Methacrylic Acid

Methacrylic Acid

SCHEMBL4370099

C=C(C)C(=O)O.C=C(C)C(=O)OCC(O)COc1ccc(C(C)(C)c2ccc(OCC(COC(=O)C(=C)C)OC(=O)C(=C)C)cc2)cc1.CCOC(N)=O

nearest known ligand 0.69

Full drug profile on Sugi Atlas →

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
AR P10275 2/20 0.47
CYP1A2 P05177 2/20 0.42
HTT P42858 3/20 0.39
HIF1A Q16665 1/20 0.39
KMT2A Q03164 5/20 0.38
KDM4E B2RXH2 4/20 0.38
MEN1 O00255 4/20 0.38
ALDH1A1 P00352 3/20 0.38
SMN1; SMN2 Q16637 3/20 0.36
USP2 O75604 1/20 0.36
MAPT P10636 2/20 0.36
NPSR1 Q6W5P4 2/20 0.36
LMNA P02545 2/20 0.36
POLB P06746 1/20 0.36
RECQL P46063 1/20 0.35
MITF O75030 1/20 0.35
MAPK1 P28482 1/20 0.35
GAA P10253 1/20 0.34
PPARD Q03181 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL4370104 0.94 CYP1A2 (0.46) ARCYP1A2HTTHIF1AKMT2A
SCHEMBL13588355 0.89 AR (0.57) ARCYP1A2HTTHIF1AKMT2A
SCHEMBL13588369 0.89 AR (0.57) ARCYP1A2HTTHIF1AKMT2A
SCHEMBL13588353 0.88 AR (0.55) ARCYP1A2HTTHIF1AKMT2A
SCHEMBL13588367 0.88 AR (0.58) ARCYP1A2HTTHIF1AKMT2A
SCHEMBL7732692 0.86 AR (0.54) ARCYP1A2HTTHIF1AKMT2A
Methacrylic Acid SCHEMBL14881206 0.86 HTT (0.50) ARCYP1A2HTTHIF1AKMT2A
SCHEMBL12265865 0.85 HTT (0.49) ARCYP1A2HTTHIF1AKMT2A
SCHEMBL13588357 0.84 AR (0.50) ARCYP1A2HTTHIF1AKMT2A
SCHEMBL1791934 0.84 AR (0.62) ARHTTHIF1AKMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090301346-A1 DENTAL RESIN-BASED CEMENT COMPOSITION KABUSHIKI KAISHA SHOFU (JP) 2009-12-10 US disclosed