Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 4/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.57 |
| ▸ | MAPT | P10636 | 3/20 | 0.57 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.57 |
| ▸ | GAA | P10253 | 2/20 | 0.57 |
| ▸ | MITF | O75030 | 1/20 | 0.57 |
| ▸ | GFER | P55789 | 1/20 | 0.57 |
| ▸ | NLRP1 | Q9C000 | 1/20 | 0.57 |
| ▸ | NOD2 | Q9HC29 | 1/20 | 0.57 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.52 |
| ▸ | FURIN | P09958 | 2/20 | 0.48 |
| ▸ | F2 | P00734 | 1/20 | 0.48 |
| ▸ | F10 | P00742 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
| ▸ | MMP2 | P08253 | 1/20 | 0.46 |
| ▸ | MMP14 | P50281 | 1/20 | 0.46 |
| ▸ | MAOB | P27338 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29718932 | 1.00 | MEN1 (0.57) | MEN1KMT2AALDH1A1MAPTSMN1; SMN2 | |
| SCHEMBL564947 | 0.92 | ALDH1A1 (0.48) | MEN1KMT2AALDH1A1MAPTSMN1; SMN2 | |
| SCHEMBL27510157 | 0.91 | NR4A1 (0.56) | MEN1KMT2AALDH1A1MAPTSMN1; SMN2 | |
| SCHEMBL436522 | 0.91 | NR4A1 (0.61) | MEN1KMT2AALDH1A1MAPTSMN1; SMN2 | |
| SCHEMBL30040301 | 0.91 | NR4A1 (0.61) | MEN1KMT2AALDH1A1MAPTSMN1; SMN2 | |
| SCHEMBL564995 | 0.90 | MAOB (0.60) | MEN1KMT2AALDH1A1MAPTSMN1; SMN2 | |
| SCHEMBL564952 | 0.90 | LTA4H (0.59) | MEN1KMT2AALDH1A1MAPTSMN1; SMN2 | |
| SCHEMBL30233344 | 0.90 | LTA4H (0.59) | MEN1KMT2AALDH1A1MAPTSMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL10770715 | 0.89 | NR4A1 (0.58) | MEN1KMT2AALDH1A1MAPTSMN1; SMN2 | |
| SCHEMBL19809245 | 0.89 | NR4A1 (0.58) | MEN1KMT2AALDH1A1MAPTSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 107 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023202454-A1 | POLYMER FOR BLACK MATRIX, AND PREPARATION METHOD THEREFOR AND USE THEREOF | 上海交通大学 | 2023-10-26 | — | — | WO | claimed |
| US-9975996-B2 | Positive photosensitive resin composition and polyhydroxyamide resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-05-22 | — | — | US | claimed |
| US-20160185905-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND POLYHYDROXYAMIDE RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-06-30 | — | — | US | claimed |
| US-6875554-B2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-04-05 | — | — | US | claimed |
| EP-4660705-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING SAME, CURED ARTICLE AND ELECTRONIC COMPONENT | Toray Industries, Inc. (JP) | 2025-12-10 | — | — | EP | disclosed |
| EP-4641693-A1 | POLYIMIDE COMPOUND, NEGATIVE ELECTRODE MATERIAL FOR LITHIUM ION SECONDARY BATTERIES THAT USES SAID POLYIMIDE COMPOUND, NEGATIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERIES, AND LITHIUM ION SECONDARY BATTERY | Wingo Technology Co., Ltd. (JP) | 2025-10-29 | — | — | EP | disclosed |
| US-12269949-B2 | Polyimide compound and molded article comprising the polyimide compound | WINGO TECHNOLOGY CO., LTD. (JP) | 2025-04-08 | — | — | US | disclosed |
| WO-2025063041-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT USING SAME | 東レ株式会社 | 2025-03-27 | — | — | WO | disclosed |
| CN-119585651-A | Composition for forming wavelength conversion film | 日产化学株式会社 | 2025-03-07 | — | — | CN | disclosed |
| WO-2025047702-A1 | COMPOSITION FOR PATTERNING AND USE OF SAME | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025047700-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM AND USE THEREOF | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| US-20250019242-A1 | DISPERSION OF CARBON NANOTUBES, COATING LIQUID COMPOSITION FOR ELECTRODE USING SAME, ELECTRODE, AND LITHIUM ION SECONDARY BATTERY | DKS CO. LTD. (JP) | 2025-01-16 | — | — | US | disclosed |
| US-20040197699-A1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-10-07 | — | — | US | disclosed |
| EP-1431822-A1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2004-06-23 | — | — | EP | disclosed |
| US-20040048188-A1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-03-11 | — | — | US | disclosed |
| US-6677099-B1 | POLYAMIDEIMIDE DEVELOPED BY AN AQUEOUS ALKALINE SOLUTION AND WHICH IS EXCELLENT IN THE DEVELOPABILITY AND THE ADHESION TO A SUBSTRATE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-01-13 | — | — | US | disclosed |
| EP-1329769-A1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2003-07-23 | — | — | EP | disclosed |
| EP-1241527-A1 | POSITIVE TYPE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2002-09-18 | — | — | EP | disclosed |
| EP-0424940-B1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL IND LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| EP-0424940-A2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1991-05-02 | — | — | EP | disclosed |