SCHEMBL4376347

SCHEMBL4376347

CC(C)(c1ccc(OC2CCCO2)cc1)c1ccc(OC2CCCO2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 4/20 0.46
MEN1 O00255 4/20 0.46
KMT2A Q03164 4/20 0.46
TP53 P04637 2/20 0.46
MAPT P10636 2/20 0.46
TSHR P16473 2/20 0.46
ALDH1A1 P00352 2/20 0.46
CYP1A2 P05177 1/20 0.46
PPARG P37231 1/20 0.46
HIF1A Q16665 1/20 0.46
NPY1R P25929 1/20 0.41
NPY2R P49146 1/20 0.41
NPY4R P50391 1/20 0.41
NPY5R Q15761 1/20 0.41
KDM4E B2RXH2 1/20 0.39
PSMB1 P20618 1/20 0.36
PSMB5 P28074 1/20 0.36
PSMB2 P49721 1/20 0.36
TNK2 Q07912 2/20 0.35
PDE4B Q07343 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4382295 0.95 MEN1 (0.45) HPGDMEN1KMT2ATP53MAPT
SCHEMBL15049914 0.92 HPGD (0.47) HPGDMEN1KMT2ATP53MAPT
SCHEMBL10952240 0.91 ALDH1A1 (0.50) HPGDMEN1KMT2ATP53MAPT
SCHEMBL15869174 0.91 MEN1 (0.42) HPGDMEN1KMT2ATP53MAPT
SCHEMBL17694753 0.88 ESR1 (0.46) HPGDMEN1KMT2ATP53MAPT
SCHEMBL1457107 0.85 NPY1R (0.43) HPGDMEN1KMT2ATP53MAPT
SCHEMBL7231933 0.85 NPY1R (0.54) HPGDMEN1KMT2AMAPTALDH1A1
SCHEMBL19442900 0.85 TSHR (0.45) HPGDMEN1KMT2ATP53MAPT
SCHEMBL7188322 0.84 ALDH1A1 (0.38) HPGDMEN1KMT2ATP53MAPT
SCHEMBL16745539 0.84 HRH3 (0.45) MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090075482-A1 PROCESS FOR FORMING A PATTERN INCLUDING ON A SEMICONDUCTOR DEVICE NEC ELECTRONICS CORPORATION (JP) 2009-03-19 US disclosed
US-7479361-B2 Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process NEC ELECTRONICS CORPORATION (JP) 2009-01-20 US disclosed
US-20040259373-A1 Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process NEC ELECTRONICS CORPORATION (JP) 2004-12-23 US disclosed