SIEMENS AKTIENGESELLSCHAFT (DE) | 1983-05-18 | — | — | EP | claimed |
| US-4339521-A | Heat resistant positive resists containing polyoxazoles | SIEMENS AKTIENGESELLSCHAFT (DE) | 1982-07-13 | — | — | US | claimed |