Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | JAK2 | O60674 | 1/20 | 0.30 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5824335 | 0.84 | — | — | |
| SCHEMBL4388173 | 0.73 | APEX1 (0.32) | ALDH1A1 | |
| SCHEMBL443221 | 0.72 | — | — | |
| SCHEMBL109468 | 0.68 | LMNA (0.33) | LMNA | |
| SCHEMBL29042185 | 0.68 | LMNA (0.33) | LMNA | |
| SCHEMBL6525074 | 0.68 | SMN1; SMN2 (0.30) | — | |
| SCHEMBL1833220 | 0.67 | LMNA (0.44) | LMNA | |
| SCHEMBL27889745 | 0.67 | JAK2 (0.38) | LMNAALDH1A1JAK2THRB | |
| SCHEMBL5605625 | 0.65 | — | — | |
| SCHEMBL2169311 | 0.62 | DAO (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-9291381-A | — | — | None | — | — | JP | disclosed |
| WO-2023238920-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM TO REDUCE ENVIRONMENTAL IMPACT | 日産化学株式会社 | 2023-12-14 | — | — | WO | disclosed |
| CN-114424121-A | Composition for forming resist underlayer film containing heterocyclic compound | 日产化学株式会社 | 2022-04-29 | — | — | CN | disclosed |
| US-20210063881-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING A DISULFIDE STRUCTURE | NISSAN CHEMICAL CORPORATION (JP) | 2021-03-04 | — | — | US | disclosed |
| CN-112313226-A | Resist underlayer film forming composition containing reaction product with glycidyl ester compound | 日产化学株式会社 | 2021-02-02 | — | — | CN | disclosed |
| CN-111670410-A | Composition for forming resist underlayer film having disulfide structure | 日产化学株式会社 | 2020-09-15 | — | — | CN | disclosed |
| US-7560372-B2 | Process for making a semiconductor device having a roughened surface | NEC ELECTRONICS CORPORATION (JP) | 2009-07-14 | — | — | US | disclosed |
| US-7268087-B2 | Manufacturing method of semiconductor device | NEC ELECTRONICS CORPORATION (JP) | 2007-09-11 | — | — | US | disclosed |
| US-7170172-B2 | Semiconductor device having a roughened surface | NEC ELECTRONICS CORPORATION (JP) | 2007-01-30 | — | — | US | disclosed |
| US-20070015351-A1 | Process or making a semiconductor device having a roughened surface | NEC ELECTRONICS CORPORATION (JP) | 2007-01-18 | — | — | US | disclosed |
| US-6992050-B2 | Stripping agent composition and method of stripping | NEC CORPORATION (JP) | 2006-01-31 | — | — | US | disclosed |
| US-20040266171-A1 | Manufacturing method of semiconductor device | NEC ELECTRONICS CORPORATION | 2004-12-30 | — | — | US | disclosed |
| US-6787480-B2 | Manufacturing method of semicondcutor device | NEC CORPORATION (JP) | 2004-09-07 | — | — | US | disclosed |
| US-20040029051-A1 | Stripping agent composition and method of stripping | NEC CORPORATION (JP) | 2004-02-12 | — | — | US | disclosed |
| US-20030111731-A1 | Semiconductor device and method for producing the same | NEC ELECTRONICS CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20020155702-A1 | Manufacturing method of semiconductor device | NEC CORPORATION | 2002-10-24 | — | — | US | disclosed |
| JP-H09291381-A | WATER-SOLUBLE RUST PREVENTIVE | YUSHIRO CHEM IND CO LTD | 1997-11-11 | — | — | JP | disclosed |
| US-4396735-A | N-HETEROCYCLIC COMPOUND AND A HETEROCYCLIC ACID HYDRAZIDE | ADEKA ARGUS CHEMICAL CO., LTD. (JP) | 1983-08-02 | — | — | US | disclosed |
| US-4362831-A | A HINDERED AND HETEROCYCLIC AMINE WITH A THIOALKANOIC ACID AMIDE | ADEKA ARGUS CHEMICAL CO., LTD. (JP) | 1982-12-07 | — | — | US | disclosed |