Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EEF2K | O00418 | 3/20 | 0.97 |
| ▸ | EEF2 | P13639 | 2/20 | 0.97 |
| ▸ | MEN1 | O00255 | 2/20 | 0.97 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.97 |
| ▸ | PLK4 | O00444 | 1/20 | 0.97 |
| ▸ | JAK2 | O60674 | 1/20 | 0.97 |
| ▸ | EGFR | P00533 | 1/20 | 0.97 |
| ▸ | TYK2 | P29597 | 1/20 | 0.97 |
| ▸ | FLT3 | P36888 | 1/20 | 0.97 |
| ▸ | BLM | P54132 | 1/20 | 0.97 |
| ▸ | ITK | Q08881 | 1/20 | 0.97 |
| ▸ | PIM2 | Q9P1W9 | 1/20 | 0.97 |
| ▸ | CA1 | P00915 | 10/20 | 0.71 |
| ▸ | CA2 | P00918 | 10/20 | 0.71 |
| ▸ | APAF1 | O14727 | 1/20 | 0.44 |
| ▸ | TLR8 | Q9NR97 | 2/20 | 0.39 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.38 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL4365302 | 1.00 | EEF2K (0.97) | EEF2KEEF2MEN1KMT2APLK4 | |
| Hydrochloric Acid SCHEMBL4362495 | 1.00 | EEF2K (0.97) | EEF2KEEF2MEN1KMT2APLK4 | |
| Hydrochloric Acid SCHEMBL232267 | 1.00 | EEF2K (0.97) | EEF2KEEF2MEN1KMT2APLK4 | |
| SCHEMBL5302237 | 0.99 | EEF2K (1.00) | EEF2KEEF2MEN1KMT2APLK4 | |
| SCHEMBL5294286 | 0.99 | EEF2K (1.00) | EEF2KEEF2MEN1KMT2APLK4 | |
| SCHEMBL5329417 | 0.99 | EEF2K (1.00) | EEF2KEEF2MEN1KMT2APLK4 | |
| SCHEMBL5291762 | 0.99 | EEF2K (1.00) | EEF2KEEF2MEN1KMT2APLK4 | |
| SCHEMBL5813624 | 0.99 | EEF2K (1.00) | EEF2KEEF2MEN1KMT2APLK4 | |
| SCHEMBL5303928 | 0.99 | EEF2K (1.00) | EEF2KEEF2MEN1KMT2APLK4 | |
| SCHEMBL1895651 | 0.99 | EEF2K (1.00) | EEF2KEEF2MEN1KMT2APLK4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2894207-B1 | ANTISTATIC RELEASE AGENT AND ANTISTATIC RELEASE FILM | SHINETSU POLYMER CO (JP) | 2022-03-23 | — | — | EP | disclosed |
| US-20170275202-A1 | COMPOSITIONS COMPRISING CURABLE RESIN FOR ANTI-STATIC FLOORING | ASHLAND LICENSING AND INTELLECTUAL PROPERTY LLC (US) | 2017-09-28 | — | — | US | disclosed |
| EP-2949706-B1 | COMPOSITION FOR ANTISTATIC PEELING AGENT, AND ANTISTATIC PEELABLE FILM | SHINETSU POLYMER CO (JP) | 2017-09-06 | — | — | EP | disclosed |
| EP-3191426-A1 | COMPOSITIONS COMPRISING CURABLE RESIN FOR ANTI-STATIC FLOORING | Ashland Licensing And Intellectual Property, LLC (US) | 2017-07-19 | — | — | EP | disclosed |
| US-9657181-B2 | Composition for antistatic release agent and antistatic release film | SHIN-ETSU POLYMER CO., LTD. (JP) | 2017-05-23 | — | — | US | disclosed |
| US-9624398-B2 | Antistatic release agent and antistatic release film | SHIN-ETSU POLYMER CO., LTD. (JP) | 2017-04-18 | — | — | US | disclosed |
| EP-2949706-A1 | COMPOSITION FOR ANTISTATIC PEELING AGENT, AND ANTISTATIC PEELABLE FILM | Shin-Etsu Polymer Co. Ltd. (JP) | 2015-12-02 | — | — | EP | disclosed |
| US-20150322273-A1 | COMPOSITION FOR ANTISTATIC RELEASE AGENT AND ANTISTATIC RELEASE FILM | SHIN-ETSU POLYMER CO., LTD. (JP) | 2015-11-12 | — | — | US | disclosed |
