Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR4A1 | P22736 | 1/20 | 0.58 |
| ▸ | MMP2 | P08253 | 1/20 | 0.53 |
| ▸ | MMP14 | P50281 | 1/20 | 0.53 |
| ▸ | MEN1 | O00255 | 4/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.52 |
| ▸ | ESR1 | P03372 | 1/20 | 0.52 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.52 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.52 |
| ▸ | GAA | P10253 | 3/20 | 0.52 |
| ▸ | MAPT | P10636 | 3/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.52 |
| ▸ | POLB | P06746 | 1/20 | 0.52 |
| ▸ | RAB9A | P51151 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.46 |
| ▸ | MITF | O75030 | 1/20 | 0.46 |
| ▸ | GFER | P55789 | 1/20 | 0.46 |
| ▸ | NLRP1 | Q9C000 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19809245 | 1.00 | NR4A1 (0.58) | NR4A1MMP2MMP14MEN1KMT2A | |
| SCHEMBL30040301 | 0.98 | NR4A1 (0.61) | NR4A1MMP2MMP14MEN1KMT2A | |
| SCHEMBL436522 | 0.98 | NR4A1 (0.61) | NR4A1MMP2MMP14MEN1KMT2A | |
| SCHEMBL563890 | 0.96 | MEN1 (0.61) | NR4A1MMP2MMP14MEN1KMT2A | |
| Hydrochloric Acid SCHEMBL10770715 | 0.95 | NR4A1 (0.58) | NR4A1MMP2MMP14MEN1KMT2A | |
| SCHEMBL1348470 | 0.94 | CYP3A4 (0.58) | NR4A1MMP2MMP14MEN1KMT2A | |
| SCHEMBL564520 | 0.94 | ALDH1A1 (0.58) | NR4A1MMP2MMP14MEN1KMT2A | |
| SCHEMBL27510157 | 0.93 | NR4A1 (0.56) | NR4A1MMP2MMP14MEN1KMT2A | |
| SCHEMBL564952 | 0.92 | LTA4H (0.59) | NR4A1MMP2MMP14MEN1KMT2A | |
| SCHEMBL30233344 | 0.92 | LTA4H (0.59) | NR4A1MMP2MMP14MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9975996-B2 | Positive photosensitive resin composition and polyhydroxyamide resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-05-22 | — | — | US | claimed |
| US-20160185905-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND POLYHYDROXYAMIDE RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-06-30 | — | — | US | claimed |
| EP-2011842-B1 | PHOTOSENSITIVE INK COMPOSITION FOR SCREEN PRINTING AND METHOD OF FORMING POSITIVE RELIEF PATTERN WITH USE THEREOF | PI R & D CO LTD (JP) | 2014-02-26 | — | — | EP | claimed |
| US-8349537-B2 | Photosensitive ink composition for screen printing and method of forming positive relief pattern with use thereof | PI R&D CO., LTD. (JP) | 2013-01-08 | — | — | US | claimed |
| US-20110111351-A1 | Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof | WIN MAW SOE | 2011-05-12 | — | — | US | claimed |
| US-20090186295-A1 | Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof | PI R&D CO., LTD. (JP) | 2009-07-23 | — | — | US | claimed |
| EP-2011842-A1 | PHOTOSENSITIVE INK COMPOSITION FOR SCREEN PRINTING AND METHOD OF FORMING POSITIVE RELIEF PATTERN WITH USE THEREOF | PI R & D Co., Ltd. (JP) | 2009-01-07 | — | — | EP | claimed |
| EP-1262509-B1 | IMIDE-BENZOXAZOLE POLYCONDENSATE AND PROCESS FOR PRODUCING THE SAME | PI R & D CO LTD (JP) | 2007-01-10 | — | — | EP | claimed |
| US-6890626-B1 | Imide-benzoxazole polycondensate and process for producing the same | PI R&D CO., LTD. (JP) | 2005-05-10 | — | — | US | claimed |
| US-6875554-B2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-04-05 | — | — | US | claimed |
| CN-119585651-A | Composition for forming wavelength conversion film | 日产化学株式会社 | 2025-03-07 | — | — | CN | disclosed |
| WO-2025047700-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM AND USE THEREOF | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025047702-A1 | COMPOSITION FOR PATTERNING AND USE OF SAME | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2024214539-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM, AND COMPOUND | 日産化学株式会社 | 2024-10-17 | — | — | WO | disclosed |
| CN-118525024-A | Condensed ring thiophene compound and composition for forming wavelength conversion film containing same | 国立大学法人东海国立大学机构 | 2024-08-20 | — | — | CN | disclosed |
| EP-1329769-A1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2003-07-23 | — | — | EP | disclosed |
| EP-1241527-A1 | POSITIVE TYPE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2002-09-18 | — | — | EP | disclosed |
| EP-0424940-B1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL IND LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5288588-A | Containing diamine substituted with phenolic hydroxyl, carboxyl, thiophenol and/or sulfonic groups | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1994-02-22 | — | — | US | disclosed |
| EP-0424940-A2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1991-05-02 | — | — | EP | disclosed |