SCHEMBL4373344

SCHEMBL4373344

CC(C)=COCCOCCOCCOCCOC=C(C)C

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4365823 1.00 MEN1 (0.33) MEN1KMT2A
SCHEMBL4366720 1.00 MEN1 (0.33) MEN1KMT2A
SCHEMBL4368259 0.91
SCHEMBL27641756 0.90 MEN1 (0.52) MEN1KMT2A
SCHEMBL4425894 0.87 ALDH1A1 (0.44)
SCHEMBL4430294 0.86 TSHR (0.48) MEN1KMT2A
SCHEMBL11062260 0.81 MEN1 (0.38) MEN1KMT2A
SCHEMBL28222688 0.81 MEN1 (0.41) MEN1KMT2A
SCHEMBL4430806 0.80
SCHEMBL4365140 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090035696-A1 PHOTORESIST COMPOSITION KYOWA HAKKO CHEMICAL CO., LTD. (JP) 2009-02-05 US disclosed