SCHEMBL4388173

SCHEMBL4388173

O=C(O)CC(C(=O)O)(C(=O)O)n1c(=O)[nH]c(=O)[nH]c1=O

nearest known ligand 0.32

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
APEX1 P27695 1/20 0.32
ALDH1A1 P00352 1/20 0.32
HMGCR P04035 1/20 0.32
CHRM1 P11229 1/20 0.32
TBXA2R P21731 1/20 0.32
ADRA1A P35348 1/20 0.32
CYP2D6 P10635 1/20 0.31
TSHR P16473 1/20 0.31
CYP2C19 P33261 1/20 0.31
HIF1A Q16665 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4388580 0.73 LMNA (0.31) ALDH1A1
SCHEMBL443221 0.65
SCHEMBL6525074 0.65 SMN1; SMN2 (0.30)
SCHEMBL4184455 0.64 APEX1 (0.47) APEX1ALDH1A1TSHR
SCHEMBL5824335 0.64
SCHEMBL29042185 0.61 LMNA (0.33)
SCHEMBL109468 0.61 LMNA (0.33)
SCHEMBL4188327 0.61 APEX1 (0.70) APEX1ALDH1A1
SCHEMBL27889745 0.60 JAK2 (0.38) APEX1ALDH1A1
SCHEMBL1833220 0.60 LMNA (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7560372-B2 Process for making a semiconductor device having a roughened surface NEC ELECTRONICS CORPORATION (JP) 2009-07-14 US disclosed
US-7268087-B2 Manufacturing method of semiconductor device NEC ELECTRONICS CORPORATION (JP) 2007-09-11 US disclosed
US-7170172-B2 Semiconductor device having a roughened surface NEC ELECTRONICS CORPORATION (JP) 2007-01-30 US disclosed
US-20070015351-A1 Process or making a semiconductor device having a roughened surface NEC ELECTRONICS CORPORATION (JP) 2007-01-18 US disclosed
US-6992050-B2 Stripping agent composition and method of stripping NEC CORPORATION (JP) 2006-01-31 US disclosed
US-20040266171-A1 Manufacturing method of semiconductor device NEC ELECTRONICS CORPORATION 2004-12-30 US disclosed
US-6787480-B2 Manufacturing method of semicondcutor device NEC CORPORATION (JP) 2004-09-07 US disclosed
US-20040029051-A1 Stripping agent composition and method of stripping NEC CORPORATION (JP) 2004-02-12 US disclosed
US-20030111731-A1 Semiconductor device and method for producing the same NEC ELECTRONICS CORPORATION (JP) 2003-06-19 US disclosed
US-20020155702-A1 Manufacturing method of semiconductor device NEC CORPORATION 2002-10-24 US disclosed