⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1582755 | 0.72 | — | — | |
| SCHEMBL439367 | 0.69 | CES2 (0.37) | — | |
| SCHEMBL2903401 | 0.67 | — | — | |
| SCHEMBL8724679 | 0.67 | — | — | |
| SCHEMBL377148 | 0.65 | — | — | |
| SCHEMBL25238888 | 0.64 | — | — | |
| SCHEMBL14760146 | 0.62 | ALDH1A1 (0.41) | — | |
| SCHEMBL8143142 | 0.60 | FFAR3 (0.32) | — | |
| SCHEMBL217230 | 0.59 | — | — | |
| Propane SCHEMBL4641051 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1964860-B1 | ETHYLENE POLYMER, CATALYST FOR PRODUCTION OF ETHYLENE POLYMER, AND PROCESS FOR PRODUCTION OF ETHYLENE POLYMER | TOSOH CORP (JP) | 2017-07-05 | — | — | EP | disclosed |
| EP-1473323-B1 | Polyethylene composition and process for producing same | TOSOH CORP (JP) | 2016-04-27 | — | — | EP | disclosed |
| US-9200093-B2 | Polymerization method using surfactant-containing particle | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-12-01 | — | — | US | disclosed |
| US-8927671-B2 | Ethylene-α-olefin copolymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-01-06 | — | — | US | disclosed |
| US-8871885-B2 | Ethylene-a-olefin copolymer and molded article | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-10-28 | — | — | US | disclosed |
| US-20140288251-A1 | POLYMERIZATION METHOD USING SURFACTANT-CONTAINING PARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-09-25 | — | — | US | disclosed |
| US-8841396-B2 | Ethylene-α-olefin copolymer and molded article | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-09-23 | — | — | US | disclosed |
| US-8809462-B2 | Ethylene-α-olefin copolymer, molded article, catalyst for copolymerization, and method for producing an ethylene-α-olefin copolymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20130324691-A1 | Ethylene-a-Olefin Copolymer and Article | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-12-05 | — | — | US | disclosed |
| US-8501891-B2 | Ethylene-α-olefin copolymer and molded article | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-08-06 | — | — | US | disclosed |
| US-7678866-B2 | Polyethylene composition and process for producing same | TOSOH CORPORATION (JP) | 2010-03-16 | — | — | US | disclosed |
| WO-2009104782-A1 | ETHYLENE HOMOPOLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-27 | — | — | WO | disclosed |
| WO-2009104783-A1 | CATALYST COMPONENT FOR POLYMERIZATION OF ETHYLENE AND PROCESS FOR PRODUCING ETHYLENE POLYMER (2) | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-27 | — | — | WO | disclosed |
| WO-2009104785-A1 | CATALYST COMPONENT FOR POLYMERIZATION OF ETHYLENE AND PROCESS FOR PRODUCING ETHYLENE POLYMER (1) | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-27 | — | — | WO | disclosed |
| US-20090137755-A1 | ETHYLENE POLYMER, CATALYST FOR ETHYLENE POLYMER PRODUCTION, AND METHOD FOR PRODUCING ETHYLENE POLYMER | TOSOH CORPORATION (JP) | 2009-05-28 | — | — | US | disclosed |
| EP-1964860-A1 | ETHYLENE POLYMER, CATALYST FOR PRODUCTION OF ETHYLENE POLYMER, AND PROCESS FOR PRODUCTION OF ETHYLENE POLYMER | Tosoh Corporation (JP) | 2008-09-03 | — | — | EP | disclosed |
| US-6849382-B2 | Photosensitive polymer containing silicon and a resist composition using the same | SAMSUNG ELECTRONICS CO., LTD (KR) | 2005-02-01 | — | — | US | disclosed |
| EP-1473323-A1 | Polyethylene composition and process for producing same | Tosoh Corporation (JP) | 2004-11-03 | — | — | EP | disclosed |
| US-20040214953-A1 | Polyethylene composition and process for producing same | TOSOH CORPORATION | 2004-10-28 | — | — | US | disclosed |
| US-20040126699-A1 | Photosensitive polymer containing silicon and a resist composition using the same | SAMSUNG ELECTRONICS CO., INC. | 2004-07-01 | — | — | US | disclosed |