Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 4/20 | 0.47 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.47 |
| ▸ | FYN | P06241 | 1/20 | 0.47 |
| ▸ | MAOA | P21397 | 1/20 | 0.47 |
| ▸ | ACHE | P22303 | 1/20 | 0.47 |
| ▸ | AHR | P35869 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 12/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 10/20 | 0.41 |
| ▸ | HPGD | P15428 | 6/20 | 0.41 |
| ▸ | HIF1A | Q16665 | 4/20 | 0.41 |
| ▸ | CYP1B1 | Q16678 | 2/20 | 0.41 |
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 6/20 | 0.39 |
| ▸ | CASP1 | P29466 | 3/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.39 |
| ▸ | CASP7 | P55210 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL17260574 | 0.91 | ALDH1A1 (0.45) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL29741651 | 0.90 | CYP1A2 (0.40) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL28678826 | 0.90 | CYP1A2 (0.40) | CYP1A2ERBB2FYNMAOAACHE | |
| Oxalic Acid SCHEMBL21957773 | 0.90 | ALDH1A1 (0.44) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL19305534 | 0.88 | CYP1A2 (0.41) | CYP1A2ERBB2FYNMAOAACHE | |
| Nitric Acid SCHEMBL17260598 | 0.87 | CYP3A4 (0.41) | CYP1A2ERBB2FYNMAOAACHE | |
| Maleic Acid SCHEMBL21957809 | 0.86 | KDM4E (0.41) | CYP1A2ERBB2FYNMAOAACHE | |
| Fumaric Acid SCHEMBL21957735 | 0.86 | KDM4E (0.41) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL3422640 | 0.83 | CYP1A2 (0.35) | CYP1A2ERBB2FYNMAOAACHE | |
| Bromide SCHEMBL18297971 | 0.83 | CYP1A2 (0.43) | CYP1A2ERBB2FYNMAOAACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6316575-B1 | MELT TRANSESTERIFICATION OF DIOL COMPOUND AND CARBOANTE COMPOUND USING CATALYST COMPRISING A PHOSPHORUS-CONTAINING BASIC COMPOUND QUATERNARY PHOSPHONIUM SALT TO FORM POLYCARBONATE | IDEMITSU KOSAN CO., LTD. (JP) | 2001-11-13 | — | — | US | claimed |
| US-12001138-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-04 | — | — | US | disclosed |
| EP-3680275-B1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-03-06 | — | — | EP | disclosed |
| EP-3796086-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-02-28 | — | — | EP | disclosed |
| US-11914295-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20230333472-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20230305405-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| EP-4250008-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-27 | — | — | EP | disclosed |
| CN-116804825-A | Composition for forming silicon-containing metal hard mask and pattern forming method | 信越化学工业株式会社 | 2023-09-26 | — | — | CN | disclosed |
| CN-111458980-B | Composition for forming underlayer film of silicon-containing resist and method for forming pattern | 信越化学工业株式会社 | 2023-08-11 | — | — | CN | disclosed |
| US-6245878-B1 | POLYMERIZING POLYCARBONATE PREPOLYMER IN SOLID PHASE IN PRESENCE OF PHOSPHORUS-CONTAINING BASIC COMPOUND AS CATALYST IN ATMOSPHERE OF POOR SOLVENT GAS SELECTED FROM LINEAR ALIPHATIC HYDROCARBONS AND CYCLOALIPHATIC HYDROCARBONS | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 2001-06-12 | — | — | US | disclosed |
| EP-1069146-A1 | POLYCARBONATE AND OPTICAL MATERIAL | Idemitsu Petrochemical Co., Ltd. (JP) | 2001-01-17 | — | — | EP | disclosed |
| EP-1048684-A1 | PROCESS FOR PRODUCING POLYCARBONATE AND OPTICAL-DISK SUBSTRATE | Idemitsu Petrochemical Co., Ltd. (JP) | 2000-11-02 | — | — | EP | disclosed |
| EP-1035150-A1 | COPOLYCARBONATE AND PROCESS FOR PRODUCING THE SAME | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 2000-09-13 | — | — | EP | disclosed |
| EP-1033381-A1 | PROCESS FOR PRODUCING POLYCARBONATE | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 2000-09-06 | — | — | EP | disclosed |
| US-5942594-A | AROMATIC POLYCARBONATE CONTAINS IN SMALL AMOUNT, THE UNIT OF PHENYL SALICYLATE STRUCTURE IN MAIN CHAIN, EXHIBITS EXCELLENT FLUIDITY AND MOISTURE RESISTANCE | IDEMITSU KOSAN CO., LTD. (JP) | 1999-08-24 | — | — | US | disclosed |
| US-5922826-A | TRANSESTERIFICATION IN PRESENCE OF A POLYMERIZATION CATALYST CONTAINING AN ORGANONITROGEN COMPOUND AND A QUATERNARY PHOSPHONIUM SALT TO PRODUCE POLYCARBONATE | IDEMITSU KOSAN CO., LTD. (JP) | 1999-07-13 | — | — | US | disclosed |
| EP-0908484-A1 | PROCESSES FOR THE PRODUCTION OF POLYCARBONATE | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1999-04-14 | — | — | EP | disclosed |
| EP-0852242-A1 | POLYCARBONATE AND PROCESS FOR PRODUCING THE SAME | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1998-07-08 | — | — | EP | disclosed |
| EP-0807657-A1 | PROCESS FOR PRODUCING POLYCARBONATE | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1997-11-19 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230333472-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | RPS4X, SIK3, MLX | CYP1A2 2955/4885ERBB2 2446/4885FYN 4554/4885 |
| US-11914295-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | RPS4X, SIK3, MLX | CYP1A2 2955/4885ERBB2 2446/4885FYN 4554/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.