SCHEMBL437239

SCHEMBL437239

FN(F)c1ccc(N(F)F)cc1

nearest known ligand 0.38

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.38
TSHR P16473 2/20 0.38
ALOX15 P16050 1/20 0.38
HSD17B10 Q99714 1/20 0.38
KDM4E B2RXH2 1/20 0.32
CYP1A2 P05177 1/20 0.32
CYP3A4 P08684 1/20 0.32
CYP2D6 P10635 1/20 0.32
MAPT P10636 1/20 0.32
CYP2C9 P11712 1/20 0.32
CYP2C19 P33261 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27756280 0.83 APP (0.41)
SCHEMBL1343120 0.83 CYP2A6 (0.50) ALDH1A1TSHRALOX15CYP1A2TDP1
Hydrochloric Acid SCHEMBL7881442 0.78 ALDH1A1 (0.43) ALDH1A1ALOX15KDM4ECYP1A2CYP3A4
SCHEMBL6041171 0.76 CA1 (0.58) ALDH1A1TSHRHSD17B10KDM4ECYP1A2
SCHEMBL28157271 0.76 ALDH1A1 (0.58) ALDH1A1TSHRALOX15HSD17B10KDM4E
SCHEMBL27840274 0.76 ALDH1A1 (0.58) ALDH1A1TSHRTDP1
Hydrochloric Acid SCHEMBL30814279 0.75 ALDH1A1 (0.42) ALDH1A1ALOX15KDM4ECYP1A2CYP3A4
SCHEMBL2865783 0.74 TSHR (0.60) ALDH1A1TSHRALOX15
SCHEMBL28612608 0.72 CA2 (0.59) ALDH1A1TSHRTDP1
SCHEMBL9141418 0.72 MAPT (0.31) MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 219 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117186403-B Negative photosensitive resin, resin composition, and preparation method and application thereof 明士(北京)新材料开发有限公司 2024-04-02 CN claimed
CN-117683231-A Polyimide resin solution, preparation method and application thereof in perovskite solar cell 中国科学院化学研究所 2024-03-12 CN claimed
CN-117186403-A Negative photosensitive resin, resin composition, and preparation method and application thereof 明士(北京)新材料开发有限公司 2023-12-08 CN claimed
CN-114591535-B Recovery method of nano-cluster crosslinked organic-inorganic hybrid crosslinked polymer 北京化工大学 2022-12-09 CN claimed
CN-114995060-A Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof 明士(北京)新材料开发有限公司 2022-09-02 CN claimed
US-20220177650-A1 POLYIMIDE FILM PREPARATION METHOD AND APPLICATION THEREOF INSTITUTE OF CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) 2022-06-09 US claimed
CN-114591535-A Recovery method of nano-cluster crosslinked organic-inorganic hybrid crosslinked polymer 北京化工大学 2022-06-07 CN claimed
CN-114516968-A Polyimide film and preparation method and application thereof 苏州聚萃材料科技有限公司 2022-05-20 CN claimed
CN-112409998-B Photo-thermal conversion eutectic material containing N, N, N, N-tetramethyl-p-phenylenediamine and preparation method thereof 汕头大学 2021-10-29 CN claimed
CN-112409998-A Photo-thermal conversion eutectic material containing N, N, N, N-tetramethyl-p-phenylenediamine and preparation method thereof 汕头大学 2021-02-26 CN claimed
CN-112175184-A Modified high-transparency polyimide flexible film and preparation method thereof 安徽省长荣新材料科技有限公司 2021-01-05 CN claimed
WO-2020200229-A1 POLYIMIDE THIN FILM AND PREPARATION METHOD AND APPLICATION THEREOF 中国科学院化学研究所 2020-10-08 WO claimed
CN-110092908-A A kind of Kapton and its preparation method and application 中国科学院化学研究所 2019-08-06 CN claimed
CN-110028670-A Low-dielectric loss negative light-sensitive poly amic acid ester resin, resin combination, preparation method and application 明士新材料有限公司 2019-07-19 CN claimed
CN-104744614-B A kind of preparation method of extracting vanadium from stone coal resin 浙江衢州万能达科技有限公司 2018-04-20 CN claimed
WO-2026103013-A1 ANTI-FINGERPRINT AGENT, AND PREPARATION METHOD THEREFOR AND USE THEREOF 湖南天氟新材料有限公司 2026-05-21 WO disclosed
US-20250273719-A1 ION-EXCHANGE MEMBRANE, MEMBRANE ELECTRODE ASSEMBLY, CELL FOR REDOX FLOW BATTERY, AND REDOX FLOW BATTERY ASAHI KASEI KABUSHIKI KAISHA (JP) 2025-08-28 US disclosed
EP-0387381-A1 Process for producing unsaturated dicarboxylic acid imide compound MATSUSHITA ELECTRIC WORKS, LTD. (JP) 1990-09-19 EP disclosed
EP-0382864-A1 Process for the production of high molecular weight polyamide-imide resin Hitachi Chemical Co., Ltd. (JP) 1990-08-22 EP disclosed
US-4046777-A INTERMEDIATES FOR HEAT-RESISTANT POLYMERS CIBA-GEIGY CORPORATION (US) 1977-09-06 US disclosed