SCHEMBL4386763

SCHEMBL4386763

C=CN1CCCC1=O.C=Cc1ccccn1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 6/20 0.39
NPC1 O15118 4/20 0.39
MEN1 O00255 3/20 0.39
KMT2A Q03164 3/20 0.39
ATM Q13315 1/20 0.39
MAPK1 P28482 5/20 0.38
IKBKB O14920 3/20 0.38
RAF1 P04049 3/20 0.38
RPS6KB1 P23443 3/20 0.38
AKT1 P31749 3/20 0.38
AKT2 P31751 3/20 0.38
KDR P35968 3/20 0.38
MAPKAPK2 P49137 3/20 0.38
PRKAG1 P54619 3/20 0.38
MAP2K1 Q02750 3/20 0.38
PRKAA1 Q13131 3/20 0.38
NEK1 Q96PY6 3/20 0.38
PRKAB1 Q9Y478 3/20 0.38
PRDX1 Q06830 1/20 0.38
MAPK14 Q16539 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Styrene SCHEMBL29134158 0.93 ALDH1A1 (0.36) RAB9ANPC1MEN1KMT2AATM
SCHEMBL28321142 0.88 MAPK1 (0.34) RAB9ANPC1MEN1KMT2AATM
SCHEMBL12760654 0.82 ALDH1A1 (0.30) MAPTALDH1A1L3MBTL1
SCHEMBL8776102 0.81 RAB9A (0.47) RAB9ANPC1MEN1KMT2AATM
SCHEMBL28077875 0.80 NPC1 (0.42) RAB9ANPC1MEN1KMT2AATM
SCHEMBL5792793 0.80 MEN1 (0.38) MEN1KMT2AMAPTTDP1KDM4E
Pyridine SCHEMBL9578986 0.80 GAA (0.32) TDP1ALDH1A1TSHRGAA
Cyclopentanone SCHEMBL28852100 0.79 NPC1 (0.48) RAB9ANPC1MEN1KMT2AATM
Benzene SCHEMBL28167208 0.79 BRD4 (0.38) MEN1KMT2AMAPTALDH1A1TSHR
Styrene SCHEMBL668985 0.78 ALDH1A1 (0.47) RAB9AMAPTSMN1; SMN2ALDH1A1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108250363-B Monocrystalline silicon texturing additive 温岭汉德高分子科技有限公司 2020-04-10 CN claimed
CN-108219071-B Preparation method of chondroitin sulfate-poly (vinylpyrrolidone-vinylpyridine) copolymer for texturing monocrystalline silicon wafers 温岭汉德高分子科技有限公司 2020-03-10 CN claimed
CN-108221050-B Monocrystalline silicon piece with double-peak pyramid suede structure 温岭汉德高分子科技有限公司 2019-12-31 CN claimed
CN-108251894-B A kind of etching method of monocrystalline silicon piece 温岭汉德高分子科技有限公司 2019-06-14 CN claimed
CN-112349812-A Preparation method of silicon wafer surface textured structure 武汉新芯集成电路制造有限公司 2021-02-09 CN disclosed
CN-108048236-B Liquid detergent containing carboxymethyl cellulose and preparation method thereof 纳爱斯浙江科技有限公司 2020-11-06 CN disclosed
CN-107129882-B Transparent laundry detergent composition with washing and softening effects and preparation method thereof 纳爱斯集团有限公司 2020-04-21 CN disclosed
CN-108250363-B Monocrystalline silicon texturing additive 温岭汉德高分子科技有限公司 2020-04-10 CN disclosed
CN-108250363-B Monocrystalline silicon texturing additive 温岭汉德高分子科技有限公司 2020-04-10 CN disclosed
CN-108219071-B Preparation method of chondroitin sulfate-poly (vinylpyrrolidone-vinylpyridine) copolymer for texturing monocrystalline silicon wafers 温岭汉德高分子科技有限公司 2020-03-10 CN disclosed
CN-108219071-B Preparation method of chondroitin sulfate-poly (vinylpyrrolidone-vinylpyridine) copolymer for texturing monocrystalline silicon wafers 温岭汉德高分子科技有限公司 2020-03-10 CN disclosed
CN-108219071-B Preparation method of chondroitin sulfate-poly (vinylpyrrolidone-vinylpyridine) copolymer for texturing monocrystalline silicon wafers 温岭汉德高分子科技有限公司 2020-03-10 CN disclosed
WO-2007079541-A1 RADIATION CURABLE SYSTEM GARNETT JOHN LYNDON (AU) 2007-07-19 WO disclosed
CN-1851560-A Electrophotographic toner, developer and image forming device RICOH KK (JP) 2006-10-25 CN disclosed
EP-0110165-B1 A METHOD OF ENHANCING THE CONTRAST OF IMAGES AND MATERIALS THEREFOR MicroSi, Inc. (a Delaware corporation) (US) 1993-06-23 EP disclosed
WO-1992019095-A1 PLANT GROWING MATRIX E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-11-12 WO disclosed
EP-0144059-B1 PHOTOGRAPHIC ELEMENT FUJI PHOTO FILM CO., LTD. (JP) 1989-02-01 EP disclosed
US-4594308-A Silver halide light sensitive emulsion FUJI PHOTO FILM CO., LTD. (JP) 1986-06-10 US disclosed
EP-0144059-A2 Photographic element FUJI PHOTO FILM CO., LTD. (JP) 1985-06-12 EP disclosed
EP-0110165-A2 A method of enhancing the contrast of images and materials therefor MicroSi, Inc. (a Delaware corporation) (US) 1984-06-13 EP disclosed