SCHEMBL436804

SCHEMBL436804

Nc1ccc(Oc2ccc(N)cc2C(F)(F)F)c(C(F)(F)F)c1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.59
TSHR P16473 2/20 0.59
GLA P06280 1/20 0.59
POLB P06746 1/20 0.59
KIF11 P52732 3/20 0.41
KDM4E B2RXH2 3/20 0.40
AR P10275 2/20 0.40
ALDH1A1 P00352 2/20 0.40
ATM Q13315 2/20 0.40
MEN1 O00255 1/20 0.40
SRC P12931 1/20 0.40
HPGD P15428 1/20 0.40
CASP1 P29466 1/20 0.40
CASP7 P55210 1/20 0.40
KMT2A Q03164 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
HSD17B10 Q99714 1/20 0.40
TLR9 Q9NR96 1/20 0.40
NR1H2 P55055 1/20 0.39
MAPK1 P28482 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29404322 1.00 GAA (0.59) GAATSHRGLAPOLBKIF11
Hydrochloric Acid SCHEMBL8863493 0.98 GAA (0.57) GAATSHRGLAPOLBKIF11
SCHEMBL649658 0.92 TSHR (0.52) GAATSHRGLAPOLBKIF11
SCHEMBL29618172 0.92 TSHR (0.52) GAATSHRGLAPOLBKIF11
SCHEMBL8766226 0.92 TSHR (0.52) GAATSHRGLAPOLBKIF11
SCHEMBL30223697 0.91 GAA (0.50) GAATSHRGLAPOLBKIF11
SCHEMBL8139607 0.91 GAA (0.50) GAATSHRGLAPOLBAR
SCHEMBL649657 0.90 TSHR (0.53) GAATSHRGLAPOLBKIF11
SCHEMBL22175023 0.90 GAA (0.53) GAATSHRGLAPOLBKIF11
SCHEMBL29500406 0.90 GAA (0.53) GAATSHRGLAPOLBKIF11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 517 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4257623-B1 PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE MITSUBISHI GAS CHEMICAL CO (JP) 2026-05-27 EP claimed
WO-2024114613-A1 ALLOY NEGATIVE ELECTRODE MATERIAL AND PREPARATION METHOD THEREFOR, NEGATIVE ELECTRODE MATERIAL SYSTEM, NEGATIVE ELECTRODE SHEET AND LITHIUM-ION BATTERY 华为技术有限公司 2024-06-06 WO claimed
US-20240085789-A1 PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-03-14 US claimed
US-20240026155-A1 Polyamideimide Film and Optical Multilayer Structure Comprising the Same SK INNOVATION CO., LTD. (KR) 2024-01-25 US claimed
US-20240027653-A1 Optical Multilayer Structure and Method for Manufacturing the Same SK INNOVATION CO., LTD. (KR) 2024-01-25 US claimed
US-20240019607-A1 Optical Multilayer Structure and Method of Manufacturing the Same SK INNOVATION CO., LTD. (KR) 2024-01-18 US claimed
US-20230407089-A1 PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-12-21 US claimed
US-20230374344-A1 Polyimide Precursor Composition and Optical Multilayer Structure Formed Using the Same SK INNOVATION CO., LTD. (KR) 2023-11-23 US claimed
EP-4257622-A1 PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-10-11 EP claimed
EP-4257623-A1 PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-10-11 EP claimed
US-20120244330-A1 AROMATIC POLYAMIDE FILMS FOR TRANSPARENT FLEXIBLE SUBSTRATES AKRON POLYMER SYSTEMS, INC. 2012-09-27 US claimed
WO-2012129422-A2 AROMATIC POLYAMIDE FILMS FOR TRANSPARENT FLEXIBLE SUBSTRATES AKRON POLYMER SYSTEMS, INC. (US) 2012-09-27 WO claimed
US-20110232484-A1 ASYMMETRIC GAS SEPARATION MEMBRANE AND PROCESS FOR GAS SEPARATION UBE INDUSTRIES, LTD. (JP) 2011-09-29 US claimed
EP-2335815-A1 ASYMMETRIC GAS SEPARATION MEMBRANE, AND GAS SEPARATION METHOD Ube Industries, Ltd. (JP) 2011-06-22 EP claimed
WO-2008004117-A1 SELECTIVE AZOLE PDE10A INHIBITOR COMPOUNDS PFIZER PRODUCTS INC. (US) 2008-01-10 WO claimed
EP-1431984-A1 Polymer resistor composition having a substantially neutral temperature coefficient of resistance and methods and compositions relating thereto E. I. du Pont de Nemours and Company (US) 2004-06-23 EP claimed
US-20040113127-A1 Resistor compositions having a substantially neutral temperature coefficient of resistance and methods and compositions relating thereto E.I. DU PONT DE NEMOURS AND COMPANY 2004-06-17 US claimed
EP-0675915-B1 PHOTODEFINABLE OPTICAL WAVEGUIDES AMOCO CORP (US) 1998-02-25 EP claimed
US-5475149-A Method for ether formation OCCIDENTAL CHEMICAL CORPORATION (US) 1995-12-12 US claimed
WO-1995004305-A1 PHOTOSENSITIVE FLUORINATED POLY(AMIC ACID) AMINOACRYLATE SALT E.I. DU PONT DE NEMOURS AND COMPANY (US) 1995-02-09 WO claimed