Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 10/20 | 0.75 |
| ▸ | KMT2A | Q03164 | 10/20 | 0.75 |
| ▸ | HPGD | P15428 | 7/20 | 0.75 |
| ▸ | MAPT | P10636 | 7/20 | 0.75 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.75 |
| ▸ | NTSR1 | P30989 | 1/20 | 0.75 |
| ▸ | ADORA2A | P29274 | 3/20 | 0.71 |
| ▸ | ADORA1 | P30542 | 3/20 | 0.71 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.65 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.65 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.63 |
| ▸ | LMNA | P02545 | 2/20 | 0.63 |
| ▸ | GLA | P06280 | 1/20 | 0.62 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.61 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.61 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.58 |
| ▸ | TSHR | P16473 | 1/20 | 0.58 |
| ▸ | ATM | Q13315 | 1/20 | 0.58 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.56 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.56 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17367827 | 0.97 | MEN1 (0.79) | MEN1KMT2AHPGDMAPTALDH1A1 | |
| SCHEMBL17367816 | 0.97 | MEN1 (0.79) | MEN1KMT2AHPGDMAPTALDH1A1 | |
| SCHEMBL13113782 | 0.97 | MEN1 (0.72) | MEN1KMT2AHPGDMAPTALDH1A1 | |
| SCHEMBL17970040 | 0.97 | MEN1 (0.79) | MEN1KMT2AHPGDMAPTALDH1A1 | |
| SCHEMBL9920584 | 0.95 | MEN1 (0.76) | MEN1KMT2AHPGDMAPTALDH1A1 | |
| SCHEMBL12306206 | 0.95 | MEN1 (0.76) | MEN1KMT2AHPGDMAPTALDH1A1 | |
| SCHEMBL10051312 | 0.95 | MEN1 (0.76) | MEN1KMT2AHPGDMAPTALDH1A1 | |
| SCHEMBL17725321 | 0.95 | MEN1 (0.76) | MEN1KMT2AHPGDMAPTALDH1A1 | |
| SCHEMBL13492075 | 0.95 | MEN1 (0.76) | MEN1KMT2AHPGDMAPTALDH1A1 | |
| SCHEMBL12306188 | 0.95 | MEN1 (0.76) | MEN1KMT2AHPGDMAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 252 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102888208-B | Abrasive and substrate polishing method | HITACHI CHEMICAL CO LTD | 2015-02-25 | — | — | CN | claimed |
| CN-102690607-B | Metal polishing slurry and application thereof | HITACHI CHEMICAL CO LTD | 2015-02-11 | — | — | CN | claimed |
| US-20260146199-A1 | METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-28 | — | — | US | disclosed |
| US-12630742-B2 | Polishing composition using polishing particles containing basic substance and having high water affinity | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-19 | — | — | US | disclosed |
| US-20260117105-A1 | POLISHING COMPOSITION HAVING EXCELLENT STORAGE STABILITY AND METHOD FOR PRODUCING SAME | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4698547-A1 | COMPOUND, METHOD FOR PREPARING THE COMPOUND, SEMICONDUCTING MATERIAL, ORGANIC ELECTRONIC DEVICE, AND DISPLAY DEVICE | Novaled GmbH (DE) | 2026-02-25 | — | — | EP | disclosed |
| US-20260042978-A1 | PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE | TOKYO OHKA KOGYO CO LTD (JP) | 2026-02-12 | — | — | US | disclosed |
| US-20260028553-A1 | PROCESSING SOLUTION, METHOD FOR MANUFACTURING PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-29 | — | — | US | disclosed |
| US-12516420-B2 | Chemical solution for removing precious metal, method for manufacturing chemical solution, method for treating substrate, method for manufacturing semiconductor device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-01-06 | — | — | US | disclosed |
| US-12480077-B2 | Aqueous cleaning liquid and method of cleaning electronic device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-11-25 | — | — | US | disclosed |
| US-20250270474-A1 | PROCESSING SOLUTION, METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-08-28 | — | — | US | disclosed |
| US-6096144-A | TREATING WITH ACIDIC OR ALKALINE SOLUTION OF CONJUGATED UNSATURATED COMPOUND WITH AT LEAST 5 BONDS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-01 | — | — | US | disclosed |
| US-5858571-A | TREATING A PULVERIZED HYDROGEN ABSORBING ALLOY WITH A SOLUTION COMPRISING A CONJUGATED UNSATURATED COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-01-12 | — | — | US | disclosed |
| EP-0872903-A1 | Method for making hydrogen storage alloy powder and electrode comprising the alloy powder | Shin-Etsu Chemical Co., Ltd. (JP) | 1998-10-21 | — | — | EP | disclosed |
| CN-1006386-B | PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER | SHINETSU CHEM IND CO (JP) | 1990-01-10 | — | — | CN | disclosed |
| EP-0172427-B1 | PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER | Shin-Etsu Chemical Co., Ltd. (JP) | 1989-07-05 | — | — | EP | disclosed |
| US-4758639-A | Process for production of vinyl polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1988-07-19 | — | — | US | disclosed |
| US-4757124-A | Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1988-07-12 | — | — | US | disclosed |
| CN-85107531-A | Process for producing vinyl chloride polymer | — | 1987-01-21 | — | — | CN | disclosed |
| EP-0172427-A2 | Process for production of vinyl chloride polymer | Shin-Etsu Chemical Co., Ltd. (JP) | 1986-02-26 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260117105-A1 | POLISHING COMPOSITION HAVING EXCELLENT STORAGE STABILITY AND METHOD FOR PRODUCING SAME | SRPRA, SEM1, PSMA1 | MEN1 4079/4885KMT2A 1298/4885HPGD 3578/4885 |
| US-20260028553-A1 | PROCESSING SOLUTION, METHOD FOR MANUFACTURING PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | TET2, TET1, KDM2A | MEN1 3376/4885KMT2A 94/4885HPGD 983/4885 |
| US-20260042978-A1 | PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE | TWF2, DSTYK, WNK1 | MEN1 2656/4885KMT2A 445/4885HPGD 4609/4885 |
| US-20260146199-A1 | METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE | AS3MT, ASH1L, HMOX2 | MEN1 2211/4885KMT2A 467/4885HPGD 3244/4885 |
| US-12630742-B2 | Polishing composition using polishing particles containing basic substance and having high water affinity | POLR1A, PRMT1, SRRM2 | MEN1 3494/4885KMT2A 2625/4885HPGD 2362/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.