Benzophenone

Benzophenone

SCHEMBL4382632

O=C(c1ccccc1)c1ccccc1.P

nearest known ligand 0.93

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.93
SRD5A2 P31213 2/20 0.74
TDP1 Q9NUW8 2/20 0.74
L3MBTL1 Q9Y468 2/20 0.74
ATM Q13315 1/20 0.74
MEN1 O00255 3/20 0.67
KMT2A Q03164 3/20 0.67
CES2 O00748 2/20 0.61
CES1 P23141 2/20 0.61
TSHR P16473 2/20 0.61
DAO P14920 1/20 0.61
NAPRT Q6XQN6 1/20 0.61
RAB9A P51151 3/20 0.61
MAPT P10636 3/20 0.61
LMNA P02545 1/20 0.61
MAPK13 O15264 1/20 0.61
MAPK12 P53778 1/20 0.61
MAPK11 Q15759 1/20 0.61
MAPK14 Q16539 1/20 0.61
AKR1C3 P42330 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzophenone SCHEMBL1074283 0.97 ALDH1A1 (1.00) ALDH1A1SRD5A2TDP1L3MBTL1ATM
Benzophenone SCHEMBL6061130 0.97 ALDH1A1 (1.00) ALDH1A1SRD5A2TDP1L3MBTL1ATM
Benzophenone SCHEMBL30536983 0.97 ALDH1A1 (1.00) ALDH1A1SRD5A2TDP1L3MBTL1ATM
Benzophenone SCHEMBL30537001 0.97 ALDH1A1 (1.00) ALDH1A1SRD5A2TDP1L3MBTL1ATM
Benzophenone SCHEMBL28491203 0.97 ALDH1A1 (1.00) ALDH1A1SRD5A2TDP1L3MBTL1ATM
Benzophenone SCHEMBL17745 0.97 ALDH1A1 (1.00) ALDH1A1SRD5A2TDP1L3MBTL1ATM
Benzophenone SCHEMBL28180817 0.97 ALDH1A1 (1.00) ALDH1A1SRD5A2TDP1L3MBTL1ATM
Benzophenone SCHEMBL23175179 0.93 ALDH1A1 (0.93) ALDH1A1SRD5A2TDP1L3MBTL1ATM
Benzophenone SCHEMBL4820258 0.93 ALDH1A1 (0.93) ALDH1A1SRD5A2TDP1L3MBTL1ATM
Benzophenone SCHEMBL11125275 0.93 ALDH1A1 (0.93) ALDH1A1SRD5A2TDP1L3MBTL1ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101649165-B Ultraviolet curing pressure sensitive adhersive for polyethylene protective film and preparation method thereof GUANGDONG TAMAY NEW MATERIALS CO.,LTD. (CN) 2011-12-28 CN claimed
CN-101649171-B Solvent-free ultraviolet curing pressure sensitive adhersive for polyethylene protective film and preparation method thereof GUANGDONG TAMAY ADHESIVE PRODUCT CO LTD 2011-08-17 CN claimed
CN-101649171-A Solvent-free ultraviolet curing pressure sensitive adhersive for polyethylene protective film and preparation method thereof GUANGDONG TAMAY ADHESIVE PRODU 2010-02-17 CN claimed
CN-101649165-A Ultraviolet curing pressure sensitive adhersive for polyethylene protective film and preparation method thereof GUANGDONG TAMAY ADHESIVE PRODU 2010-02-17 CN claimed
CN-1250590-C Photopolymerization method of ternary polymerization water-soluble polymer inverse microemulsion taking acrylamide as main body RIKAGAKU KENKYUSHO (CN) 2006-04-12 CN claimed
CN-1618825-A Photopolymerization method of ternary polymerization water-soluble polymer inverse microemulsion taking acrylamide as main body RIKAGAKU KENKYUSHO (CN) 2005-05-25 CN claimed
CN-103809377-B It is used to prepare the Photocurable composition of the product of Similar to ABS 亨斯迈先进材料(瑞士)有限公司 2019-09-24 CN disclosed
US-7629400-B2 Image making medium HYMAN SYDNEY 2009-12-08 US disclosed
CN-1250590-C Photopolymerization method of ternary polymerization water-soluble polymer inverse microemulsion taking acrylamide as main body RIKAGAKU KENKYUSHO (CN) 2006-04-12 CN disclosed
CN-1618825-A Photopolymerization method of ternary polymerization water-soluble polymer inverse microemulsion taking acrylamide as main body RIKAGAKU KENKYUSHO (CN) 2005-05-25 CN disclosed
US-20030035917-A1 Image making medium HYMAN SYDNEY (US) 2003-02-20 US disclosed