⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4365823 | 0.91 | MEN1 (0.33) | — | |
| SCHEMBL4366720 | 0.91 | MEN1 (0.33) | — | |
| SCHEMBL4373344 | 0.91 | MEN1 (0.33) | — | |
| SCHEMBL4430806 | 0.88 | — | — | |
| SCHEMBL4365827 | 0.87 | — | — | |
| SCHEMBL4365140 | 0.87 | — | — | |
| SCHEMBL4376188 | 0.84 | CES2 (0.30) | — | |
| SCHEMBL4371579 | 0.84 | CES2 (0.30) | — | |
| SCHEMBL2582288 | 0.84 | — | — | |
| SCHEMBL294858 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8822126-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate | FUJIFILM CORPORATION (JP) | 2014-09-02 | — | — | US | disclosed |
| US-8822126-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate | FUJIFILM CORPORATION (JP) | 2014-09-02 | — | — | US | disclosed |
| US-20090220752-A1 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate | FUJIFILM CORPORATION (JP) | 2009-09-03 | — | — | US | disclosed |
| US-20090220752-A1 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate | FUJIFILM CORPORATION (JP) | 2009-09-03 | — | — | US | disclosed |
| EP-2095947-A1 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate | FUJIFILM Corporation (JP) | 2009-09-02 | — | — | EP | disclosed |
| US-20090035696-A1 | PHOTORESIST COMPOSITION | KYOWA HAKKO CHEMICAL CO., LTD. (JP) | 2009-02-05 | — | — | US | disclosed |