| EP-1857504-B1 | ELECTROCONDUCTIVE-POLYMER SOLUTION, ANTISTATIC COATING MATERIAL, ANTISTATIC HARD COATING LAYER, OPTICAL FILTER, ELECTROCONDUCTIVE COATING FILM, ANTISTATIC PRESSURE-SENSITIVE ADHESIVE, ANTISTATIC PRESSURE-SENSITIVE ADHESIVE LAYER, PROTECTIVE MATERIAL, AND PROCESS FOR PRODUCING THE SAME | SHINETSU POLYMER CO (JP) | 2015-10-28 | — | — | EP | disclosed |
| US-20150218410-A1 | ANTISTATIC RELEASE AGENT AND ANTISTATIC RELEASE FILM | SHIN-ETSU POLYMER CO., LTD. (JP) | 2015-08-06 | — | — | US | disclosed |
| CN-101921478-B | Method for producing conductive polymer solution | SHINETSU POLYMER CO | 2012-05-30 | — | — | CN | disclosed |
| CN-101137718-B | Method for producing conductive polymer solution | SHINETSU POLYMER CO | 2011-09-28 | — | — | CN | disclosed |
| CN-101921478-A | The manufacture method of conductive-polymer solution | SHINETSU POLYMER CO | 2010-12-22 | — | — | CN | disclosed |
| US-20090294735-A1 | CONDUCTIVE POLYMER SOLUTION, ANTISTATIC COATING MATERIAL, ANTISTATIC HARD COAT LAYER, OPTICAL FILTER, CONDUCTIVE COATING FILM, ANTISTATIC TACKY ADHESIVE LAYER, PROTECTIVE MATERIAL, AND METHOD FOR PRODUCING THE SAME | SHIN-ETSU POLYMER CO., LTD. (JP) | 2009-12-03 | — | — | US | disclosed |
| US-7618559-B2 | Conductive polymer solution, antistatic coating material, antistatic hard coat layer, optical filter, conductive coating film, antistatic tacky adhesive, antistatic tacky adhesive layer, protective material, and method for producing the same | SHIN-ETSU POLYMER CO., LTD. (JP) | 2009-11-17 | — | — | US | disclosed |
| US-7601772-B2 | Nano-composite and method thereof | BRIDGESTONE CORPORATION | 2009-10-13 | — | — | US | disclosed |
| CN-101137718-A | Conductive polymer solution, antistatic coating material, antistatic hard coat layer, optical filter, conductive coating film, antistatic adhesive layer, protective material, and method for producing same | SHINETSU POLYMER CO (JP) | 2008-03-05 | — | — | CN | disclosed |
| EP-1857504-A1 | CONDUCTIVE-POLYMER SOLUTION, ANTISTATIC COATING MATERIAL, ANTISTATIC HARD COATING LAYER, OPTICAL FILTER, CONDUCTIVE COATING FILM, ANTISTATIC PRESSURE-SENSITIVE ADHESIVE, ANTISTATIC PRESSURE-SENSITIVE ADHESIVE LAYER, PROTECTIVE MATERIAL, AND PROCESS FOR PRODUCING THE SAME | Shin-Etsu Polymer Co. Ltd. (JP) | 2007-11-21 | — | — | EP | disclosed |
| US-20070161734-A1 | Comprising clay and cationic mediator such as imidazolium compound wherein cationic mediator comprises hydrophobic unit and cationic unit; use in preparing products such as tires with improved and well-balanced properties including gas impermeability, cure rates, and superior mechanical characteristics | BRIDGESTONE CORPORATION (JP) | 2007-07-12 | — | — | US | disclosed |
| US-20060202171-A1 | Conductive polymer solution, antistatic coating material, antistatic hard coat layer, optical filter, conductive coating film, antistatic tacky adhesive, antistatic tacky adhesive layer, protective material, and method for producing the same | SHIN-ETSU POLYMER CO., LTD. (JP) | 2006-09-14 | — | — | US | disclosed |