SCHEMBL4371193

SCHEMBL4371193

C=CC(=O)N(CC(C)CC)CC(C)CC

nearest known ligand 0.38

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ZDHHC20 Q5W0Z9 2/20 0.38
ZDHHC2 Q9UIJ5 1/20 0.38
TSHR P16473 3/20 0.34
ALDH1A1 P00352 1/20 0.34
PSMB5 P28074 2/20 0.31
CA12 O43570 1/20 0.30
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
CA9 Q16790 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2728066 0.83 TSHR (0.34) ZDHHC20ZDHHC2TSHRALDH1A1
SCHEMBL372826 0.80 CA12 (0.48) ZDHHC20ZDHHC2TSHRALDH1A1CA12
SCHEMBL26637773 0.79 ZDHHC20 (0.38) ZDHHC20ZDHHC2TSHRALDH1A1PSMB5
SCHEMBL6130624 0.78 ZDHHC20 (0.36) ZDHHC20ZDHHC2TSHRALDH1A1CA12
SCHEMBL26496068 0.76 ZDHHC20 (0.40) ZDHHC20ZDHHC2TSHRALDH1A1CA12
SCHEMBL26497601 0.76 ZDHHC20 (0.40) ZDHHC20ZDHHC2TSHRALDH1A1CA12
SCHEMBL28095838 0.75 CA12 (0.43) ZDHHC20ZDHHC2TSHRALDH1A1PSMB5
SCHEMBL27856870 0.73 ZDHHC20 (0.37) ZDHHC20ZDHHC2TSHRALDH1A1PSMB5
SCHEMBL16285070 0.73 TSHR (0.35) ZDHHC20ZDHHC2TSHRALDH1A1
SCHEMBL4722760 0.73 MAPT (0.36) TSHRCA12CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090226831-A1 PHOTOCURABLE COATING COMPOSITION, AND OVERPRINT AND PROCESS FOR PRODUCING SAME FUJIFILM CORPORATION (JP) 2009-09-10 US disclosed
US-7569328-B2 Resin composition and thermo/photosensitive composition FUJIFILM CORPORATION (JP) 2009-08-04 US disclosed
US-7368544-B2 Polymerizable composition and planographic printing plate precursor using the same FUJIFILM CORPORATION (JP) 2008-05-06 US disclosed
US-20080044763-A1 Resin composition and thermo/photosensitive composition FUJIFILM CORPORATION 2008-02-21 US disclosed
US-7314698-B2 Polymerizable composition and planographic printing plate precursor using the same FUJIFILM CORPORATION (JP) 2008-01-01 US disclosed
US-7090957-B2 Polymerizable composition and planographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2006-08-15 US disclosed
US-20060135742-A1 Polymerizable composition and planographic printng plate precursor using the same FUJI PHOTO FILM CO., LTD. 2006-06-22 US disclosed
US-20060127809-A1 Polymerizable composition and planographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. 2006-06-15 US disclosed
US-20040234893-A9 Resin composition and thermo/photosensitive composition FUJI PHOTO FILM CO., LTD. 2004-11-25 US disclosed
US-20040131972-A1 Resin composition and thermo/photosensitive composition FUJI PHOTO FILM CO., LTD. 2004-07-08 US disclosed
US-20040062939-A1 Polymerizable composition and planogaphic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. 2004-04-01 US disclosed
EP-1400851-A2 Polymerizable composition and planographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2004-03-24 EP disclosed