Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 4/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.45 |
| ▸ | TP53 | P04637 | 2/20 | 0.45 |
| ▸ | MAPT | P10636 | 2/20 | 0.45 |
| ▸ | HPGD | P15428 | 2/20 | 0.45 |
| ▸ | TSHR | P16473 | 2/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.45 |
| ▸ | PPARG | P37231 | 1/20 | 0.45 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.45 |
| ▸ | NPY1R | P25929 | 1/20 | 0.43 |
| ▸ | NPY2R | P49146 | 1/20 | 0.43 |
| ▸ | NPY4R | P50391 | 1/20 | 0.43 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.43 |
| ▸ | TNK2 | Q07912 | 3/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.38 |
| ▸ | DHFR | P00374 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | PSMB1 | P20618 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15869174 | 0.95 | MEN1 (0.42) | MEN1KMT2ATP53MAPTHPGD | |
| SCHEMBL4376347 | 0.95 | HPGD (0.46) | MEN1KMT2ATP53MAPTHPGD | |
| SCHEMBL17694753 | 0.93 | ESR1 (0.46) | MEN1KMT2ATP53MAPTHPGD | |
| SCHEMBL7231933 | 0.90 | NPY1R (0.54) | MEN1KMT2AMAPTHPGDALDH1A1 | |
| SCHEMBL1457107 | 0.90 | NPY1R (0.43) | MEN1KMT2ATP53MAPTHPGD | |
| SCHEMBL10952240 | 0.90 | ALDH1A1 (0.50) | MEN1KMT2ATP53MAPTHPGD | |
| SCHEMBL15049914 | 0.88 | HPGD (0.47) | MEN1KMT2ATP53MAPTHPGD | |
| SCHEMBL3500438 | 0.88 | TNK2 (0.44) | MEN1KMT2AHPGDALDH1A1NPY1R | |
| SCHEMBL14646596 | 0.87 | NPY1R (0.44) | MEN1KMT2ATP53MAPTHPGD | |
| SCHEMBL5521417 | 0.87 | KCNH2 (0.44) | MEN1KMT2ATP53MAPTHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090075482-A1 | PROCESS FOR FORMING A PATTERN INCLUDING ON A SEMICONDUCTOR DEVICE | NEC ELECTRONICS CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| US-7479361-B2 | Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process | NEC ELECTRONICS CORPORATION (JP) | 2009-01-20 | — | — | US | disclosed |
| US-20040259373-A1 | Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process | NEC ELECTRONICS CORPORATION (JP) | 2004-12-23 | — | — | US | disclosed |
| US-6723483-B1 | Sulfonium salt compounds | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2004-04-20 | — | — | US | disclosed |
| US-6586152-B1 | Useful as an ingredient of a resist composition used for preparation of semiconductor devices and the like, which comprises a compound shown by the following general formula useful as an ingredient of a resist composition used for | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2003-07-01 | — | — | US | disclosed |
| EP-0595361-B1 | Method of forming micropatterns with heat resistance | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 1999-03-10 | — | — | EP | disclosed |
| US-5863701-A | POLYMERS FOR PHOTORESISTS USED FOR PRINTING PLATES AND CIRCUIT BOARDS | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-01-26 | — | — | US | disclosed |
| EP-0883163-A2 | Method of forming micropatterns | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD (JP) | 1998-12-09 | — | — | EP | disclosed |
| US-5780566-A | Polymers containing protected styrene and unprotected hydroxybenzyl (meth)acrylamides | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1998-07-14 | — | — | US | disclosed |
| US-5741628-A | CHEMICAL AMPLIFICATION WHICH GENERATES AN ACID IN RESPONSE TO LASER RADIATION | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1998-04-21 | — | — | US | disclosed |
| US-5700620-A | POSITIVE PHOTORESIST HAVING HIGH RESOLUTION AND SMALL FILM THICKNESS DEPENDENCE | FUJI PHOTO FILM CO., LTD. (JP) | 1997-12-23 | — | — | US | disclosed |
| US-5679500-A | FORMING RESIST FILM BY USING A CHEMICAL AMPLIFICATION RESIST WHICH GENERATES AN ACID IN RESPONSE TO LASER LIGHT AND WHICH REACTS WITH THE ACID | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |
| US-5658711-A | FORMING RESIST FILM CONTAINING BASE GENERATOR, GENERATING BASE BY RADIATION, FORMING METAL OXIDE FILM, ETCHING | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1997-08-19 | — | — | US | disclosed |
| US-5609982-A | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1997-03-11 | — | — | US | disclosed |
| EP-0709410-A2 | Polymers | OCG Microelectronic Materials, Inc. (US) | 1996-05-01 | — | — | EP | disclosed |
| EP-0691674-A2 | Method of forming micropatterns | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1996-01-10 | — | — | EP | disclosed |
| EP-0658807-A1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1995-06-21 | — | — | EP | disclosed |
| EP-0595361-A2 | Method of forming micropatterns | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1994-05-04 | — | — | EP | disclosed |