Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.67 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 3/20 | 0.39 |
| ▸ | THPO | P40225 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | GLO1 | Q04760 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | MGAM | O43451 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | SI | P14410 | 1/20 | 0.32 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.32 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetone SCHEMBL590699 | 0.92 | LMNA (0.71) | LMNAALDH1A1HSD17B10TSHRTHRB | |
| Pyruvate SCHEMBL1893245 | 0.90 | LMNA (0.60) | LMNAALDH1A1HSD17B10TSHRTHRB | |
| Acetic Acid SCHEMBL222953 | 0.89 | LMNA (0.67) | LMNAALDH1A1HSD17B10TSHRTHRB | |
| Acetic Acid SCHEMBL23907968 | 0.89 | LMNA (0.67) | LMNAALDH1A1HSD17B10TSHRTHRB | |
| Acetic Acid SCHEMBL8529879 | 0.86 | LMNA (0.63) | LMNAALDH1A1HSD17B10TSHRTHRB | |
| Acetone SCHEMBL3833129 | 0.86 | LMNA (0.63) | LMNAALDH1A1HSD17B10TSHRTHRB | |
| Butanone SCHEMBL3163812 | 0.86 | LMNA (0.63) | LMNAALDH1A1HSD17B10TSHRTHRB | |
| Acetamide SCHEMBL6279784 | 0.86 | LMNA (0.63) | LMNAALDH1A1HSD17B10TSHRTHRB | |
| Acetone SCHEMBL1036956 | 0.86 | LMNA (0.63) | LMNAALDH1A1HSD17B10TSHRTHRB | |
| SCHEMBL9557330 | 0.86 | LMNA (0.63) | LMNAALDH1A1HSD17B10TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105859529-B | Method for producing asymmetric conjugated diyne compound and method for producing Z, Z-conjugated diene compound using the same | 信越化学工业株式会社 | 2020-10-16 | — | — | CN | disclosed |
| EP-3053906-B1 | METHOD FOR PRODUCING ASYMMETRIC CONJUGATED DIYNE COMPOUND AND METHOD FOR PRODUCING Z,Z-CONJUGATED DIENE COMPOUND USING THE SAME | SHINETSU CHEMICAL CO (JP) | 2017-12-27 | — | — | EP | disclosed |
| US-9845304-B2 | Method for producing asymmetric conjugated diyne compound and method for producing Z,Z-conjugated diene compound using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9475831-B2 | Formylpyrrole-based heterocycles for nucleic acid attachment to supports | ILLUMINA, INC. (US) | 2016-10-25 | — | — | US | disclosed |
| CN-103483236-B | Prepare method and the intermediate of 5-biphenyl-4-yl-2-methylpentanoic acid derivatives | 诺华股份有限公司 | 2016-09-28 | — | — | CN | disclosed |
| US-20160229829-A1 | Method for Producing Asymmetric Conjugated Diyne Compound and Method for Producing Z,Z-Conjugated Diene Compound Using the Same | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2016-08-11 | — | — | US | disclosed |
| EP-3053906-A1 | METHOD FOR PRODUCING ASYMMETRIC CONJUGATED DIYNE COMPOUND AND METHOD FOR PRODUCING Z,Z-CONJUGATED DIENE COMPOUND USING THE SAME | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-08-10 | — | — | EP | disclosed |
| US-20160137677-A1 | FORMYLPYRROLE-BASED HETEROCYCLES FOR NUCLEIC ACID ATTACHMENT TO SUPPORTS | ILLUMINA, INC. | 2016-05-19 | — | — | US | disclosed |
| US-9273074-B2 | Formylpyrrole-based heterocycles for nucleic acid attachment to supports | ILLUMINA, INC. (US) | 2016-03-01 | — | — | US | disclosed |
| US-20150031833-A1 | FORMYLPYRROLE-BASED HETEROCYCLES FOR NUCLEIC ACID ATTACHMENT TO SUPPORTS | ILLUMINA, INC. | 2015-01-29 | — | — | US | disclosed |
| US-20020098441-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-07-25 | — | — | US | disclosed |
| US-6410748-B1 | Alicycli c group-containing monomer | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6303266-B1 | FOR PATTERN HAVING TRANSPARENCY AGAINST SHORT-WAVELENGTH LIGHT AND DRY-ETCHING RESISTANCE CAN BE FORMED BY ALKALI DEVELOPMENT WITH HIGH RESOLUTION | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-10-16 | — | — | US | disclosed |
| US-6291129-B1 | LIGHT SENSITIVE ELEMENT WITH UNSATURATED POLYMERS | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-09-18 | — | — | US | disclosed |
| US-6071670-A | PHOTORESIST RESIN COMPRISING PHOTOACID GENERATING COMPOUND AND AN ACID HYDROLYZABLE OLIGOMER HAVING ALICYCLIC OR POLYCONDENSED AROMATIC BACKBONE; ALKALI DEVELOPMENT WITH HIGH RESOLUTION, DRY ETCH RESISTANCE | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-06-06 | — | — | US | disclosed |
| EP-0685444-B1 | Aromatic compounds and their use in perfumery | FIRMENICH & CIE (CH) | 2000-04-05 | — | — | EP | disclosed |
| US-5932391-A | CONTAINING AN ACYCLIC COMPOUND WHICH IS A VINYL POLYMERBEING LIGHT ABSORBENT | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-08-03 | — | — | US | disclosed |
| US-5863699-A | FORMS A PATTERN THROUGH LIGHT-EXPOSURE WITH EITHER ARGON FLUORIDE OR FLUORINE EXCIMER LASERS, COMPRISES A COMPOUND HAVING EITHER AN ACID-DECOMPOSABLE OR ACID-CROSSLINKABLE GROUP | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-01-26 | — | — | US | disclosed |
| EP-0685444-A1 | Aromatic compounds and their use in perfumery | FIRMENICH SA (CH) | 1995-12-06 | — | — | EP | disclosed |
| EP-0414903-A1 | NEW THIOPROLINE DERIVATIVE | KABUSHIKI KAISHA YAKULT HONSHA (JP) | 1991-03-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150031833-A1 | FORMYLPYRROLE-BASED HETEROCYCLES FOR NUCLEIC ACID ATTACHMENT TO SUPPORTS | CCNY, FBL, NSUN2 | LMNA 316/4885ALDH1A1 1434/4885HSD17B10 1707/4885 |
| US-20160137677-A1 | FORMYLPYRROLE-BASED HETEROCYCLES FOR NUCLEIC ACID ATTACHMENT TO SUPPORTS | CCNY, FBL, NSUN2 | LMNA 316/4885ALDH1A1 1434/4885HSD17B10 1707/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.